公开(公告)号：US20180059291A1

公开(公告)日：2018-03-01

申请号：US15556291

申请日：2016-03-07

Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH

Inventor： Xue LI ,  Ren Bin YANG ,  Mohamed Sultan Mohiddin SAIFULLAH ,  Siew Ling Karen CHONG ,  Chang Sheng LEE ,  Yee Chong LOKE ,  Ai Yu HE

IPC: G02B1/18 ,  G03F7/00 ,  G02B1/118 ,  C23C16/455

CPC classification number: G02B1/18 ,  B29C43/14 ,  B29C43/50 ,  B29C2059/023 ,  B29K2995/0092 ,  B29K2995/0093 ,  B82Y40/00 ,  C23C16/45525 ,  G02B1/118 ,  G03F7/0002

Abstract: The present invention provides a textured polymer substrate comprising nano-sized surface features that are arranged in a single array or in a hierarchical array, and at least one layer of an amorphous, hydrophilic layer deposited thereon. The disclosed textured polymer substrate is advantageously suited for providing anti-reflective, anti-fogging and anti-UV materials.

公开(公告)号：US20170151598A1

公开(公告)日：2017-06-01

申请号：US15313854

申请日：2015-05-29

Applicant: Agency for Science, Technology and Research

Inventor： Xue LI ,  Saifullah MSM ,  Yee Chong LOKE ,  Karen CHONG

IPC: B21D22/02 ,  G03F7/00 ,  C22C13/02 ,  C22C30/04 ,  B81C1/00 ,  C22C12/00

CPC classification number: B21D22/022 ,  B81B2207/056 ,  B81C1/0046 ,  B81C99/0085 ,  C21D7/04 ,  C21D2261/00 ,  C22C12/00 ,  C22C13/02 ,  C22C30/04 ,  G03F7/0002

Abstract: The present invention relates to a method of forming an imprint on a metal substrate. The method comprises a step of providing a mold having a defined imprint surface pattern in the nano-sized or micro-sized range and a step of pressing the metal substrate against the mold at hot-working temperature to form a nano-sized or micro-sized imprint thereon.