公开(公告)号：US11892428B2

公开(公告)日：2024-02-06

申请号：US17047682

申请日：2018-04-18

申请人： S.T.JAPAN INC.

发明人： Takao Nakagawa ,  Norio Yasuda

IPC分类号： G01N27/623 ,  B23K26/0622 ,  B23K26/40 ,  G01N21/63 ,  G01N1/04 ,  G01N1/38 ,  G01N1/28 ,  B23K103/00 ,  G01N21/73

CPC分类号： G01N27/623 ,  B23K26/0624 ,  B23K26/40 ,  G01N1/04 ,  G01N1/286 ,  G01N1/38 ,  G01N21/63 ,  B23K2103/54 ,  G01N21/73 ,  G01N2001/045

摘要： A laser ablation device is provided with: a laser light source that outputs a femtosecond pulse laser beam; an optical system that includes a first mirror rotatable about a first axis, a second mirror rotatable about a second axis, a first driving source for rotating the first mirror about the first axis, and a second driving source for rotating the second mirror about the second axis, and that reflects the laser beam from the laser light source toward a sample by the first mirror and the second mirror; and an irradiation controller that, on the basis of the two-dimensional coordinate position of an analysis position, controls the first driving source and the second driving source to irradiate the analysis position with the laser beam.

公开(公告)号：US11694914B2

公开(公告)日：2023-07-04

申请号：US17968124

申请日：2022-10-18

申请人： Elemental Scientific, Inc.

发明人： Tyler Yost ,  Daniel R. Wiederin ,  Beau A. Marth ,  Jared Kaser ,  Jonathan Hein ,  Jae Seok Lee ,  Jae Min Kim ,  Stephen H. Sudyka

IPC分类号： H01L21/67 ,  H01L21/66 ,  G01N21/73 ,  G01N33/00 ,  H01L21/677 ,  H01J49/10 ,  H01J49/00

CPC分类号： H01L21/6719 ,  G01N21/73 ,  H01J49/105 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/67051 ,  H01L21/67126 ,  H01L21/67259 ,  H01L21/67748 ,  H01L21/67772 ,  H01L22/14 ,  H01L22/34 ,  G01N2033/0095 ,  H01J49/00 ,  H01L22/12

摘要： Systems and methods are described for integrated decomposition and scanning of a semiconducting wafer, where a single chamber is utilized for decomposition and scanning of the wafer of interest.

公开(公告)号：US20190101514A1

公开(公告)日：2019-04-04

申请号：US15720669

申请日：2017-09-29

申请人： E I DU PONT DE NEMOURS AND COMPANY

发明人： JONATHAN SAMUEL TSCHRITTER

IPC分类号： G01N31/12 ,  G01N21/73 ,  G01J3/30 ,  D01F6/60 ,  C01B17/96

CPC分类号： G01N31/12 ,  C01B17/96 ,  D01F6/605 ,  G01J3/30 ,  G01N21/73 ,  G01N33/44

摘要： Methods for measuring the sulfur content in a plurality of individual sulfur-containing fiber or article samples, comprising: a) contacting a plurality of samples with a solution comprising potassium hydroxide to convert the sulfur to potassium sulfate; b) concurrently and individually combusting the plurality of samples from step a) in a furnace at a temperature of greater than 650° C. to remove essentially all organic materials to produce a plurality of residues; c) dissolving each of the pluralities of residue in concentrated nitric acid to form individual residue solutions; and d) analyzing the individual residue solutions with Inductively Coupled Plasma (ICP) Emission Spectrometry to determine the sulfur content of each sample.

公开(公告)号：US20180188112A1

公开(公告)日：2018-07-05

申请号：US15905185

申请日：2018-02-26

申请人： Orthobond, Inc.

发明人： Jordan Katz ,  Abe Belkind ,  Randy Clevenger

IPC分类号： G01J3/443 ,  G01N21/73 ,  G01N21/84

CPC分类号： G01J3/443 ,  G01N21/73 ,  G01N21/8422 ,  H01J37/32935 ,  H01J37/32972

摘要： Disclosed herein are embodiments of a novel method and system to analyze films using plasma to produce spectral data and analyzing the spectral data.

公开(公告)号：US09935023B2

公开(公告)日：2018-04-03

申请号：US15630385

申请日：2017-06-22

申请人： Renesas Electronics Corporation

发明人： Toshikazu Hanawa ,  Kazuhide Fukaya ,  Kentaro Yamada

IPC分类号： G01L21/30 ,  G01R31/00 ,  H01L21/66 ,  H01L21/311 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532 ,  G01N21/73 ,  G01N21/84 ,  G01N21/68 ,  H01J37/32

CPC分类号： H01L22/26 ,  G01N21/68 ,  G01N21/73 ,  G01N21/84 ,  G01N2021/8411 ,  G01N2021/8427 ,  G01N2201/1247 ,  H01J37/32963 ,  H01J2237/334 ,  H01L21/31116 ,  H01L21/76802 ,  H01L21/76846 ,  H01L21/76877 ,  H01L23/5226 ,  H01L23/53223 ,  H01L23/53266 ,  H01L23/5329

摘要： A via hole is accurately formed in an interlayer insulating film over a metal wiring. Of emission spectra of plasma to be used for dry etching of the interlayer insulating film, the emission intensities of at least CO, CN, and AlF are monitored such that an end point of the dry etching of the interlayer insulating film is detected based on the emission intensities thereof.

公开(公告)号：US09863920B2

公开(公告)日：2018-01-09

申请号：US14748841

申请日：2015-06-24

申请人： Eastman Chemical Company

发明人： Scott Gregory Gaynor ,  Andrew Ervin McLeod ,  Steven Anthony Wilson ,  Humberto Collazo ,  Larry Wayne Renfro ,  Lydia Juanita Salyer ,  Jeremy Kenneth Steach ,  Michael John Rodig ,  Brian Douglas Seiler ,  Jonathan Horton ,  Clarissa Tatum

IPC分类号： G01N30/02 ,  G01N21/31 ,  G01N21/64 ,  G01N21/73 ,  G01N23/00 ,  G01N24/08 ,  G01N30/72 ,  D01D5/253 ,  D01F1/04 ,  D01F1/10 ,  D01F2/28 ,  G07D7/12 ,  G01N33/36 ,  A24D3/04 ,  A24D3/06 ,  A24D3/00

CPC分类号： G01N30/02 ,  A24D3/00 ,  A24D3/04 ,  A24D3/063 ,  D01D5/253 ,  D01F1/04 ,  D01F1/10 ,  D01F2/28 ,  G01N21/31 ,  G01N21/6428 ,  G01N21/73 ,  G01N23/00 ,  G01N24/087 ,  G01N30/72 ,  G01N33/36 ,  G01N2021/6439 ,  G07D7/12

摘要： Disclosed are fibers which contain identification fibers. The identification fibers can contain a one or more of chemical markers and one or more distinct features, or taggants, which may vary among the fibers or be incorporated throughout all of the fibers. The chemical markers and distinct features can be representative of specific supply chain information. The supply chain information can be used to track the fibers from manufacturing through intermediaries, conversion to final product, and/or the consumer. The disclosed embodiments also relate to the method for making and characterizing the fibers. Characterization of the fibers can include identifying chemical markers and distinct features and correlating the chemical markers and distinct features to manufacturer-specific taggants to determine supply chain information.

公开(公告)号：US09752987B1

公开(公告)日：2017-09-05

申请号：US14635887

申请日：2015-03-02

申请人： Elemental Scientific, Inc.

发明人： Daniel R. Wiederin ,  Austin Schultz

IPC分类号： A61L2/00 ,  G01N21/71 ,  B01J4/02 ,  B01J19/18 ,  G01N21/73 ,  C01B6/06 ,  C01B6/10

CPC分类号： H02P25/188 ,  B01J4/02 ,  B01J19/18 ,  B01J2219/00182 ,  B63H21/14 ,  B63H21/20 ,  B63H23/10 ,  B63H2021/202 ,  B63H2021/205 ,  C01B6/06 ,  C01B6/10 ,  G01N21/714 ,  G01N21/73 ,  H02K3/28 ,  H02K7/183 ,  H02K16/04 ,  H02K19/16 ,  H02K21/024 ,  H02P31/00 ,  Y02T70/5236 ,  Y10S903/906

摘要： The present disclosure is directed to a system and a method for hydride generation. In some embodiments, the system includes an assembly for introducing hydride generation reagents into a mixing path or mixing container, where the assembly includes first chamber configured to contain a first hydride generation reagent and a second chamber configured to contain a second hydride generation reagent. A first plunger is configured to translate within the first chamber and cause a displacement of the first hydride generation reagent, and a second plunger is configured to translate within the second chamber and cause a displacement of the second hydride generation reagent. The assembly further includes base coupling the first plunger and the second plunger together.

公开(公告)号：US09726611B2

公开(公告)日：2017-08-08

申请号：US14668480

申请日：2015-03-25

申请人： Hitachi High-Tech Science Corporation

发明人： Yoshitomo Nakagawa

IPC分类号： G01N21/73 ,  G01N21/68 ,  G01J3/443 ,  H01J49/10 ,  H05H1/30

CPC分类号： G01N21/73 ,  G01J3/443 ,  G01N21/68 ,  H01J49/105 ,  H05H1/30

摘要： An ICP emission spectrometer is schematically configured to include an inductively coupled plasma generation unit, a light condensing unit, a spectroscope, a detector, and a controller. The detector includes a photomultiplier and has a detector controller and an input unit. The photomultiplier has voltage dividing resistors, which make an amplification factor not to become constant immediately due to a change in an application voltage applied to the photomultiplier, but the detector controller controls an idle voltage and an idle voltage application time so that a multiplication factor becomes constant, during a period from when analysis conditions are input to the input unit in advance until a sample containing an analysis-targeted element is introduced into the inductively coupled plasma generation unit.

公开(公告)号：US09711423B2

公开(公告)日：2017-07-18

申请号：US15205069

申请日：2016-07-08

申请人： Renesas Electronics Corporation

发明人： Toshikazu Hanawa ,  Kazuhide Fukaya ,  Kentaro Yamada

IPC分类号： G01L21/30 ,  G01R31/00 ,  H01L21/66 ,  H01L21/311 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532 ,  G01N21/73 ,  G01N21/84

CPC分类号： H01L22/26 ,  G01N21/68 ,  G01N21/73 ,  G01N21/84 ,  G01N2021/8411 ,  G01N2021/8427 ,  G01N2201/1247 ,  H01J37/32963 ,  H01J2237/334 ,  H01L21/31116 ,  H01L21/76802 ,  H01L21/76846 ,  H01L21/76877 ,  H01L23/5226 ,  H01L23/53223 ,  H01L23/53266 ,  H01L23/5329

摘要： A via hole is accurately formed in an interlayer insulating film over a metal wiring. Of emission spectra of plasma to be used for dry etching of the interlayer insulating film, the emission intensities of at least CO, CN, and AlF are monitored such that an end point of the dry etching of the interlayer insulating film is detected based on the emission intensities thereof.

公开(公告)号：US20170045460A1

公开(公告)日：2017-02-16

申请号：US15172886

申请日：2016-06-03

申请人： PERKINELMER HEALTH SCIENCES, INC.

发明人： Peter J. Morrisroe

IPC分类号： G01N21/73

CPC分类号： G01N21/73 ,  G01J3/443 ,  G01N21/68 ,  G01N2201/126 ,  H01J49/105

摘要： A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a loop current along a radial plane of the torch. In some examples, the radial plane of the torch is substantially perpendicular to a longitudinal axis of the torch.

摘要翻译： 提供了一种用于在割炬中维持等离子体的装置。 在某些示例中，该装置包括被配置为耦合到电源并被构造和布置成沿着焊炬的径向平面提供回路电流的第一电极。 在一些示例中，焊炬的径向平面基本上垂直于焊炬的纵向轴线。