公开(公告)号：US20240331971A1

公开(公告)日：2024-10-03

申请号：US18741204

申请日：2024-06-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jurgen VAN SOEST ,  Vincent Sylvester KUIPER ,  Yinglong LI

IPC: H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2001

Abstract: A charged particle assessment apparatus comprising: a charged particle beam device; an actuated sample stage; a hot component and a thermal compensator. The actuated sample stage is configured to hold a sample. The hot component is configured to operate such that, during operation, heat is radiated toward a sample held on the sample holder. The hot component is smaller than the sample. The thermal compensator is configured to heat the sample so as to reduce thermal gradients therein.

公开(公告)号：US20230154725A1

公开(公告)日：2023-05-18

申请号：US18155698

申请日：2023-01-17

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST

IPC: H01J37/305 ,  H01J37/22 ,  H01J37/317

CPC classification number: H01J37/3056 ,  H01J37/226 ,  H01J37/3175 ,  H01J2237/31774 ,  H01J2237/20285

Abstract: An emitter is configured to emit charged particles. The emitter comprises a body, a metal layer and a charged particle source layer. The body has a point. The metal layer is of a first metal on at least the point. The charged particle source layer is on the metal layer. The point comprises a second metal other than the first metal.

公开(公告)号：US20230238736A1

公开(公告)日：2023-07-27

申请号：US18122601

申请日：2023-03-16

Applicant: ASML Netherlands B.V.

Inventor： Boudewijn Weijert Herman Jan VAN DER KROON ,  Jurgen VAN SOEST

IPC: H01R13/52 ,  H01J37/248 ,  H01J37/18

CPC classification number: H01R13/5221 ,  H01J37/248 ,  H01J37/18

Abstract: Disclosed herein is a connector for electrically connecting a feedthrough of a vacuum tool to a high voltage power source, the connector comprising: a connector wire assembly configured to be in electrical connection with a high voltage power source; and a connector insulator comprising a channel configured to extend into the connector insulator and to receive a feedthrough pin so as to electrically connect the connector wire assembly with the feedthrough pin; wherein the connector insulator is configured to engage with the feedthrough so that a boundary surface of the connector insulator extends substantially bi-directionally in the direction of the longitudinal axis of the channel.

公开(公告)号：US20210313908A1

公开(公告)日：2021-10-07

申请号：US17351181

申请日：2021-06-17

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis VAN DER TOORN ,  Jeroen Gertruda Antonius HUINCK ,  Han Willem Hendrik SEVERT ,  Allard Eelco KOOIKER ,  Michaël Johannes Christiaan RONDE ,  Arno Maria WELLINK ,  Shibing LIU ,  Ying LUO ,  Yixiang WANG ,  Chia-Yao CHEN ,  Bohang ZHU ,  Jurgen VAN SOEST

IPC: H02N13/00 ,  G03F7/20

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US20230317402A1

公开(公告)日：2023-10-05

申请号：US18118701

申请日：2023-03-07

Applicant: ASML Netherlands B.V.

Inventor： Derk Ferdinand WALVOORT ,  Dmitry MUDRETSOV ,  Xuerang HU ,  Qingpo XI ,  Jurgen VAN SOEST ,  Marco Jan-Jaco WIELAND

IPC: H01J37/09

CPC classification number: H01J37/09 ,  H01J2237/0266 ,  H01J2237/024

Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.

公开(公告)号：US20230154719A1

公开(公告)日：2023-05-18

申请号：US18155684

申请日：2023-01-17

Applicant: ASML Netherlands B.V.

Inventor： Laura DINU-GURTLER ,  Eric Petrus HOGERVORST ,  Jurgen VAN SOEST

IPC: H01J37/04 ,  G03F7/20 ,  H01J37/10 ,  H01J37/244 ,  H01J37/317 ,  H01L21/263

CPC classification number: H01J37/04 ,  G03F7/70016 ,  H01J37/10 ,  H01J37/244 ,  H01J37/3175 ,  H01L21/263 ,  H01J2237/061

Abstract: The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

公开(公告)号：US20230005699A1

公开(公告)日：2023-01-05

申请号：US17941897

申请日：2022-09-09

Applicant: ASML Netherlands B.V.

Inventor： Christiaan OTTEN ,  Christian TEUNISSEN ,  Boudewjin Weijert Herman Jan VAN DER KROON ,  Jurgen VAN SOEST

IPC: H01J37/09 ,  H01J37/04

Abstract: Disclosed herein is an aperture body for passing a portion of a charged particle beam propagating along a beam path comprising an axis, the aperture body comprising: an up-beam facing surface; a chamber portion comprising an up-beam end, a down-beam end and an up-beam plate, wherein the up-beam plate extends radially inwards from the up-beam end and the up-beam plate is configured to define an entrance opening around the beam path; wherein: the up-beam facing surface extends radially inwards from the down-beam end; the up-beam facing surface comprises an aperture portion that is configured to define an opening around the beam path; and the opening defined by the aperture portion is smaller than the entrance opening.

公开(公告)号：US20240339294A1

公开(公告)日：2024-10-10

申请号：US18743011

申请日：2024-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Marijke SCOTUZZI ,  Albertus Victor Gerardus MANGNUS ,  Yan REN ,  Erwin Paul SMAKMAN ,  Jurgen VAN SOEST

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/1474 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28

Abstract: A charged-particle optical apparatus configured to project a multi-beam of charged particles, the apparatus comprising: a charged particle device switchable between (i) an operational configuration in which the device is configured to project the multi-beam to a sample along an operational beam path extending from a source of the multi-beam to the sample and (ii) a monitoring configuration in which the device is configured to project the multi-beam to a detector along a monitoring beam path extending from the source to the detector; wherein the monitoring beam path diverts from the inspection beam path part way along the operational beam path.

公开(公告)号：US20230352266A1

公开(公告)日：2023-11-02

申请号：US18213765

申请日：2023-06-23

Applicant: ASML Netherlands B.V.

Inventor： Stijn Wilem Herman Karel STEENBRINK ,  Johan Joost KONING ,  Jurgen VAN SOEST ,  Marco Jan-Jaco WIELAND

IPC: H01J37/12

CPC classification number: H01J37/12 ,  H01J37/28

Abstract: Disclosed herein is an electron-optical device, a lens assembly and an electron-optical column. The electron-optical device comprises an array substrate and an adjoining substrate and is configured to provide a potential difference between the substrates. An array of apertures is defined in each of the substrates for the path of electron beamlets. The array substrate has a thickness which is stepped so that the array substrate is thinner in the region corresponding to the array of apertures than another region of the array substrate.

公开(公告)号：US20230246568A1

公开(公告)日：2023-08-03

申请号：US18132617

申请日：2023-04-10

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis VAN DER TOORN ,  Jeroen Gertruda Antonius HUINCK ,  Han Willem Hendrik SEVERT ,  Allard Eelco KOOIKER ,  Michael Johannes Christiaan RONDE ,  Arno Maria WELLINK ,  Shibing LIU ,  Ying LUO ,  Yixiang WANG ,  Chia-Yao CHEN ,  Bohang ZHU ,  Jurgen VAN SOEST

IPC: H02N13/00 ,  G03F7/20

CPC classification number: H02N13/00 ,  G03F7/70708 ,  G03F7/70716

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.