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1.
公开(公告)号:US09230846B2
公开(公告)日:2016-01-05
申请号:US13153679
申请日:2011-06-06
IPC分类号: C23C16/00 , H01L21/687 , C23C16/458
CPC分类号: H01L21/68771 , C23C16/4584 , H01L21/68764
摘要: Wafer carriers and methods for moving wafers in a reactor. The wafer carrier may include a platen with a plurality of compartments and a plurality of wafer platforms. The platen is configured to rotate about a first axis. Each of the wafer platforms is associated with one of the compartments and is configured to rotate about a respective second axis relative to the respective compartment. The platen and the wafer platforms rotate with different angular velocities to create planetary motion therebetween. The method may include rotating a platen about a first axis of rotation. The method further includes rotating each of a plurality of wafer platforms carried on the platen and carrying the wafers about a respective second axis of rotation and with a different angular velocity than the platen to create planetary motion therebetween.
摘要翻译: 用于在反应器中移动晶片的晶片载体和方法。 晶片载体可以包括具有多个隔室和多个晶片平台的压板。 压板被构造成围绕第一轴线旋转。 每个晶片平台与隔室中的一个相关联并且被构造成相对于相应的隔室围绕相应的第二轴线旋转。 压板和晶片平台以不同的角速度旋转以在它们之间产生行星运动。 该方法可以包括围绕第一旋转轴旋转压板。 该方法还包括旋转承载在压板上的多个晶片平台中的每一个,并且以相对于第二旋转轴线的速度运送晶片,并以与该压板相对的角速度不同以在其间产生行星运动。
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公开(公告)号:US20110300297A1
公开(公告)日:2011-12-08
申请号:US13153679
申请日:2011-06-06
IPC分类号: C23C16/458 , B05C13/02
CPC分类号: H01L21/68771 , C23C16/4584 , H01L21/68764
摘要: Wafer carriers and methods for moving wafers in a reactor. The wafer carrier may include a platen with a plurality of compartments and a plurality of wafer platforms. The platen is configured to rotate about a first axis. Each of the wafer platforms is associated with one of the compartments and is configured to rotate about a respective second axis relative to the respective compartment. The platen and the wafer platforms rotate with different angular velocities to create planetary motion therebetween. The method may include rotating a platen about a first axis of rotation. The method further includes rotating each of a plurality of wafer platforms carried on the platen and carrying the wafers about a respective second axis of rotation and with a different angular velocity than the platen to create planetary motion therebetween.
摘要翻译: 用于在反应器中移动晶片的晶片载体和方法。 晶片载体可以包括具有多个隔室和多个晶片平台的压板。 压板被构造成围绕第一轴线旋转。 每个晶片平台与隔室中的一个相关联并且被构造成相对于相应的隔室围绕相应的第二轴线旋转。 压板和晶片平台以不同的角速度旋转以在它们之间产生行星运动。 该方法可以包括围绕第一旋转轴旋转压板。 该方法还包括旋转承载在压板上的多个晶片平台中的每一个,并且以相对于第二旋转轴线的速度运送晶片,并以与该压板相对的角速度不同以在其间产生行星运动。
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