公开(公告)号：US20150200074A1

公开(公告)日：2015-07-16

申请号：US14562095

申请日：2014-12-05

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Shinji Sugatani ,  Akio Yamada

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453

Abstract: Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.

Abstract translation: 提供如下配置的带电粒子束曝光装置。 从电子枪发射的电子束由不对称的照明光学系统变形以具有细长的部分。 然后将电子束施加到具有布置成一行的多个孔的束形成孔板，从而产生多个电子束。 通过在半导体衬底上沿垂直于线图案的方向移动舞台装置，并且通过使用第二装置与舞台装置的移动同步地打开或关闭多个电子束来对预定图案进行曝光 挡板和最终孔板。

公开(公告)号：US10573491B2

公开(公告)日：2020-02-25

申请号：US15099619

申请日：2016-04-15

Applicant: ADVANTEST CORPORATION

Inventor： Akio Yamada ,  Shinji Sugatani ,  Masaki Kurokawa ,  Masahiro Takizawa ,  Ryuma Iwashita

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/04

Abstract: To realize a multi-beam formation device that can stably machine a fine pattern using complementary lithography, provided is a device that deforms and deflects a beam, including an aperture layer having a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section having a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section having an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode facing the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.

公开(公告)号：US20170323760A1

公开(公告)日：2017-11-09

申请号：US15461829

申请日：2017-03-17

Applicant: ADVANTEST CORPORATION

Inventor： Masaki Kurokawa ,  Takamasa Sato ,  Shinichi Kojima ,  Akio Yamada

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/147 ,  H01J37/241 ,  H01J37/3177 ,  H01J2237/141 ,  H01J2237/1504 ,  H01J2237/152 ,  H01J2237/1526 ,  H01J2237/20285

Abstract: A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

公开(公告)号：US09607807B2

公开(公告)日：2017-03-28

申请号：US14878713

申请日：2015-10-08

Applicant: ADVANTEST CORPORATION

Inventor： Akio Yamada ,  Tatsuro Okawa ,  Masahiro Seyama ,  Masaki Kurokawa

IPC: H01J37/00 ,  H01J37/304 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/304 ,  H01J37/20 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/15 ,  H01J2237/202 ,  H01J2237/3175 ,  H01J2237/31761

Abstract: There is provided a charged particle beam exposure apparatus which turns an array beam including a plurality of charged particle beams, being arranged side by side in a line in a direction intersecting line patterns, on and off at predetermined blanking timing, and thus performs irradiation when irradiated positions of the charged particle beams arrive at pattern positions. The charged particle beam exposure apparatus improves data processing control by segmenting a sample provided with line patterns into a plurality of exposure ranges each at a predetermined length in a direction of movement, and performing on-off control of the beams based on a point of time when the array beam passes on a reference position set in the exposure region.

公开(公告)号：US09213240B2

公开(公告)日：2015-12-15

申请号：US14632944

申请日：2015-02-26

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: G03F7/20 ,  G03F1/20 ,  H01J37/317 ,  G03F1/50

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract translation: 电子束曝光方法包括以下步骤：制备具有通过将绘制对象图案划分为可曝光区域而形成的多个开口图案的曝光掩模; 以及通过利用穿过曝光掩模的开口图案的电子束进行曝光来画出绘制对象图案。 作为曝光掩模的每个开口图案中的接头的每个端部设置有在开口图案的宽度上渐缩的接合部。 以这样的方式进行曝光，使得通过相邻的接合部分拉出的部分彼此重叠。

公开(公告)号：US08779378B2

公开(公告)日：2014-07-15

申请号：US13968022

申请日：2013-08-15

Applicant: Advantest Corporation

Inventor： Kenji Abe ,  Masaki Kurokawa ,  Akiyoshi Tsuda ,  Hideki Nasuno

IPC: H01J49/00 ,  H01J37/244 ,  H01J9/00 ,  G01N23/00 ,  G01N7/00

CPC classification number: H01J37/244 ,  H01J9/00 ,  H01J9/02 ,  H01J37/28 ,  H01J2237/24405

Abstract: There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and a beam detection element disposed at a predetermined distance below the scatterer and configured to convert an electron beam into an electric signal. In the electron beam detector, the scatterer is disposed at an equal distance from any of the openings in the shield, and the beam detection element is disposed at an equal distance from any of the openings in the shield. Thus, the electron beam detector can suppress a variation in detection sensitivity depending on the position of the opening.

Abstract translation: 提供了一种电子束检测器，其包括电子束散射体，该电子束散射体设置在包括形成在其中的多个开口的屏蔽下方的预定距离处;以及光束检测元件，其设置在散射体下方预定距离处，并且被配置为将电子束 变成电信号。 在电子束检测器中，散射体设置在与屏蔽件中的任何开口相等的距离处，并且光束检测元件设置在与屏蔽件中的任何开口相等的距离处。 因此，电子束检测器可以根据开口的位置抑制检测灵敏度的变化。

公开(公告)号：US09478396B2

公开(公告)日：2016-10-25

申请号：US14562095

申请日：2014-12-05

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Shinji Sugatani ,  Akio Yamada

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453

Abstract: Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.

Abstract translation: 提供如下配置的带电粒子束曝光装置。 从电子枪发射的电子束由不对称的照明光学系统变形以具有细长的部分。 然后将电子束施加到具有布置成一行的多个孔的束形成孔板，从而产生多个电子束。 通过在半导体衬底上沿垂直于线图案的方向移动舞台装置，并且通过使用第二装置与舞台装置的移动同步地打开或关闭多个电子束来对预定图案进行曝光 挡板和最终孔板。

公开(公告)号：US09116434B2

公开(公告)日：2015-08-25

申请号：US14056651

申请日：2013-10-17

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: G03F1/20 ,  G03F7/20 ,  H01J37/317 ,  G03F1/50

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

公开(公告)号：US20140120475A1

公开(公告)日：2014-05-01

申请号：US14056651

申请日：2013-10-17

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: G03F7/20

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract translation: 电子束曝光方法包括以下步骤：制备具有通过将绘制对象图案划分为可曝光区域而形成的多个开口图案的曝光掩模; 以及通过利用穿过曝光掩模的开口图案的电子束进行曝光来画出绘制对象图案。 作为曝光掩模的每个开口图案中的接头的每个端部设置有在开口图案的宽度上渐缩的接合部。 以这样的方式进行曝光，使得通过相邻的接合部分拉出的部分彼此重叠。

公开(公告)号：US20160133438A1

公开(公告)日：2016-05-12

申请号：US14878713

申请日：2015-10-08

Applicant: ADVANTEST CORPORATION

Inventor： Akio Yamada ,  Tatsuro Okawa ,  Masahiro Seyama ,  Masaki Kurokawa

IPC: H01J37/304 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/20 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/15 ,  H01J2237/202 ,  H01J2237/3175 ,  H01J2237/31761

Abstract: There is provided a charged particle beam exposure apparatus which turns an array beam including a plurality of charged particle beams, being arranged side by side in a line in a direction intersecting line patterns, on and off at predetermined blanking timing, and thus performs irradiation when irradiated positions of the charged particle beams arrive at pattern positions. The charged particle beam exposure apparatus improves data processing control by segmenting a sample provided with line patterns into a plurality of exposure ranges each at a predetermined length in a direction of movement, and performing on-off control of the beams based on a point of time when the array beam passes on a reference position set in the exposure region.

Abstract translation: 提供了一种带电粒子束曝光装置，其将包括多个带电粒子束的阵列束在预定的消隐时刻沿着与线图案交叉的方向一行地并排设置，并且因此在 带电粒子束的照射位置到达图案位置。 带电粒子束曝光装置通过将具有线图案的样本分割成在移动方向上以预定长度分布的多个曝光范围来改进数据处理控制，并且基于时间点执行光束的开关控制 当阵列光束通过设置在曝光区域中的基准位置时。