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公开(公告)号:US20200211818A1
公开(公告)日:2020-07-02
申请号:US16729177
申请日:2019-12-27
Applicant: ASML Netherlands B.V.
Inventor: Weihua YIN , Youfei JIANG
IPC: H01J37/26 , H01J37/147 , H01J37/12
Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.
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公开(公告)号:US20230274906A1
公开(公告)日:2023-08-31
申请号:US17901767
申请日:2022-09-01
Applicant: ASML Netherlands B.V.
Inventor: Martinus Gerardus, Maria, Johannes MAASSEN , Joost Jeroen OTTENS , Long MA , Youfei JIANG , Weihua YIN , Wei-Te LI , Xuedong LIU
IPC: H01J37/26 , H01J37/147 , H01J37/22 , H01J37/28
CPC classification number: H01J37/265 , H01J37/1474 , H01J37/222 , H01J37/28 , H01J2237/1505 , H01J2237/24592 , H01J2237/2817
Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
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公开(公告)号:US20210217582A1
公开(公告)日:2021-07-15
申请号:US17251724
申请日:2019-06-07
Applicant: ASML Netherlands B.V.
Inventor: Martinus Gerardus, Maria, Johannes MAASSEN , Joost Jeroen OTTENS , Long MA , Youfei JIANG , Weihua YIN , Wei-Te LI , Xuedong LIU
IPC: H01J37/26 , H01J37/147 , H01J37/22 , H01J37/28
Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
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4.
公开(公告)号:US20230223233A1
公开(公告)日:2023-07-13
申请号:US18117369
申请日:2023-03-03
Applicant: ASML Netherlands B.V.
Inventor: Diego MARTINEZ NEGRETE GASQUE , Vincent Claude BEUGIN , Weihua YIN
IPC: H01J37/317 , H01J37/28 , H01J37/12
CPC classification number: H01J37/3177 , H01J37/28 , H01J37/12
Abstract: A charged particle system generates a charged particle multi beam along a multi beam path. The charged particle system comprises an aperture array, a beam limit array and a condenser lens. In the aperture array are an array of apertures to generate from an up-beam charged particle source charged particle paths down-beam of the aperture array. The beam-limit array is down-beam of the aperture array. Defined in the beam-limit array is an array of beam-limit apertures for shaping the charged particle multi beam path. The condenser lens system is between the aperture array and the beam-limit array. The condenser lens system selectively operates different of rotation settings that define different ranges of beam paths between the aperture array and the beam-limit array. At each rotation setting of the condenser lens system, each beam-limit aperture of the beam-limit array lies on a beam path down-beam of the aperture array.
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公开(公告)号:US20220102111A1
公开(公告)日:2022-03-31
申请号:US17494518
申请日:2021-10-05
Applicant: ASML NETHERLANDS B.V.
Inventor: Weihua YIN , Youfei JIANG
IPC: H01J37/26 , H01J37/12 , H01J37/147
Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.
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