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公开(公告)号：US20250020613A1
公开(公告)日：2025-01-16
申请号：US18787526
申请日：2024-07-29
Applicant: ATONARP INC.
Inventor： Naoki TAKAHASHI
IPC: G01N27/623 , H01J49/04 , H01J49/10 , H01J49/42
Abstract: A gas analyzing apparatus includes: an ionization device that generates an ion flow of a sample gas; an analyzer that analyzes the ion flow supplied from the ionization device; a first ion path that non-linearly guides the ion flow from the ionization device to an inlet of the analyzer; and a blocking device for intermittently blocking and releasing, using an electric field or a magnetic field, the ion flow on at least part of a path of the ion flow through the first ion path to a mass filter of the analyzer. It is possible to perform measurement in a state where the ion flow is blocked and measurement in a state where the ion flow is not blocked.
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公开(公告)号：US20230187190A1
公开(公告)日：2023-06-15
申请号：US18065656
申请日：2022-12-14
Applicant: ATONARP INC.
Inventor： Naoki TAKAHASHI , Prakash Sreedhar MURTHY
CPC classification number: H01J37/32981 , H01J37/321 , H01J37/32348 , H01J37/32449 , H01J37/32963 , H01J49/105 , H01J2237/057 , H01J2237/332 , H01J2237/334 , H01J2237/335
Abstract: There is provided a gas analyzer apparatus including: a sample chamber which is equipped with a dielectric wall structure and into which only sample gas to be measured is introduced; a plasma generation mechanism that generates plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field applied through the dielectric wall structure; and an analyzer unit that analyzes the sample gas via the generated plasma. By doing so, it is possible to provide a gas analyzer apparatus capable of accurately analyzing sample gases, even those including corrosive gas, over a long period of time.
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公开(公告)号：US20220221426A1
公开(公告)日：2022-07-14
申请号：US17708377
申请日：2022-03-30
Applicant: ATONARP INC.
Inventor： Naoki TAKAHASHI , Prakash Sreedhar MURTHY
IPC: G01N27/64
Abstract: There is provided a gas analyzer apparatus that analyzes inflowing sample gas. The gas analyzer apparatus includes a filter unit that filters the sample gas, a detector unit that detects the result of filtering, a housing that houses these elements, and a control unit that controls the respective potentials of these elements. The control unit includes a cleaning control unit that sets the respective potentials of the filter unit, the detector unit, and the housing to cleaning potentials that draws in, as plasma for cleaning purposes, process plasma from a source that supplies the sample gas or plasma generated by a plasma generation unit.
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Patent Agency Ranking
公开(公告)号：US20240266155A1
公开(公告)日：2024-08-08
申请号：US18442177
申请日：2024-02-15
Applicant: ATONARP INC.
Inventor： Naoki TAKAHASHI , Prakash Sreedhar MURTHY
CPC classification number: H01J37/32981 , H01J37/321 , H01J37/32348 , H01J37/32449 , H01J37/32963 , H01J49/105 , H01J2237/057 , H01J2237/332 , H01J2237/334 , H01J2237/335
Abstract: There is provided a gas analyzer apparatus including: a sample chamber which is equipped with a dielectric wall structure and into which only sample gas to be measured is introduced; a plasma generation mechanism that generates plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field applied through the dielectric wall structure; and an analyzer unit that analyzes the sample gas via the generated plasma. By doing so, it is possible to provide a gas analyzer apparatus capable of accurately analyzing sample gases, even those including corrosive gas, over a long period of time.
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公开(公告)号：US20250006476A1
公开(公告)日：2025-01-02
申请号：US18704959
申请日：2022-10-19
Applicant: ATONARP INC.
Inventor： Hirofumi NAGAO , Shinichi MIKI , Naoki TAKAHASHI , Prakash Sreedhar MURTHY
IPC: H01J37/32
Abstract: A gas analyzer apparatus includes: a sample chamber that is provided with a dielectric wall structure and into which a sample gas to be measured flows; a plasma generation mechanism for generating plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field through the dielectric wall structure; a gas input apparatus configured to cause only the sample gas to flow from a process into the sample chamber; a first detector configured to detect components in the plasma by filtered ionized gas from the generated plasma; and a second detector configured to analyze light emission of ions in the plasma inside the sample chamber and output a second detection result that is to be synchronized with the first detection result of the first detector.
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公开(公告)号：US20240258092A1
公开(公告)日：2024-08-01
申请号：US18635131
申请日：2024-04-15
Applicant: ATONARP INC.
Inventor： Naoki TAKAHASHI
CPC classification number: H01J49/105 , H05H1/30 , H01J49/4215
Abstract: A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.
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公开(公告)号：US20240068989A1
公开(公告)日：2024-02-29
申请号：US18261412
申请日：2022-01-25
Applicant: ATONARP INC.
Inventor： Naoki TAKAHASHI
IPC: G01N27/623 , H01J49/04 , H01J49/10 , H01J49/42
CPC classification number: G01N27/623 , H01J49/0422 , H01J49/105 , H01J49/421 , H01J49/429
Abstract: A gas analyzing apparatus includes: an ionization device that generates an ion flow of a sample gas; an analyzer that analyzes the ion flow supplied from the ionization device; a first ion path that non-linearly guides the ion flow from the ionization device to an inlet of the analyzer; and a blocking device for intermittently blocking and releasing, using an electric field or a magnetic field, the ion flow on at least part of a path of the ion flow through the first ion path to a mass filter of the analyzer. It is possible to perform measurement in a state where the ion flow is blocked and measurement in a state where the ion flow is not blocked.
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公开(公告)号：US20230187195A1
公开(公告)日：2023-06-15
申请号：US17912226
申请日：2021-03-29
Applicant: ATONARP INC.
Inventor： Naoki TAKAHASHI
CPC classification number: H01J49/105 , H05H1/30 , H01J49/4215
Abstract: A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.
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