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公开(公告)号：US20120013861A1
公开(公告)日：2012-01-19
申请号：US13137964
申请日：2011-09-22
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An apparatus and method provide fluid for immersion lithography. A nozzle member that can move in a direction, is arranged to encircle a space under the optical element. The nozzle member can have an input to supply the immersion liquid to the space under the optical element during the exposure, and an output to remove the immersion liquid from a gap between the nozzle member and the wafer during the exposure. Immersion liquid can be supplied at a first rate to the space from a first portion of the nozzle member and at a second rate to the space from a second portion during the exposure. A wafer substrate is exposed by light through the immersion liquid.
摘要翻译： 一种设备和方法为浸没式光刻提供流体。 可以沿一个方向移动的喷嘴构件被布置成围绕光学元件下方的空间。 喷嘴构件可以具有用于在曝光期间将浸没液体供应到光学元件下方的空间的输入，以及在曝光期间从喷嘴构件和晶片之间的间隙移除浸没液体的输出。 浸入液体可以以第一速率从喷嘴构件的第一部分以第二速率从曝光中的第二部分以第二速率供应到空间。 晶片衬底通过浸没液体被光照射。
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2.发明授权Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool 有权喷嘴有助于减少浸没式光刻工具浸没液体的逸出公开(公告)号：US08068209B2
公开(公告)日：2011-11-29
申请号：US12073783
申请日：2008-03-10
CPC分类号： G03F7/70341
摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.
摘要翻译： 浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地”或形状，以及 当基板移动时在另一侧的基板。 该装置包括用于保持具有成像表面的基板的基板保持器和具有最后光学元件的投影光学系统。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 分流器元件位于浸没元件和基底之间。 分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。
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3.发明申请APPARATUS AND METHOD TO CONTROL LIQUID STAGNATION IN IMMERSION LIQUID RECOVERY 审中-公开用于控制液体液体回收中的液体检测的装置和方法公开(公告)号：US20100220301A1
公开(公告)日：2010-09-02
申请号：US12691173
申请日：2010-01-21
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and a liquid-permeable member. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a chamber. The confinement member includes at least one liquid inlet within the chamber through which a liquid is introduced into the chamber to reduce liquid from becoming stagnated within the chamber.
摘要翻译： 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括限制构件和液体可渗透构件。 限制构件包括出口和孔，将图案化图像投射到物体上。 液体渗透部件覆盖出口并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触室。 所述限制构件包括在所述腔室内的至少一个液体入口，通过所述至少一个液体入口将液体引入所述腔室中以减少液体停滞在所述腔室内。
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公开(公告)号：US07283200B2
公开(公告)日：2007-10-16
申请号：US10623004
申请日：2003-07-17
申请人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Toru Kawaguchi , Hisashi Tazawa , Saburo Kamiya , Yasuhiro Hidaka
发明人： Alex Ka Tim Poon , Leonard Wai Fung Kho , Toru Kawaguchi , Hisashi Tazawa , Saburo Kamiya , Yasuhiro Hidaka
IPC分类号： G03B27/42
CPC分类号： G03F7/70775
摘要： A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.
摘要翻译： 用于测量载物台（248）沿着第一轴线的位置的测量系统（222）包括第一系统（260），该第一系统（260）具有第一光束源（260A），该第一光束源引导第一光束（260H） 与第二轴平行，并且第一重定向器（260D）重定向第一光束，使得重定向的第一光束（260H）在与第一轴平行的第一重定向路径上，而与第一重定向器 （260D）围绕第三轴线。 测量系统（222）可以包括保护第一光束（260H）免受环境条件影响的屏蔽（380）。
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公开(公告)号：US08610873B2
公开(公告)日：2013-12-17
申请号：US12382100
申请日：2009-03-09
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
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6.发明申请公开(公告)号：US20130010271A1
公开(公告)日：2013-01-10
申请号：US13617251
申请日：2012-09-14
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译： 浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中， 液体限制构件和液体分配器。 液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。 液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。 液体转向器位于台架和至少第一多孔部分之间。
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公开(公告)号：US20120257179A1
公开(公告)日：2012-10-11
申请号：US13314860
申请日：2011-12-08
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： Methods and apparatus remove liquid from a surface of a substrate, a substrate table, or both, by applying a vacuum to a passage having first and second opposite ends while the first end is in contact with or close to the liquid. This causes the liquid to flow into the first end of the passage as part of a gas/liquid mixture. At least part of the passage between the first and second ends contacts a porous member. The liquid of the gas/liquid mixture is absorbed into the porous member such that substantially only gas is present at the second end of the passage. Thus, substantially only gas flows towards a vacuum source of the vacuum. A second vacuum may be applied to a collection chamber that contacts the porous member to draw the liquid of the gas/liquid mixture from the passage through the porous member and into the collection chamber.
摘要翻译： 方法和装置通过在具有第一和第二相对端的通道上施加真空，同时在第一端与液体接触或接近液体的同时，从基板，基板台或两者的表面去除液体。 这导致液体作为气体/液体混合物的一部分流入通道的第一端。 第一和第二端之间的通道的至少一部分接触多孔构件。 气体/液体混合物的液体被吸收到多孔构件中，使得在通道的第二端处基本上仅存在气体。 因此，基本上只有气体朝着真空的真空源流动。 第二真空可以施加到与多孔构件接触的收集室，以将气体/液体混合物的液体从通过多孔构件的通道吸入收集室。
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公开(公告)号：US20100231876A1
公开(公告)日：2010-09-16
申请号：US12801081
申请日：2010-05-20
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： Apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. Liquid is supplied through a supply inlet. A porous member is disposed adjacent to a space. The porous member includes a first portion and a second portion. A recovery capability to remove the supplied liquid from the space through the first portion is different from a recovery capability to remove the supplied liquid from the space through the second portion.
摘要翻译： 设备和方法从浸没式光刻系统中的投影系统和曝光对象之间的间隙中形成的浸没区域中回收流体。 液体通过供应入口供应。 多孔构件邻近空间设置。 多孔构件包括第一部分和第二部分。 通过第一部分从空间去除供应的液体的恢复能力不同于通过第二部分从空间移除供应的液体的恢复能力。
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公开(公告)号：US20100186942A1
公开(公告)日：2010-07-29
申请号：US12643932
申请日：2009-12-21
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Noriya Kato , Yusaku Uehara , Leonard Wai Fung Kho
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Noriya Kato , Yusaku Uehara , Leonard Wai Fung Kho
摘要： Methods and apparatus for cooling a reticle are disclosed. According to one aspect of the present invention, an apparatus for providing top side cooling to a reticle includes a heat exchanger arrangement and an actuator. The heat exchanger arrangement includes a first surface arranged to facilitate heat transfer between the reticle and the heat exchanger arrangement. The heat transfer provides cooling to at least some portions of the reticle. The actuator positions the first surface of the heat exchanger arrangement at a distance over the reticle.
摘要翻译： 公开了用于冷却掩模版的方法和装置。 根据本发明的一个方面，一种用于向掩模版提供顶侧冷却的装置包括热交换器装置和致动器。 热交换器装置包括布置成便于在标线片和热交换器装置之间传热的第一表面。 热传递为掩模版的至少一些部分提供冷却。 致动器将热交换器装置的第一表面定位在掩模版上方一段距离处。
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10.发明申请APPARATUS AND METHOD TO CONTROL VACUUM AT POROUS MATERIAL USING MULTIPLE POROUS MATERIALS 有权使用多孔材料控制多孔材料真空的装置和方法公开(公告)号：US20100134773A1
公开(公告)日：2010-06-03
申请号：US12698565
申请日：2010-02-02
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber.
摘要翻译： 浸没液体限制装置从浸没式光刻系统中的浸没区域中浸没液体从浸没区域中恢复，该浸没区域包括投影系统和曝光对象之间的间隙。 该装置包括限制构件，其包括出口和孔，将图案化图像投射到物体上。 第一透液性构件覆盖出口并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一室。 第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室 房间。 在第一室和向第一室供应低压的真空系统之间提供疏水性多孔构件。
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