公开(公告)号：US08859993B2

公开(公告)日：2014-10-14

申请号：US13967970

申请日：2013-08-15

Applicant: Advantest Corporation

Inventor： Hirofumi Hayakawa ,  Akiyoshi Tsuda

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/2007 ,  H01L21/6833 ,  H01L21/68728

Abstract: A sample holder to be disposed between an electrostatic chuck and a sample smaller than the upper surface of the electrostatic chuck is provided, the sample holder including: a base plate formed in the same size as the upper surface of the electrostatic chuck; a sample placement portion located on the upper surface of the base plate, and designed to place the sample thereon; and a circumferential portion being a portion of the upper surface of the base plate other than the sample placement portion, and having a conductive material exposed to the outside.

Abstract translation: 设置在静电卡盘和小于静电卡盘的上表面的样本之间的样品保持器，所述样品保持器包括：形成为与所述静电卡盘的上表面相同尺寸的基板; 位于所述基板的上表面上并被设计成将样品放置在其上的样品放置部分; 以及作为除了样品放置部以外的基板的上表面的一部分的周向部，并且具有暴露于外部的导电材料。

公开(公告)号：US08779378B2

公开(公告)日：2014-07-15

申请号：US13968022

申请日：2013-08-15

Applicant: Advantest Corporation

Inventor： Kenji Abe ,  Masaki Kurokawa ,  Akiyoshi Tsuda ,  Hideki Nasuno

IPC: H01J49/00 ,  H01J37/244 ,  H01J9/00 ,  G01N23/00 ,  G01N7/00

CPC classification number: H01J37/244 ,  H01J9/00 ,  H01J9/02 ,  H01J37/28 ,  H01J2237/24405

Abstract: There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and a beam detection element disposed at a predetermined distance below the scatterer and configured to convert an electron beam into an electric signal. In the electron beam detector, the scatterer is disposed at an equal distance from any of the openings in the shield, and the beam detection element is disposed at an equal distance from any of the openings in the shield. Thus, the electron beam detector can suppress a variation in detection sensitivity depending on the position of the opening.

Abstract translation: 提供了一种电子束检测器，其包括电子束散射体，该电子束散射体设置在包括形成在其中的多个开口的屏蔽下方的预定距离处;以及光束检测元件，其设置在散射体下方预定距离处，并且被配置为将电子束 变成电信号。 在电子束检测器中，散射体设置在与屏蔽件中的任何开口相等的距离处，并且光束检测元件设置在与屏蔽件中的任何开口相等的距离处。 因此，电子束检测器可以根据开口的位置抑制检测灵敏度的变化。

公开(公告)号：US20140061465A1

公开(公告)日：2014-03-06

申请号：US13968022

申请日：2013-08-15

Applicant: ADVANTEST CORPORATION

Inventor： Kenji Abe ,  Masaki Kurokawa ,  Akiyoshi Tsuda ,  Hideki Nasuno

IPC: H01J37/244 ,  H01J9/00

CPC classification number: H01J37/244 ,  H01J9/00 ,  H01J9/02 ,  H01J37/28 ,  H01J2237/24405

Abstract: There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and a beam detection element disposed at a predetermined distance below the scatterer and configured to convert an electron beam into an electric signal. In the electron beam detector, the scatterer is disposed at an equal distance from any of the openings in the shield, and the beam detection element is disposed at an equal distance from any of the openings in the shield. Thus, the electron beam detector can suppress a variation in detection sensitivity depending on the position of the opening.

Abstract translation: 提供了一种电子束检测器，其包括电子束散射体，该电子束散射体设置在包括形成在其中的多个开口的屏蔽下方的预定距离处;以及光束检测元件，其设置在散射体下方预定距离处，并且被配置为将电子束 变成电信号。 在电子束检测器中，散射体设置在与屏蔽件中的任何开口相等的距离处，并且光束检测元件设置在与屏蔽件中的任何开口相等的距离处。 因此，电子束检测器可以根据开口的位置抑制检测灵敏度的变化。

公开(公告)号：US20140048720A1

公开(公告)日：2014-02-20

申请号：US13967970

申请日：2013-08-15

Applicant: ADVANTEST CORPORATION

Inventor： Hirofumi Hayakawa ,  Akiyoshi Tsuda

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/2007 ,  H01L21/6833 ,  H01L21/68728

Abstract: A sample holder to be disposed between an electrostatic chuck and a sample smaller than the upper surface of the electrostatic chuck is provided, the sample holder including: a base plate formed in the same size as the upper surface of the electrostatic chuck; a sample placement portion located on the upper surface of the base plate, and designed to place the sample thereon; and a circumferential portion being a portion of the upper surface of the base plate other than the sample placement portion, and having a conductive material exposed to the outside.

Abstract translation: 设置在静电卡盘和小于静电卡盘的上表面的样本之间的样品保持器，所述样品保持器包括：形成为与所述静电卡盘的上表面相同尺寸的基板; 位于所述基板的上表面上并被设计成将样品放置在其上的样品放置部分; 以及作为除了样品放置部以外的基板的上表面的一部分的周向部，并且具有暴露于外部的导电材料。