公开(公告)号：US06676988B2

公开(公告)日：2004-01-13

申请号：US10014606

申请日：2001-12-14

申请人： Albert Chan ,  Stephen M. Oelsner ,  Thomas J. Simpson ,  Sonia Corrent

发明人： Albert Chan ,  Stephen M. Oelsner ,  Thomas J. Simpson ,  Sonia Corrent

IPC分类号： A61L2700

CPC分类号： A61K51/12 ,  A61K51/1282 ,  A61N5/1002 ,  A61N2005/1019

摘要： This invention relates to radioactively coated devices, preferably radioctively coated medical devices. These coated devices are characterized as having a low rate of leaching of the radioisotope from the surface of the coated device and a uniform radioactive coating, and are therefore suitable for use within biological systems. Methods for coating a device with a radioisotope comprising are also disclosed. One method comprises immersing the device within a solution containing a &ggr;, &bgr;+, &agr;, &bgr;− or &egr; (electron capture) emitting radioisotope, then exposing the immersed substrate to tuned vibrational cavitation to produce a coated substrate. A second method involves coating a substrate using electroless plating, and yet a third method involves the use of electroplating a radioisotope onto a substate of interest. With these methods, the coating procedures are followed by baking the coated substrate at a temperature below the recrystallization temperature of the substrate. Substrates coated using the methods of this invention exhibit very low rates of leaching of the coated radioisotope, and are suitable for use within medical applications, for example as stents, catheters, seeds, protheses, vavles, staples and other wound closure devices, where a localized therapeutic treatment is desired.

摘要翻译： 本发明涉及放射性涂覆的装置，优选放射性涂覆的医疗装置。 这些涂覆装置的特征在于放射性同位素从涂覆装置的表面浸出的速度低，并且具有均匀的放射性涂层，因此适用于生物系统。 还公开了包含放射性同位素的装置的涂覆方法。 一种方法包括将装置浸入含有γ，β，α，β或ε（电子捕获）发射放射性同位素的溶液中，然后将浸没的基底暴露于调谐的振动空化以产生涂覆的基底。 第二种方法包括使用无电镀来涂覆基底，然而第三种方法涉及将放射性同位素电镀到感兴趣的基底上。 利用这些方法，涂覆过程之后，在低于基材的再结晶温度的温度下烘烤涂覆的基材。 使用本发明的方法涂覆的底物显示出非常低的涂覆放射性同位素浸出率，并且适用于医疗应用中，例如作为支架，导管，种子，补片，气泡，缝钉和其它伤口闭合装置，其中 需要局部治疗。