公开(公告)号：US20160135277A1

公开(公告)日：2016-05-12

申请号：US14538396

申请日：2014-11-11

Applicant: Agilent Technologies, Inc.

Inventor： Joseph Duimstra ,  Peter T. Williams

IPC: H05H1/30 ,  G01N21/73 ,  H01J49/10

CPC classification number: H05H1/30 ,  G01N21/73 ,  H01J49/105 ,  H05H2001/3478 ,  H05H2001/4652

Abstract: In a plasma source configured for producing sample atoms for analysis, such as by optical emission spectrometry or mass spectrometry, a plasma torch includes a torch exit in a chamber. A baffle is positioned between the torch exit and an opposing boundary. The baffle may be positioned and configured to suppress or eliminate vortex shedding in the chamber.

Abstract translation: 在被配置用于生成用于分析的样品原子的等离子体源中，例如通过光发射光谱法或质谱法，等离子体焰炬在腔室中包括火炬出口。 挡板位于火炬出口和相对边界之间。 挡板可以被定位和构造成抑制或消除腔室中的涡流脱落。