公开(公告)号：US20120223048A1

公开(公告)日：2012-09-06

申请号：US13392246

申请日：2010-08-26

申请人： Ajit Paranjpe ,  Todd A. Luse ,  Roger P. Fremgen ,  Narasimhan Srinivasan ,  Boris L. Druz ,  Katrina Rook ,  Adrian Celaru

发明人： Ajit Paranjpe ,  Todd A. Luse ,  Roger P. Fremgen ,  Narasimhan Srinivasan ,  Boris L. Druz ,  Katrina Rook ,  Adrian Celaru

IPC分类号： G11B5/84 ,  B44C1/22 ,  B05C13/02

CPC分类号： G11B5/855 ,  C23C14/042 ,  C23C14/046 ,  C23C14/505 ,  H01L21/67173 ,  H01L21/67709 ,  H01L21/67712 ,  H01L21/67718 ,  H01L21/67742 ,  H01L21/67754

摘要： An inline processing system for patterning magnetic recording layers on hard discs for use in a hard disc drive. Discs are processed on both sides simultaneously in a vertical orientation, in round plate-like holders called MDCs. A plurality (as many as 10) discs are held in a dial carrier of the MDC, and transferred from one process station to another. The dial carrier of the MDC may be rotated and/or angled at up to 70° from normal in each process station, so that one or a plurality of process sources may treat the discs simultaneously. This configuration provides time savings and a reduction in the number and size of process sources needed. A mask enhancement process for patterning of magnetic media, and a filling and planarizing process used therewith, are also disclosed.

摘要翻译： 一种用于在用于硬盘驱动器的硬盘上图案化磁记录层的在线处理系统。 光盘在垂直方向同时处理，在称为MDC的圆盘状支架中。 多个（多达10个）盘被保存在MDC的拨号载体中，并从一个处理站传送到另一个处理站。 MDC的拨号盘可以在每个处理站中与正常旋转和/或成角度高达70°，使得一个或多个处理源可以同时处理盘。 此配置可节省时间并减少所需的进程源的数量和大小。 还公开了用于磁性介质图案化的掩模增强工艺，以及与其一起使用的填充和平坦化工艺。

公开(公告)号：US20110300297A1

公开(公告)日：2011-12-08

申请号：US13153679

申请日：2011-06-06

申请人： Adrian Celaru ,  Todd A. Luse ,  Ajit P. Paranjpe ,  Joseph Scandariato ,  Quinfu Tang

发明人： Adrian Celaru ,  Todd A. Luse ,  Ajit P. Paranjpe ,  Joseph Scandariato ,  Quinfu Tang

IPC分类号： C23C16/458 ,  B05C13/02

CPC分类号： H01L21/68771 ,  C23C16/4584 ,  H01L21/68764

摘要： Wafer carriers and methods for moving wafers in a reactor. The wafer carrier may include a platen with a plurality of compartments and a plurality of wafer platforms. The platen is configured to rotate about a first axis. Each of the wafer platforms is associated with one of the compartments and is configured to rotate about a respective second axis relative to the respective compartment. The platen and the wafer platforms rotate with different angular velocities to create planetary motion therebetween. The method may include rotating a platen about a first axis of rotation. The method further includes rotating each of a plurality of wafer platforms carried on the platen and carrying the wafers about a respective second axis of rotation and with a different angular velocity than the platen to create planetary motion therebetween.

摘要翻译： 用于在反应器中移动晶片的晶片载体和方法。 晶片载体可以包括具有多个隔室和多个晶片平台的压板。 压板被构造成围绕第一轴线旋转。 每个晶片平台与隔室中的一个相关联并且被构造成相对于相应的隔室围绕相应的第二轴线旋转。 压板和晶片平台以不同的角速度旋转以在它们之间产生行星运动。 该方法可以包括围绕第一旋转轴旋转压板。 该方法还包括旋转承载在压板上的多个晶片平台中的每一个，并且以相对于第二旋转轴线的速度运送晶片，并以与该压板相对的角速度不同以在其间产生行星运动。

公开(公告)号：US09230846B2

公开(公告)日：2016-01-05

申请号：US13153679

申请日：2011-06-06

申请人： Adrian Celaru ,  Todd A. Luse ,  Ajit P. Paranjpe ,  Joseph Scandariato ,  Qingfu Tang

发明人： Adrian Celaru ,  Todd A. Luse ,  Ajit P. Paranjpe ,  Joseph Scandariato ,  Qingfu Tang

IPC分类号： C23C16/00 ,  H01L21/687 ,  C23C16/458

CPC分类号： H01L21/68771 ,  C23C16/4584 ,  H01L21/68764

摘要： Wafer carriers and methods for moving wafers in a reactor. The wafer carrier may include a platen with a plurality of compartments and a plurality of wafer platforms. The platen is configured to rotate about a first axis. Each of the wafer platforms is associated with one of the compartments and is configured to rotate about a respective second axis relative to the respective compartment. The platen and the wafer platforms rotate with different angular velocities to create planetary motion therebetween. The method may include rotating a platen about a first axis of rotation. The method further includes rotating each of a plurality of wafer platforms carried on the platen and carrying the wafers about a respective second axis of rotation and with a different angular velocity than the platen to create planetary motion therebetween.

摘要翻译： 用于在反应器中移动晶片的晶片载体和方法。 晶片载体可以包括具有多个隔室和多个晶片平台的压板。 压板被构造成围绕第一轴线旋转。 每个晶片平台与隔室中的一个相关联并且被构造成相对于相应的隔室围绕相应的第二轴线旋转。 压板和晶片平台以不同的角速度旋转以在它们之间产生行星运动。 该方法可以包括围绕第一旋转轴旋转压板。 该方法还包括旋转承载在压板上的多个晶片平台中的每一个，并且以相对于第二旋转轴线的速度运送晶片，并以与该压板相对的角速度不同以在其间产生行星运动。

公开(公告)号：US20070283709A1

公开(公告)日：2007-12-13

申请号：US11423361

申请日：2006-06-09

申请人： Todd Arthur Luse ,  Roger Fremgen ,  William J. Miller ,  Adrian Celaru

发明人： Todd Arthur Luse ,  Roger Fremgen ,  William J. Miller ,  Adrian Celaru

IPC分类号： F25B21/02 ,  F25D23/12

CPC分类号： H01L21/67109 ,  F25B21/02 ,  H01L21/67103 ,  H01L21/67248

摘要： Apparatus and methods for improving the control of the temperature of a supported member, such as a substrate, in high vacuum processing systems, such as ion beam etch (IBE) systems. The apparatus includes thermoelectric devices that transfer heat from a support member supporting the supported member to a liquid-cooled heat exchange member to regulate the temperature of the support member. The method includes cooling the support member with thermoelectric devices that transfer the heat to the liquid-cooled heat exchange member.

摘要翻译： 用于改进在诸如离子束蚀刻（IBE）系统的高真空处理系统中的诸如衬底的被支撑构件的温度控制的装置和方法。 该装置包括将热量从支撑支撑部件的支撑部件传递到液体冷却热交换部件以调节支撑部件的温度的热电装置。 该方法包括用将热量转移到液冷的热交换构件的热电装置来冷却支撑构件。

公开(公告)号：US07183716B2

公开(公告)日：2007-02-27

申请号：US10772132

申请日：2004-02-04

申请人： Viktor Kanarov ,  Alan V. Hayes ,  Rustam Yevtukhov ,  Ira Reiss ,  Roger P. Fremgen, Jr. ,  Adrian Celaru ,  Kurt E. Williams ,  Carlos Fernando de Mello Borges ,  Boris L. Druz ,  Renga Rajan ,  Hari Hegde

发明人： Viktor Kanarov ,  Alan V. Hayes ,  Rustam Yevtukhov ,  Ira Reiss ,  Roger P. Fremgen, Jr. ,  Adrian Celaru ,  Kurt E. Williams ,  Carlos Fernando de Mello Borges ,  Boris L. Druz ,  Renga Rajan ,  Hari Hegde

IPC分类号： H01J7/24

CPC分类号： H01L21/67253 ,  H01J27/18 ,  H01J37/321 ,  H01J37/32458 ,  H01L21/67069

摘要： A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.

摘要翻译： 带电粒子源利用新颖的等离子体处理室，RF线圈和离子光学器件，以实现高均匀性。 等离子体处理室具有可移动的并且包括可调节形状或位置的延伸部的入口容器，以使包含在室内的等离子体更均匀。 一个或多个可以是静态或移动的磁体可以包括在重入容器内。 离子光学器件包括具有多个孔的栅格，以及每个围绕孔的调谐特征。 这些调谐功能可以减小相关孔径的直径，或增加该孔径的长度，从而形成从网格出现的更均匀的子束。 RF线圈包括在其至少一个角度区域中邻近绕组定位的磁通集中器，以调谐由此产生的磁场。