Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detector
    1.
    发明授权
    Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detector 有权
    电子束检测器,电子束处理装置和电子束检测器的制造方法

    公开(公告)号:US08779378B2

    公开(公告)日:2014-07-15

    申请号:US13968022

    申请日:2013-08-15

    Abstract: There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and a beam detection element disposed at a predetermined distance below the scatterer and configured to convert an electron beam into an electric signal. In the electron beam detector, the scatterer is disposed at an equal distance from any of the openings in the shield, and the beam detection element is disposed at an equal distance from any of the openings in the shield. Thus, the electron beam detector can suppress a variation in detection sensitivity depending on the position of the opening.

    Abstract translation: 提供了一种电子束检测器,其包括电子束散射体,该电子束散射体设置在包括形成在其中的多个开口的屏蔽下方的预定距离处;以及光束检测元件,其设置在散射体下方预定距离处,并且被配置为将电子束 变成电信号。 在电子束检测器中,散射体设置在与屏蔽件中的任何开口相等的距离处,并且光束检测元件设置在与屏蔽件中的任何开口相等的距离处。 因此,电子束检测器可以根据开口的位置抑制检测灵敏度的变化。

    ELECTRON BEAM DETECTOR, ELECTRON BEAM PROCESSING APPARATUS, AND METHOD OF MANUFACTURING ELECTRON BEAM DETECTOR
    2.
    发明申请
    ELECTRON BEAM DETECTOR, ELECTRON BEAM PROCESSING APPARATUS, AND METHOD OF MANUFACTURING ELECTRON BEAM DETECTOR 有权
    电子束检测器,电子束处理装置和电子束检测器的制造方法

    公开(公告)号:US20140061465A1

    公开(公告)日:2014-03-06

    申请号:US13968022

    申请日:2013-08-15

    Abstract: There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and a beam detection element disposed at a predetermined distance below the scatterer and configured to convert an electron beam into an electric signal. In the electron beam detector, the scatterer is disposed at an equal distance from any of the openings in the shield, and the beam detection element is disposed at an equal distance from any of the openings in the shield. Thus, the electron beam detector can suppress a variation in detection sensitivity depending on the position of the opening.

    Abstract translation: 提供了一种电子束检测器,其包括电子束散射体,该电子束散射体设置在包括形成在其中的多个开口的屏蔽下方的预定距离处;以及光束检测元件,其设置在散射体下方预定距离处,并且被配置为将电子束 变成电信号。 在电子束检测器中,散射体设置在与屏蔽件中的任何开口相等的距离处,并且光束检测元件设置在与屏蔽件中的任何开口相等的距离处。 因此,电子束检测器可以根据开口的位置抑制检测灵敏度的变化。

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