公开(公告)号：US20200211818A1

公开(公告)日：2020-07-02

申请号：US16729177

申请日：2019-12-27

Applicant: ASML Netherlands B.V.

Inventor： Weihua YIN ,  Youfei JIANG

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/12

Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.

公开(公告)号：US20230274906A1

公开(公告)日：2023-08-31

申请号：US17901767

申请日：2022-09-01

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus, Maria, Johannes MAASSEN ,  Joost Jeroen OTTENS ,  Long MA ,  Youfei JIANG ,  Weihua YIN ,  Wei-Te LI ,  Xuedong LIU

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/1474 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/1505 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.

公开(公告)号：US20210217582A1

公开(公告)日：2021-07-15

申请号：US17251724

申请日：2019-06-07

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus, Maria, Johannes MAASSEN ,  Joost Jeroen OTTENS ,  Long MA ,  Youfei JIANG ,  Weihua YIN ,  Wei-Te LI ,  Xuedong LIU

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.

公开(公告)号：US20230223233A1

公开(公告)日：2023-07-13

申请号：US18117369

申请日：2023-03-03

Applicant: ASML Netherlands B.V.

Inventor： Diego MARTINEZ NEGRETE GASQUE ,  Vincent Claude BEUGIN ,  Weihua YIN

IPC: H01J37/317 ,  H01J37/28 ,  H01J37/12

CPC classification number: H01J37/3177 ,  H01J37/28 ,  H01J37/12

Abstract: A charged particle system generates a charged particle multi beam along a multi beam path. The charged particle system comprises an aperture array, a beam limit array and a condenser lens. In the aperture array are an array of apertures to generate from an up-beam charged particle source charged particle paths down-beam of the aperture array. The beam-limit array is down-beam of the aperture array. Defined in the beam-limit array is an array of beam-limit apertures for shaping the charged particle multi beam path. The condenser lens system is between the aperture array and the beam-limit array. The condenser lens system selectively operates different of rotation settings that define different ranges of beam paths between the aperture array and the beam-limit array. At each rotation setting of the condenser lens system, each beam-limit aperture of the beam-limit array lies on a beam path down-beam of the aperture array.

公开(公告)号：US20220102111A1

公开(公告)日：2022-03-31

申请号：US17494518

申请日：2021-10-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Weihua YIN ,  Youfei JIANG

IPC: H01J37/26 ,  H01J37/12 ,  H01J37/147

Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.