公开(公告)号：US08473237B2

公开(公告)日：2013-06-25

申请号：US12726908

申请日：2010-03-18

申请人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

发明人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

IPC分类号： G06F19/00 ,  G01B11/14

CPC分类号： G01B11/03 ,  G01B21/042

摘要： A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.

摘要翻译： 提供了一种用于校准测量系统的样本台的方法，其中具有多个标记的样本连续地位于不同的校准位置，每个标记通过每个标记的样本台位于光学系统的摄影范围内 使用光学系统测量样品的校准位置和标记位置。 使用具有要确定的校准参数的函数系统来设置描述样本台的定位误差的模型。 该模型考虑了在测量标记位置期间发生的至少一个系统测量误差。 考虑到测量的标记位置，基于模型确定校准参数的值。

公开(公告)号：US20100241384A1

公开(公告)日：2010-09-23

申请号：US12726908

申请日：2010-03-18

申请人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

发明人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

IPC分类号： G06F19/00

CPC分类号： G01B11/03 ,  G01B21/042

摘要： A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.

摘要翻译： 提供了一种用于校准测量系统的样本台的方法，其中具有多个标记的样本连续地位于不同的校准位置，每个标记通过每个标记的样本台位于光学系统的摄影范围内 使用光学系统测量样品的校准位置和标记位置。 使用具有要确定的校准参数的函数系统来设置描述样本台的定位误差的模型。 该模型考虑了在测量标记位置期间发生的至少一个系统测量误差。 考虑到测量的标记位置，基于模型确定校准参数的值。