公开(公告)号：US20240085796A1

公开(公告)日：2024-03-14

申请号：US18380439

申请日：2023-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rui Miguel DUARTE RODRIGUES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20200089124A1

公开(公告)日：2020-03-19

申请号：US16469689

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johanne BERENDSEN ,  Rui Miguel DUARTE RODRIGES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART (IV) ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20210063899A1

公开(公告)日：2021-03-04

申请号：US16961747

申请日：2019-02-12

Applicant: ASML Netherlands B.V.

Inventor： Chunguang Xia ,  Jonghoon Baek ,  John Tom Stewart, IV ,  Andrew David LaForge ,  Deniz Van Heijnsbergen ,  David Robert Evans ,  Nina Vladimirovna Dziomkina ,  Yue MA

IPC: G03F7/20 ,  H01J37/32 ,  H05G2/00 ,  H05H1/46

Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

公开(公告)号：US20230367224A1

公开(公告)日：2023-11-16

申请号：US18225439

申请日：2023-07-24

Applicant: ASML Netherlands B.V.

Inventor： Hrishikesh PATEL ,  Yue MA ,  Günes MAKIBOGLU ,  Albert Pieter RIJPMA ,  Antonius Johannus VAN DER NET ,  Rens Henricus VERHEES ,  Zongquan YANG

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation source includes a fuel supply, a collector, a debris mitigation system, and a temperature control system. The fuel supply device supplies fuel. The excitation device excites the fuel into a plasma. The collector collects radiation emitted by the plasma and directs the radiation to a beam exit. The debris mitigation system collects debris generated by the plasma and has a first component having a first conduit passing therethrough and a second component having a second conduit passing therethrough. The temperature control system increases or decreases temperatures of the first component and the second component by selectively heating or cooling a thermal transfer fluid circulating through the respective conduit. The temperature control system cools the first component to a first temperature that is below the melting point of the fuel and heats the second component to a second temperature that is above the melting point of the fuel.

公开(公告)号：US20210141311A1

公开(公告)日：2021-05-13

申请号：US17155951

申请日：2021-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rui Miguel DUARTE RODRIGUES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.