公开(公告)号：US10788757B2

公开(公告)日：2020-09-29

申请号：US16379267

申请日：2019-04-09

Applicant: ASML Netherlands B.V.

Inventor： Su-Ting Cheng ,  Sergei Sokolov ,  Armand Eugene Albert Koolen

IPC: G01B11/00 ,  G03F7/20 ,  G01B11/26

Abstract: Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.

公开(公告)号：US11150563B2

公开(公告)日：2021-10-19

申请号：US16708509

申请日：2019-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Sergei Sokolov ,  Sergey Tarabrin ,  Su-Ting Cheng ,  Armand Eugene Albert Koolen ,  Markus Franciscus Antonius Eurlings ,  Koenraad Remi André Maria Schreel

IPC: G03F7/20

Abstract: A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.