公开(公告)号：US20050243328A1

公开(公告)日：2005-11-03

申请号：US11080525

申请日：2005-03-16

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

IPC分类号： G03F7/20 ,  G01B9/02

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device and a method for the optical measurement of an optical system (1), in particular an optical imaging system. The device includes one or more object-side test optics components (2a, 2b) arranged in front of the optical system to be measured, and/or one or more image-side test optics components (3, 4, 5) arranged behind the optical system to be measured. A container for use in such a device, a microlithography projection exposure machine equipped with such a device, and a method which can be carried out with the aid of this device are also disclosed. An immersion fluid is introduced adjacent to at least one of the one or more object-side test optics components and/or image-side test optics components. Such device and method provide for optical measurement by microlithography projection objectives of high numerical aperture using wavefront detection with shearing or point diffraction interferometry or a Moiré measuring technique.

摘要翻译： 一种用于光学系统（1）的光学测量的装置和方法，特别是光学成像系统。 该装置包括布置在待测量的光学系统前面的一个或多个物体侧测试光学部件（2a，2b）和/或一个或多个图像侧测试光学部件（3,4,5） 在要测量的光学系统后面。 还公开了一种用于这种装置的容器，配备有这种装置的微光刻投影曝光机以及可借助该装置进行的方法。 相邻于一个或多个物体侧测试光学部件和/或图像侧测试光学部件中的至少一个被引入浸没流体。 这种装置和方法通过使用具有剪切或点衍射干涉测量或莫尔测量技术的波前检测的高数值孔径的微光刻投影物镜提供光学测量。

公开(公告)号：US06816247B1

公开(公告)日：2004-11-09

申请号：US10217536

申请日：2002-08-14

申请人： Joachim Heppner ,  Juergen Massig ,  Michael Arnz ,  Michael Kuechel ,  Juergen Penzing ,  Uwe Schellhorn

发明人： Joachim Heppner ,  Juergen Massig ,  Michael Arnz ,  Michael Kuechel ,  Juergen Penzing ,  Uwe Schellhorn

IPC分类号： G01B900

CPC分类号： G03F7/706 ,  G01M11/0242 ,  G01M11/0264

摘要： In a moiré method for measuring the distortion of an optical imaging system in which and object grid having a two-dimensional object pattern is arranged in an object plane of the imaging system and an image grid having a two-dimensional image pattern is arranged in an image plane of the imaging system, these patterns are configured in the form of, for example cross-hatched patterns or checker board patterns, are adapted to suit one another such that a two-dimensional moiré fringe pattern that may be detected by a two-dimensional, spatially resolving, detection device is created when the object grid is imaged onto the image grid using the imaging system. Distortion components of the imaging system may be simultaneously determined along two differently oriented, in particular, two mutually orthogonal, image directions from a two-dimensional moiré fringe pattern.

摘要翻译： 在用于测量光学成像系统的失真的莫尔方法中，其中具有二维对象图案的物体网格被布置在成像系统的物体平面中，并且具有二维图像图案的图像网格被布置在 成像系统的图像平面，这些图案被配置为例如交叉阴影图案或棋盘图案的形式，适于彼此适应，使得可以由二维图案检测到的二维莫尔条纹图案， 当使用成像系统将对象网格成像到图像网格上时，创建尺寸，空间分辨的检测装置。 成像系统的失真分量可以沿着二维莫尔条纹图案沿两个不同方向，特别是两个相互正交的图像方向同时确定。

公开(公告)号：US08473237B2

公开(公告)日：2013-06-25

申请号：US12726908

申请日：2010-03-18

申请人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

发明人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

IPC分类号： G06F19/00 ,  G01B11/14

CPC分类号： G01B11/03 ,  G01B21/042

摘要： A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.

摘要翻译： 提供了一种用于校准测量系统的样本台的方法，其中具有多个标记的样本连续地位于不同的校准位置，每个标记通过每个标记的样本台位于光学系统的摄影范围内 使用光学系统测量样品的校准位置和标记位置。 使用具有要确定的校准参数的函数系统来设置描述样本台的定位误差的模型。 该模型考虑了在测量标记位置期间发生的至少一个系统测量误差。 考虑到测量的标记位置，基于模型确定校准参数的值。

公开(公告)号：US20100241384A1

公开(公告)日：2010-09-23

申请号：US12726908

申请日：2010-03-18

申请人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

发明人： Alexander Huebel ,  Matthias Manger ,  Gerd Klose ,  Uwe Schellhorn ,  Michael Arnz

IPC分类号： G06F19/00

CPC分类号： G01B11/03 ,  G01B21/042

摘要： A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.

摘要翻译： 提供了一种用于校准测量系统的样本台的方法，其中具有多个标记的样本连续地位于不同的校准位置，每个标记通过每个标记的样本台位于光学系统的摄影范围内 使用光学系统测量样品的校准位置和标记位置。 使用具有要确定的校准参数的函数系统来设置描述样本台的定位误差的模型。 该模型考虑了在测量标记位置期间发生的至少一个系统测量误差。 考虑到测量的标记位置，基于模型确定校准参数的值。

公开(公告)号：US07019824B2

公开(公告)日：2006-03-28

申请号：US10935320

申请日：2004-09-08

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Ralph Klaesges ,  Joachim Stuehler

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Ralph Klaesges ,  Joachim Stuehler

IPC分类号： G01B9/00

CPC分类号： G03F7/706

摘要： In the case of a method and a measuring system for measuring the distortion of an optical imaging system with the aid of moiré patterns, an object grating with an object pattern is arranged in the object plane of the imaging system, and an image grating with an image pattern is arranged in the image plane of the imaging system. Both the object pattern and the image pattern in each case have a multiplicity of cells with sub-gratings of different grating properties, it being possible, in particular, for the sub-gratings to have different directions of periodicity and different phase angles. The object pattern and the image pattern are coordinated with one another in such a way that, when the object pattern is projected onto the image pattern with the aid of the imaging system, images of the sub-gratings of the object pattern superimpose in each case with assigned sub-gratings of the image pattern, accompanied by the generation of moiré sub-patterns, which are likewise present in the form of cells situated next to one another. As a result, it is possible simultaneously to determine distortion components for a plurality of image directions aligned transverse to one another. It is preferred to use phase-shift methods in order to evaluate the moiré sub-pattern.

摘要翻译： 在用于通过莫尔图案测量光学成像系统的失真的方法和测量系统的情况下，具有对象图案的物体光栅被布置在成像系统的物平面中，并且具有 图像图案被布置在成像系统的图像平面中。 在每种情况下，对象图案和图像图案都具有具有不同光栅特性的子光栅的多个单元格，特别是对于子光栅具有不同的周期性方向和不同的相位角度是可能的。 对象图案和图像图案彼此协调，使得当借助于成像系统将对象图案投影到图像图案上时，对象图案的子光栅的图像在每种情况下叠加 具有分配的图像图案的子光栅，伴随着产生莫尔子图案，其同样以彼此相邻的单元格的形式存在。 结果，可以同时确定用于彼此横向排列的多个图像方向的失真分量。 优选使用相移方法来评估莫尔子图案。

公开(公告)号：US20050122506A1

公开(公告)日：2005-06-09

申请号：US10935320

申请日：2004-09-08

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Ralph Klaesges ,  Joachim Stuehler

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Ralph Klaesges ,  Joachim Stuehler

IPC分类号： G01M11/02 ,  G01B11/14 ,  G01M11/00 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/706

摘要： In the case of a method and a measuring system for measuring the distortion of an optical imaging system with the aid of moiré patterns, an object grating with an object pattern is arranged in the object plane of the imaging system, and an image grating with an image pattern is arranged in the image plane of the imaging system. Both the object pattern and the image pattern in each case have a multiplicity of cells with sub-gratings of different grating properties, it being possible, in particular, for the sub-gratings to have different directions of periodicity and different phase angles. The object pattern and the image pattern are coordinated with one another in such a way that, when the object pattern is projected onto the image pattern with the aid of the imaging system, images of the sub-gratings of the object pattern superimpose in each case with assigned sub-gratings of the image pattern, accompanied by the generation of moiré sub-patterns, which are likewise present in the form of cells situated next to one another. As a result, it is possible simultaneously to determine distortion components for a plurality of image directions aligned transverse to one another. It is preferred to use phase-shift methods in order to evaluate the moiré sub-pattern.

摘要翻译： 在用于通过莫尔图案测量光学成像系统的失真的方法和测量系统的情况下，具有对象图案的物体光栅被布置在成像系统的物平面中，并且具有 图像图案被布置在成像系统的图像平面中。 在每种情况下，对象图案和图像图案都具有具有不同光栅特性的子光栅的多个单元格，特别是对于子光栅具有不同的周期性方向和不同的相位角度是可能的。 对象图案和图像图案彼此协调，使得当借助于成像系统将对象图案投影到图像图案上时，对象图案的子光栅的图像在每种情况下叠加 具有分配的图像图案的子光栅，伴随着产生莫尔子图案，其同样以彼此相邻的单元格的形式存在。 结果，可以同时确定用于彼此横向排列的多个图像方向的失真分量。 优选使用相移方法来评估莫尔子图案。

公开(公告)号：US08416412B2

公开(公告)日：2013-04-09

申请号：US12513452

申请日：2007-10-23

申请人： Uwe Schellhorn ,  Matthias Manger

发明人： Uwe Schellhorn ,  Matthias Manger

IPC分类号： G01B11/00 ,  G01B11/14 ,  G06F19/00 ,  G01C17/38

CPC分类号： G03F7/70775 ,  G01B21/042 ,  G03F7/70516 ,  G03F7/706 ,  G03F7/70616 ,  G03F7/70725

摘要： There is provided a method for determining residual errors, compromising the following steps: in a first step, a test plate comprising a first pattern is used, and in a second step, a test plate comprising a second pattern which is reflected and/or rotated with respect to the first step is used.

摘要翻译： 提供了一种用于确定残余误差的方法，损害了以下步骤：在第一步骤中，使用包括第一图案的测试板，并且在第二步骤中，测试板包括被反射和/或旋转的第二图案 相对于第一步使用。

公开(公告)号：US20120113429A1

公开(公告)日：2012-05-10

申请号：US13351710

申请日：2012-01-17

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/02

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US20090021726A1

公开(公告)日：2009-01-22

申请号：US12147034

申请日：2008-06-26

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

公开(公告)号：US07400388B2

公开(公告)日：2008-07-15

申请号：US11138430

申请日：2005-05-27

申请人： Wolfgang Emer ,  Uwe Schellhorn ,  Manfred Dahl ,  Rainer Hoch

发明人： Wolfgang Emer ,  Uwe Schellhorn ,  Manfred Dahl ,  Rainer Hoch

IPC分类号： G01J1/00

CPC分类号： G01J9/00 ,  G02B27/0012 ,  G02B27/0025 ,  G03F7/706 ,  G03F7/70641

摘要： A method for determining at least one of distortion and de-focus for an optical imaging system. The method includes determining wavefront aberrations in a pupil plane of the optical imaging system by a wavefront measurement method, determining focus offset measured values in an xy-direction and/or z-direction for one or more different illumination settings by a test pattern measurement method with imaging and comparative evaluation of test patterns for the optical imaging system, and determining values for one or more aberration parameters that relate to the distortion and/or image surface from a prescribed relationship between the determined wavefront aberrations and the determined focus offset measured values. By prescribing a relationship between the wave aberrations and the focus offset measured values, it is possible for the results of the wavefront measurement method and of the test pattern measurement method to be linked to one another so as to enable an improved precision in the determination of distortion and/or image surface.

摘要翻译： 一种用于确定光学成像系统的失真和去焦点中的至少一个的方法。 该方法包括通过波前测量方法来确定光学成像系统的光瞳平面中的波前像差，通过测试图案测量方法确定xy方向和/或z方向上的一个或多个不同照明设置的焦点偏移测量值 通过对光学成像系统的测试图案进行成像和比较评估，以及根据所确定的波前像差与所确定的聚焦偏移测量值之间的规定关系，确定与失真和​​/或图像表面相关的一个或多个像差参数的值。 通过规定波像差和焦点偏移测量值之间的关系，可以将波前测量方法和测试图案测量方法的结果相互链接，以使得能够提高测定精度 失真和/或图像表面。