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公开(公告)号:US11961701B2
公开(公告)日:2024-04-16
申请号:US17603225
申请日:2019-04-24
发明人: Tomoharu Nagashima , Kazuki Ikeda , Wen Li , Masashi Wada , Hajime Kawano
IPC分类号: H01J37/22 , G06F3/04847 , H01J37/28
CPC分类号: H01J37/222 , G06F3/04847 , H01J37/28 , H01J2237/2448
摘要: When adjusting optical axes of a multi-beam charged particle beam device, because parameters of optical systems are inter-dependent, the time required to adjust the parameters increases. Thus, the present invention provides a charged particle beam device provided with an optical parameter setting unit for setting parameters of optical systems for emitting a plurality of primary charged particle beams to a sample, detectors for individually detecting a plurality of secondary charged particle beams discharged from the sample, a plurality of memories for storing signals detected by the detectors and converted into digital pixels in the form of images, evaluation value derivation units for deriving evaluation values of the primary charged particle beams from the images, and a GUI capable of displaying the images and receiving an input from a user, wherein the GUI displays the images and evaluation results based on the evaluation values and changes various optical parameters in real-time.
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公开(公告)号:US11923167B2
公开(公告)日:2024-03-05
申请号:US18087277
申请日:2022-12-22
发明人: Hiroshi Matsushita
IPC分类号: H01J37/244 , G01T3/00 , H01J37/147 , H01J37/317
CPC分类号: H01J37/244 , G01T3/00 , H01J37/1472 , H01J37/3171 , H01J2237/0473 , H01J2237/2448
摘要: An ion implanter includes: a plurality of devices which are disposed along a beamline along which an ion beam is transported; a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure a neutron ray from a neutron ray source which is generated in the beamline due to collision of a high-energy ion beam; and a control device which monitors at least one of the plurality of devices, based on a plurality of measurement values measured by the plurality of neutron ray measuring instruments.
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公开(公告)号:US20240014002A1
公开(公告)日:2024-01-11
申请号:US18200232
申请日:2023-05-22
发明人: Takayasu IWATSUKA , Hideto DOHI , Tomoyo SASAKI , Wen LI
IPC分类号: H01J37/244 , H01J37/147 , H01J37/28
CPC分类号: H01J37/244 , H01J37/1475 , H01J37/28 , H01J2237/2448 , H01J2237/24521 , H01J2237/24455
摘要: The charged particle beam apparatus includes a charged particle source generating a charged particle beam, a deflector deflecting the charged particle beam, a detector detecting secondary electrons emitted from an irradiation target in response to irradiation with the charged particle beam, and a processor system. The processor system (A) acquires a first time-series change in secondary electron detection-related quantity by repeatedly performing the following (A1) and (A2), (A1) directly or indirectly, maintains or changes the control amount applied to the deflector to a first control amount, and (A2) acquires the secondary electron detection-related quantity based on an output from the detector, and (B) acquires a time-series change in variation of the beam diameter of the charged particle beam based on the first time-series change.
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公开(公告)号:US20230386781A1
公开(公告)日:2023-11-30
申请号:US18203430
申请日:2023-05-30
发明人: Zhao JINYU , Ayumi DOI , Aoi YAMAUCHI , Shuichiro TAKAHASHI
IPC分类号: H01J37/244 , H01J37/28 , H03G3/30 , G01N23/2251
CPC分类号: H01J37/244 , H01J37/28 , H03G3/3036 , G01N23/2251 , H01J2237/2448 , H01J2237/24495 , H03G2201/103
摘要: To correct a difference in signal intensity due to a difference in hardware, for example, temporal deterioration of the hardware in the same device, or a difference in signal intensity between different devices. An adjustment method according to the disclosure specifies an amplification gain with which the same detection signal intensity as that of a comparison target is obtained by comparing correspondence relationships between the detection signal intensity and the amplification gain at different time points in the same charged particle beam device or among different charged particle beam devices.
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公开(公告)号:US20230377837A1
公开(公告)日:2023-11-23
申请号:US18031359
申请日:2020-10-26
发明人: Yohei NAKAMURA , Natsuki TSUNO , Yasuhiro SHIRASAKI , Minami SHOUJI , Shota MITSUGI , Yuko SASAKI
IPC分类号: H01J37/26 , H01J37/244 , H01J37/22 , H01J37/28
CPC分类号: H01J37/265 , H01J37/244 , H01J37/226 , H01J37/28 , H01J2237/2448
摘要: Charged particle beam apparatus includes: a charged particle optical system to irradiate a sample with a pulsed charged particle beam; an optical system to irradiate the sample with light; a detector configured to detect a secondary charged particle emitted by irradiating the sample with the pulsed charged particle beam; a control unit configured to control the charged particle optical system to irradiate the sample with the pulsed charged particle beam under a predetermined electron beam pulse condition, and control the optical system to irradiate the sample with the light under a predetermined light irradiation condition; and a computation device configured to set the predetermined light irradiation condition based on a difference between a secondary charged particle signal amount detected under a first electron beam pulse condition and a secondary charged particle signal amount detected under a second electron beam pulse condition different from the first electron beam pulse condition.
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公开(公告)号:US11823861B2
公开(公告)日:2023-11-21
申请号:US17617379
申请日:2019-07-02
发明人: Yuta Imai , Junichi Katane
IPC分类号: H01J37/141 , H01J37/244 , H01J37/28
CPC分类号: H01J37/141 , H01J37/244 , H01J37/28 , H01J2237/04735 , H01J2237/2448
摘要: The invention provides a charged particle beam device that prevents a leakage of an unnecessary magnetic field to a trajectory of a charged particle beam with which a sample is irradiated in a sample observation according to a boosting method. The charged particle beam device includes: a charged particle source configured to generate the charged particle beam with which the sample is irradiated; an object lens configured to generate the magnetic field for focusing the charged particle beam; and a boosting electrode that is provided inside the object lens and to which a voltage for accelerating the charged particle beam is applied. The boosting electrode is formed of a magnetic material.
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公开(公告)号:US20230326706A1
公开(公告)日:2023-10-12
申请号:US18331866
申请日:2023-06-08
IPC分类号: H01J37/153 , H01J37/147 , H01J37/28 , H01J37/21
CPC分类号: H01J37/153 , H01J37/1474 , H01J37/28 , H01J37/21 , H01J2237/2448 , H01J2237/1534 , H01J2237/20278 , H01J2237/20221 , H01J2237/1532
摘要: A charged particle beam apparatus for directing a charged particle beam to preselected locations of a sample surface is provided. The charged particle beam has a field of view of the sample surface. A charged-particle-optical arrangement is configured to direct a charged particle beam along a beam path towards the sample surface and to detect charged particles generated in the sample in response to the charged particle beam. A stage is configured to support and move the sample relative to the beam path. A controller is configured to control the charged particle beam apparatus so that the charged particle beam scans over a preselected location of the sample simultaneously with the stage moving the sample relative to the charged-particle-optical column along a route, the scan over the preselected location of the sample covering a part of an area of the field of view.
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公开(公告)号:US11715618B2
公开(公告)日:2023-08-01
申请号:US17392758
申请日:2021-08-03
申请人: FEI Company
发明人: Yuchen Deng , Alexander Henstra , Peter Tiemeijer
IPC分类号: H01J37/02 , H01J37/244 , H01J37/04
CPC分类号: H01J37/026 , H01J37/045 , H01J37/244 , H01J2237/0045 , H01J2237/2448
摘要: Systems and methods for reducing the buildup of charge during the investigation of samples using charged particle beams, according to the present disclosure include irradiating a first portion of a sample during a first time period, wherein the irradiating the first portion of the sample causes a gradual accumulation of net charge in the first portion of the sample, generating imaging data based on emissions resultant from irradiating the first portion of the sample, and then irradiating a second portion of a sample holder for a second time period. The methods may further includes iteratively repeating the irradiation of the first portion and the second portion during imaging of the sample region. When more than one region of interest on the sample is to be investigated, the method may also include continuing to image additional portions of the sample by iteratively irradiating a region of interest on the sample and a corresponding portion of the sample holder.
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公开(公告)号:US20230230800A1
公开(公告)日:2023-07-20
申请号:US18123850
申请日:2023-03-20
申请人: KLA Corporation
发明人: Marcel Trimpl
IPC分类号: H01J37/28 , H01J37/244 , H01J37/26 , H01J37/317
CPC分类号: H01J37/28 , H01J37/244 , H01J37/265 , H01J37/3177 , H01J2237/24475 , H01J2237/24415 , H01J2237/2448
摘要: A scanning electron microscopy (SEM) system is disclosed. The SEM system includes an electron source configured to generate an electron beam and a set of electron optics configured to scan the electron beam across the sample and focus electrons scattered by the sample onto one or more imaging planes. The SEM system includes a first detector module positioned at the one or more imaging planes, wherein the first detector module includes a multipixel solid-state sensor configured to convert scattered particles, such as electrons and/or x-rays, from the sample into a set of equivalent signal charges. The multipixel solid-state sensor is connected to two or more Application Specific Integrated Circuits (ASICs) configured to process the set of signal charges from one or more pixels of the sensor.
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公开(公告)号:US20230215685A1
公开(公告)日:2023-07-06
申请号:US18000118
申请日:2021-05-25
发明人: Yongxin WANG
IPC分类号: H01J37/244 , H01J37/28
CPC分类号: H01J37/244 , H01J37/28 , H01J2237/2448
摘要: A detector includes a plurality of sensing elements, section circuitry that communicatively couples a first set of sensing elements to an input of first signal processing circuitry, and a switch network that connects sets of sensing elements. Inter-element switches may connect adjacent sensing elements, including those in a diagonal direction. An output bus may be connected to each sensing element of the first set by a switching element. There may be a common output (pickup point) arranged at one sensing element that is configured to output signals from the first set. Various switching and wiring schemes are proposed. For example, the common output may be directly connected to the switch network. A switch may be provided between the output bus and first signal processing circuitry. A switch may be provided between the switch network and the first signal processing circuitry.
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