公开(公告)号：US20240036484A1

公开(公告)日：2024-02-01

申请号：US18265606

申请日：2021-12-02

Applicant: ASML Netherlands B.V.

Inventor： Timothy Dugan DAVIS ,  Simon Gijsbert Josephus MATHIJSSEN ,  Kaustuve BHATTACHARYYA ,  Sebastianus Adrianus GOORDEN ,  Armand Eugene Albert KOOLEN ,  Sera JEON ,  Shuo-Chun LIN

IPC: G03F9/00 ,  G03F7/00

CPC classification number: G03F9/7019 ,  G03F9/7092 ,  G03F7/70633 ,  G03F7/70641

Abstract: Disclosed is a method of metrology. The method comprises measuring at least one surrounding observable parameter relating to a surrounding signal contribution to a metrology signal which comprises a contribution to said metrology signal which is not attributable to at least one target being measured and determining a correction from said surrounding signal observable parameter. The correction is used to correct first measurement data relating to measurement of one or more targets using measurement radiation forming a measurement spot on one or more of said one or more targets which is larger than one of said targets.