公开(公告)号：US20240355575A1

公开(公告)日：2024-10-24

申请号：US18759499

申请日：2024-06-28

Applicant: ASML NETHERLANDS B.V.

Inventor： German AKSENOV ,  Vincent Claude BEUGIN ,  Pieter Lucas BRANDT

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J37/1472 ,  H01J37/28

Abstract: Disclosed herein is a manipulator or an array of manipulator. A manipulator manipulates a charged particle beam in a projection system. The manipulator comprising a substrate with major surfaces and a through-passage between associated apertures in the major surfaces. The through passage configured for passage of a path of a charged particle beam. An inner wall of the through-passage between the major surfaces comprises a plurality of electrodes configured to manipulate the charged particle beam. Each electrode comprises doped substrate. The through-passage comprises recesses that extend away from the path of the charged particle beam. Each recess defines a gap between the adjacent electrodes and further comprising an electrically insulating region between the adjacent electrodes. The recesses extend behind at least one of the adjacent electrodes relative to the path of the charged particle beam and comprising at least part of the electrically insulating region.

公开(公告)号：US20230207255A1

公开(公告)日：2023-06-29

申请号：US18117373

申请日：2023-03-03

Applicant: ASML Netherlands B.V.

Inventor： Vincent Claude BEUGIN ,  Stijn Wilem Herman Karel STEENBRINK ,  Martin EBERT ,  Diego MARTINEZ NEGRETE GASQUE ,  Hindrik Willem MOOK ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/28

Abstract: Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.

公开(公告)号：US20230223233A1

公开(公告)日：2023-07-13

申请号：US18117369

申请日：2023-03-03

Applicant: ASML Netherlands B.V.

Inventor： Diego MARTINEZ NEGRETE GASQUE ,  Vincent Claude BEUGIN ,  Weihua YIN

IPC: H01J37/317 ,  H01J37/28 ,  H01J37/12

CPC classification number: H01J37/3177 ,  H01J37/28 ,  H01J37/12

Abstract: A charged particle system generates a charged particle multi beam along a multi beam path. The charged particle system comprises an aperture array, a beam limit array and a condenser lens. In the aperture array are an array of apertures to generate from an up-beam charged particle source charged particle paths down-beam of the aperture array. The beam-limit array is down-beam of the aperture array. Defined in the beam-limit array is an array of beam-limit apertures for shaping the charged particle multi beam path. The condenser lens system is between the aperture array and the beam-limit array. The condenser lens system selectively operates different of rotation settings that define different ranges of beam paths between the aperture array and the beam-limit array. At each rotation setting of the condenser lens system, each beam-limit aperture of the beam-limit array lies on a beam path down-beam of the aperture array.