公开(公告)号：US20250006476A1

公开(公告)日：2025-01-02

申请号：US18704959

申请日：2022-10-19

Applicant: ATONARP INC.

Inventor： Hirofumi NAGAO ,  Shinichi MIKI ,  Naoki TAKAHASHI ,  Prakash Sreedhar MURTHY

IPC: H01J37/32

Abstract: A gas analyzer apparatus includes: a sample chamber that is provided with a dielectric wall structure and into which a sample gas to be measured flows; a plasma generation mechanism for generating plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field through the dielectric wall structure; a gas input apparatus configured to cause only the sample gas to flow from a process into the sample chamber; a first detector configured to detect components in the plasma by filtered ionized gas from the generated plasma; and a second detector configured to analyze light emission of ions in the plasma inside the sample chamber and output a second detection result that is to be synchronized with the first detection result of the first detector.

公开(公告)号：US20230045932A1

公开(公告)日：2023-02-16

申请号：US17792947

申请日：2021-01-15

Applicant: ATIK CO., LTD. ,  ATONARP INC.

Inventor： Young Ho HONG ,  Hyun Sik CHOI ,  Ki Woo HONG ,  Hirofumi NAGAO ,  Shinichi MIKI

IPC: H01L21/67 ,  G01N1/24 ,  G01N1/22 ,  G05D7/06 ,  C23C16/52 ,  C23C16/455

Abstract: Provided is a system for stabilizing a flow of gas introduced into a sensor, wherein, in connection with manufacturing equipment comprising a process chamber, a process chamber vacuum pump installed to remove internal gas of the process chamber, and a sensor device configured to be able to receive the internal gas of the process chamber through a sensor connecting pipe and to detect components thereof, the system comprises a sensor connecting pipe and a bypass pipe branching off from the sensor connecting pipe such that a part of the gas can be directly discharged to the outside without being introduced into the sensor, and the system is accordingly configured to stably provide the sensor device with a part of the internal gas within a predetermined range per time, regardless of a change in the pressure state of the process chamber.