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1.发明申请APPARATUS AND METHOD TO CONTROL LIQUID STAGNATION IN IMMERSION LIQUID RECOVERY 审中-公开用于控制液体液体回收中的液体检测的装置和方法公开(公告)号：US20100220301A1
公开(公告)日：2010-09-02
申请号：US12691173
申请日：2010-01-21
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and a liquid-permeable member. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a chamber. The confinement member includes at least one liquid inlet within the chamber through which a liquid is introduced into the chamber to reduce liquid from becoming stagnated within the chamber.
摘要翻译： 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括限制构件和液体可渗透构件。 限制构件包括出口和孔，将图案化图像投射到物体上。 液体渗透部件覆盖出口并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触室。 所述限制构件包括在所述腔室内的至少一个液体入口，通过所述至少一个液体入口将液体引入所述腔室中以减少液体停滞在所述腔室内。
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2.发明申请公开(公告)号：US20130010271A1
公开(公告)日：2013-01-10
申请号：US13617251
申请日：2012-09-14
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译： 浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中， 液体限制构件和液体分配器。 液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。 液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。 液体转向器位于台架和至少第一多孔部分之间。
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3.发明申请APPARATUS AND METHOD TO CONTROL VACUUM AT POROUS MATERIAL USING MULTIPLE POROUS MATERIALS 有权使用多孔材料控制多孔材料真空的装置和方法公开(公告)号：US20100134773A1
公开(公告)日：2010-06-03
申请号：US12698565
申请日：2010-02-02
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber.
摘要翻译： 浸没液体限制装置从浸没式光刻系统中的浸没区域中浸没液体从浸没区域中恢复，该浸没区域包括投影系统和曝光对象之间的间隙。 该装置包括限制构件，其包括出口和孔，将图案化图像投射到物体上。 第一透液性构件覆盖出口并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一室。 第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室 房间。 在第一室和向第一室供应低压的真空系统之间提供疏水性多孔构件。
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4.发明申请APPARATUS AND METHOD TO CONTROL VACUUM AT POROUS MATERIAL USING MULTIPLE POROUS MATERIALS 有权使用多孔材料控制多孔材料真空的装置和方法公开(公告)号：US20100097585A1
公开(公告)日：2010-04-22
申请号：US12573356
申请日：2009-10-05
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and first and second liquid-permeable members. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. The second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber.
摘要翻译： 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括限制构件和第一和第二液体可渗透构件。 限制构件包括出口和孔，将图案化图像投射到物体上。 第一透液性构件覆盖出口，并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一腔室。 第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室 房间。
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公开(公告)号：US20120257179A1
公开(公告)日：2012-10-11
申请号：US13314860
申请日：2011-12-08
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： Methods and apparatus remove liquid from a surface of a substrate, a substrate table, or both, by applying a vacuum to a passage having first and second opposite ends while the first end is in contact with or close to the liquid. This causes the liquid to flow into the first end of the passage as part of a gas/liquid mixture. At least part of the passage between the first and second ends contacts a porous member. The liquid of the gas/liquid mixture is absorbed into the porous member such that substantially only gas is present at the second end of the passage. Thus, substantially only gas flows towards a vacuum source of the vacuum. A second vacuum may be applied to a collection chamber that contacts the porous member to draw the liquid of the gas/liquid mixture from the passage through the porous member and into the collection chamber.
摘要翻译： 方法和装置通过在具有第一和第二相对端的通道上施加真空，同时在第一端与液体接触或接近液体的同时，从基板，基板台或两者的表面去除液体。 这导致液体作为气体/液体混合物的一部分流入通道的第一端。 第一和第二端之间的通道的至少一部分接触多孔构件。 气体/液体混合物的液体被吸收到多孔构件中，使得在通道的第二端处基本上仅存在气体。 因此，基本上只有气体朝着真空的真空源流动。 第二真空可以施加到与多孔构件接触的收集室，以将气体/液体混合物的液体从通过多孔构件的通道吸入收集室。
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