公开(公告)号：US20170151598A1

公开(公告)日：2017-06-01

申请号：US15313854

申请日：2015-05-29

Applicant: Agency for Science, Technology and Research

Inventor： Xue LI ,  Saifullah MSM ,  Yee Chong LOKE ,  Karen CHONG

IPC: B21D22/02 ,  G03F7/00 ,  C22C13/02 ,  C22C30/04 ,  B81C1/00 ,  C22C12/00

CPC classification number: B21D22/022 ,  B81B2207/056 ,  B81C1/0046 ,  B81C99/0085 ,  C21D7/04 ,  C21D2261/00 ,  C22C12/00 ,  C22C13/02 ,  C22C30/04 ,  G03F7/0002

Abstract: The present invention relates to a method of forming an imprint on a metal substrate. The method comprises a step of providing a mold having a defined imprint surface pattern in the nano-sized or micro-sized range and a step of pressing the metal substrate against the mold at hot-working temperature to form a nano-sized or micro-sized imprint thereon.