公开(公告)号：US20240128043A1

公开(公告)日：2024-04-18

申请号：US18530109

申请日：2023-12-05

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST ,  Roy Ramon VEENSTRA ,  Erwin Paul SMAKMAN ,  Tom VAN ZUTPHEN ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/12 ,  H01J37/147

CPC classification number: H01J37/12 ,  H01J37/147 ,  H01J2237/2448

Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.