公开(公告)号：US20110229010A1

公开(公告)日：2011-09-22

申请号：US13130600

申请日：2009-11-28

申请人： Michael Arnz ,  Dirk Beyer ,  Wolfgang Harnisch ,  Thomas Scheruebl

发明人： Michael Arnz ,  Dirk Beyer ,  Wolfgang Harnisch ,  Thomas Scheruebl

IPC分类号： G06K9/00

CPC分类号： G03F7/70633 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/84 ,  G03F7/70616 ,  H01J37/3174

摘要： A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.

摘要翻译： 提供了一种用于测量逐段暴露的物体的一个部分（特别是光刻掩模或晶片）的相对局部位置误差的方法，每个暴露部分具有多个测量标记，其中 ）以放大的方式成像大于该部分的对象的区域，并且被检测为图像，b）基于检测到的图像确定检测图像中包含的测量标记的位置误差，c） 校正位置误差是通过由放大的成像和检测引起的位置误差分量从确定的测量标记的位置误差中提取导出的，d）基于校正位置导出一个部分的相对局部位置误差 测量标记的误差。

公开(公告)号：US20110134308A1

公开(公告)日：2011-06-09

申请号：US12863824

申请日：2009-01-20

申请人： Michael Arnz ,  Mikhail Levtonov ,  Gerd Klose ,  Volkmar Betz

发明人： Michael Arnz ,  Mikhail Levtonov ,  Gerd Klose ,  Volkmar Betz

IPC分类号： H04N5/232

CPC分类号： G02B21/244 ,  G02B21/245

摘要： An autofocus device for an imaging device is provided, which has an imaging optic having a first focal plane and an object table for moving an object to be imaged relative to the first focal plane, wherein said autofocus device comprises a) an image recording module having a second focal plane, the location thereof relative to the first focal plane being known, b) a lighting module (BM) for imaging a focusing image along a lighting beam path in a focusing image plane such that, if the object is positioned in a target position at a predetermined distance to the second focal plane, the lighting beam path is folded because of reflection on the object and the focusing image, which lies in the focusing image plane, intersects the second focal plane or lies therein, and c) a control module, which activates the object table to focus the imaging device so that the object is positioned in the target position, from a signal of the image recording module, which the image recording module generates on the basis of the recording thereof of the focusing image when the object is positioned in the target position, derives the deviation of the object position from the target position, and, based on the derived deviation, the predetermined distance, and the relative location of the first and second focal planes, activates the object table so that the object is positioned in the first focal plane.

摘要翻译： 提供了一种用于成像装置的自动对焦装置，其具有成像光学元件，该成像光学元件具有第一焦平面和用于相对于第一焦平面移动待成像物体的物体台，其中所述自动对焦装置包括：a）图像记录模块， 第二焦平面，其相对于第一焦平面的位置是已知的，b）用于在聚焦图像平面中沿照明光束路径对聚焦图像进行成像的照明模块（BM），使得如果物体位于 目标位置与第二焦平面成预定距离，由于物体上的反射和位于聚焦图像平面中的聚焦图像与第二焦平面相交或位于其中的聚焦图像折叠点亮光束路径，以及c） 控制模块，其从图像记录模块生成的图像记录模块的信号激活对象表以聚焦成像装置，使得对象位于目标位置 基于当对象位于目标位置时对聚焦图像的记录，导出对象位置与目标位置的偏差，并且基于导出的偏差，预定距离和相对位置 的第一和第二焦平面激活对象表，使得对象位于第一焦平面中。

公开(公告)号：US20100153059A1

公开(公告)日：2010-06-17

申请号：US12594373

申请日：2008-03-11

申请人： Gerd Klose ,  Michael Arnz ,  Albrecht Hof ,  Helmut Krause ,  Ulrich Stroessner ,  Matthias Manger ,  Uwe Schellhorn ,  Karl-Heinz Bechstein

发明人： Gerd Klose ,  Michael Arnz ,  Albrecht Hof ,  Helmut Krause ,  Ulrich Stroessner ,  Matthias Manger ,  Uwe Schellhorn ,  Karl-Heinz Bechstein

IPC分类号： G06F15/00 ,  G01B21/20

CPC分类号： G01N21/95692 ,  G01N2021/95676 ,  G03F1/84

摘要： An apparatus for measuring the positions of marks on a mask is provided, said apparatus comprising a mask holder for holding the mask, a recording unit for recording the marks of the mask held by the mask holder, an actuating module for moving the mask holder and the recording unit relative to each other, and an evaluating module, which numerically calculates the gravity-induced sagging of the mask in the mask holder and determines the positions of the marks on the mask, based on the calculated sagging, the recordings made by the recording unit and the relative movement between the mask holder and the recording unit, wherein, prior to calculating said sagging, the present position of the mask in the mask holder is determined and is taken into consideration in said numerical calculation, and/or the geometrical dimensions of the mask are taken into consideration in said numerical calculation of sagging.

摘要翻译： 提供了一种用于测量掩模上的标记位置的装置，所述装置包括用于保持掩模的掩模保持器，用于记录由掩模保持器保持的掩模的标记的记录单元，用于移动掩模保持器的致动模块和 所述记录单元相对于所述记录单元，以及评估模块，其对所述掩模保持器中的所述掩模的重力引起的下垂进行数值计算，并基于所计算的下垂来确定所述掩模上的所述标记的位置， 记录单元和掩模保持器和记录单元之间的相对运动，其中，在计算所述下垂之前，确定掩模保持器中掩模的当前位置并在所述数值计算中被考虑，和/或几何 在下垂的数值计算中考虑到面罩的尺寸。

公开(公告)号：US20050264819A1

公开(公告)日：2005-12-01

申请号：US10960082

申请日：2004-10-08

申请人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

发明人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

IPC分类号： G03F7/20 ,  G01N21/47

CPC分类号： G03F7/70591 ,  G03F7/70941

摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.

摘要翻译： 一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域， 提供相关联的图像场掩模和相应的设备。 还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。 照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处 外部暗场区域，其定义了最大散射范围。 该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。 应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。

公开(公告)号：US20100208935A1

公开(公告)日：2010-08-19

申请号：US12599127

申请日：2008-03-07

申请人： Michael Arnz ,  Gerd Klose

发明人： Michael Arnz ,  Gerd Klose

IPC分类号： G06K9/00 ,  G03F7/20

CPC分类号： G03F7/70633

摘要： A method is provided for determining the relative overlay shift of stacked layers, said method comprising the steps of: a) providing a reference image including a reference pattern that comprises first and second pattern elements; b) providing a measurement image of a measurement pattern, which comprises a first pattern element formed by a first one of the layers and a second pattern element formed by a second one of the layers; c) weighting the reference or measurement image such that a weighted first image is generated, in which the first pattern element is emphasized relative to the second pattern element; d) determining the relative shift of the first pattern element on the basis of the weighted first image and of the measurement or reference image not weighted in step c); e) weighting the reference or measurement image such that a weighted second image is generated, in which the second pattern element is emphasized relative to the first pattern element; f) determining the relative shift of the second pattern element on the basis of the weighted second image and of the measurement or reference image not weighted in step e); g) determining the relative overlay shift on the basis of the relative shifts determined in steps d) and f).

摘要翻译： 提供了一种用于确定堆叠层的相对重叠移位的方法，所述方法包括以下步骤：a）提供包括包括第一和第二图案元素的参考图案的参考图像; b）提供测量图案的测量图像，其包括由所述层中的第一层形成的第一图案元素和由所述层中的第二层形成的第二图案元素; c）对所述参考或测量图像进行加权，使得生成加权的第一图像，其中所述第一图案元素相对于所述第二图案元素被加强; d）基于加权的第一图像和在步骤c）中未加权的测量或参考图像来确定第一图案元素的相对移位; e）对所述参考或测量图像进行加权，使得生成加权的第二图像，其中相对于所述第一图案元素强调所述第二图案元素; f）基于加权的第二图像和在步骤e）中未加权的测量或参考图像来确定第二图案元素的相对移位; g）基于在步骤d）和f）中确定的相对移动来确定相对重叠移位。

公开(公告)号：US20100208254A1

公开(公告)日：2010-08-19

申请号：US12703829

申请日：2010-02-11

申请人： Michael ARNZ

发明人： Michael ARNZ

IPC分类号： G01J3/40

CPC分类号： G03F7/70941

摘要： A method of measuring scattered light on an optical system includes: providing a first measuring field and a second measuring field, both measuring fields respectively being either of a first light manipulation type or a second light manipulation type, which first light manipulation type is configured to cause incoming light to enter the optical system and which second light manipulation type is configured to prevent incoming light from entering the optical system, and both measuring fields respectively having a second light manipulation type reference structure and a respective measuring structure, which measuring structures are of the second light manipulation type in the case where the measuring fields are of the first light manipulation type, and are first light manipulation type regions of the measuring fields in the case where the measuring fields are of the second light manipulation type, wherein the measuring structures of the respective measuring fields are offset in different directions in relation to the respective reference structure, imaging the first measuring field with the optical system into an image plane and measuring a first light intensity produced herewith at a location in the region of the image of the reference structure of the first measuring field, and imaging the second measuring field with the optical system into the image plane and measuring a second light intensity produced herewith at a location in the region of the image of the reference structure of the second measuring field.

摘要翻译： 测量光学系统上的散射光的方法包括：提供第一测量场和第二测量场，两个测量场分别是第一光操作类型或第二光操作类型，第一光操作类型被配置为 使得入射光进入光学系统，并且第二光操作类型被配置为防止入射光进入光学系统，并且两个测量场分别具有第二光操作型参考结构和相应的测量结构，测量结构为 在测量场是第一光操作型的情况下的第二光操作型，并且在测量场是第二光操作型的情况下是测量场的第一光操作型区域，其中测量结构 各个测量场的偏移量不同 与相应的参考结构相关的方向，将具有光学系统的第一测量场成像到图像平面中，并测量在此处产生的在第一测量场的参考结构的图像的区域中的位置处的第一光强;以及 使用光学系统将第二测量场成像到图像平面中，并且测量在第二测量场的参考结构的图像的区域中产生的第二光强度。

公开(公告)号：US07755748B2

公开(公告)日：2010-07-13

申请号：US12181774

申请日：2008-07-29

申请人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

发明人： Michael Arnz ,  Oswald Gromer ,  Gerd Klose ,  Joachim Stuehler ,  Matthias Manger

IPC分类号： G01B9/00

CPC分类号： G03F7/70591 ,  G03F7/70941

摘要： A scattered light measurement device includes an illumination mask providing measuring radiation on an entrance side (1a) of a test component (1) and a detection part (3-6) for detection of light scattered by the test component and disposed on an exit side (1b) of the test component. The illumination mask includes at least one scattered light measurement structure, wherein the scattered light measurement structure has a scattered light marker zone and wherein the scattered light marker zone has a rotationally non-symmetric shape.

摘要翻译： 散射光测量装置包括照射掩模，其在测试部件（1）的入口侧（1a）和检测部（3-6）上提供测量辐射，用于检测由测试部件散射的光并且设置在出射侧 （1b）。 照明掩模包括至少一个散射光测量结构，其中散射光测量结构具有散射光标记区，并且其中散射光标记区具有旋转非对称形状。

公开(公告)号：US06816247B1

公开(公告)日：2004-11-09

申请号：US10217536

申请日：2002-08-14

申请人： Joachim Heppner ,  Juergen Massig ,  Michael Arnz ,  Michael Kuechel ,  Juergen Penzing ,  Uwe Schellhorn

发明人： Joachim Heppner ,  Juergen Massig ,  Michael Arnz ,  Michael Kuechel ,  Juergen Penzing ,  Uwe Schellhorn

IPC分类号： G01B900

CPC分类号： G03F7/706 ,  G01M11/0242 ,  G01M11/0264

摘要： In a moiré method for measuring the distortion of an optical imaging system in which and object grid having a two-dimensional object pattern is arranged in an object plane of the imaging system and an image grid having a two-dimensional image pattern is arranged in an image plane of the imaging system, these patterns are configured in the form of, for example cross-hatched patterns or checker board patterns, are adapted to suit one another such that a two-dimensional moiré fringe pattern that may be detected by a two-dimensional, spatially resolving, detection device is created when the object grid is imaged onto the image grid using the imaging system. Distortion components of the imaging system may be simultaneously determined along two differently oriented, in particular, two mutually orthogonal, image directions from a two-dimensional moiré fringe pattern.

摘要翻译： 在用于测量光学成像系统的失真的莫尔方法中，其中具有二维对象图案的物体网格被布置在成像系统的物体平面中，并且具有二维图像图案的图像网格被布置在 成像系统的图像平面，这些图案被配置为例如交叉阴影图案或棋盘图案的形式，适于彼此适应，使得可以由二维图案检测到的二维莫尔条纹图案， 当使用成像系统将对象网格成像到图像网格上时，创建尺寸，空间分辨的检测装置。 成像系统的失真分量可以沿着二维莫尔条纹图案沿两个不同方向，特别是两个相互正交的图像方向同时确定。

公开(公告)号：US08694929B2

公开(公告)日：2014-04-08

申请号：US13543083

申请日：2012-07-06

申请人： Dirk Seidel ,  Michael Arnz

发明人： Dirk Seidel ,  Michael Arnz

IPC分类号： G06F17/50 ,  G06F19/00 ,  G03F1/00 ,  G21K5/00 ,  G06K9/00

CPC分类号： G06F17/5009 ,  G03F1/00 ,  G03F1/42 ,  G03F1/84 ,  G03F7/705 ,  G03F7/70616 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06K9/00 ,  G21K5/00

摘要： A method and an apparatus for determining the position of a structure on a mask for microlithography, in which the position is determined by comparing an aerial image, measured by a recording device, of a portion of the mask with an aerial image determined by simulation. The position determination includes carrying out a plurality of such comparisons which differ from one another with regard to the input parameters of the simulation.

摘要翻译： 一种用于确定用于微光刻的掩模上的结构的位置的方法和装置，其中通过将由记录装置测量的空间图像与掩模的一部分与由模拟确定的空中图像进行比较来确定位置。 位置确定包括对于模拟的输入参数执行彼此不同的多个这样的比较。

公开(公告)号：US08457411B2

公开(公告)日：2013-06-04

申请号：US12749938

申请日：2010-03-30

申请人： Michael Arnz

发明人： Michael Arnz

IPC分类号： G06K9/00

CPC分类号： G03F9/7092 ,  G03F9/7088

摘要： The position of an edge of a marker structure in an image of the marker structure is determined with subpixel accuracy. A discrete intensity profile of the edge, having profile pixels, is derived from the image pixels, and a continuous profile function of the edge is determined based on the profile pixels. Profile pixels whose intensity values are near an intensity threshold value are selected as evaluation pixels. Based on the evaluation pixels, a curve of continuous intensity is calculated. A position coordinate at which the intensity value of the continuous intensity curve matches the threshold value is selected as a first position coordinate, and the distance is determined between the first position coordinate and the position coordinate of the evaluation pixel that, from among the evaluation pixels previously selected, has the closest intensity value to the threshold value. The determined distance is compared to a predetermined threshold, and if the distance is greater than the threshold, a shift is effected, and the process iteratively performs the steps of selects the adjacent profile pixels, calculates the curve of continuous intensity, and so forth. If the distance is not greater than the threshold, the position of the edge in the captured image is determined with subpixel accuracy from all the distances determined in step g).

摘要翻译： 用子像素精度确定标记结构的图像边缘的位置。 从图像像素导出具有轮廓像素的边缘的离散强度分布，并且基于轮廓像素确定边缘的连续轮廓函数。 选择其强度值接近强度阈值的轮廓像素作为评估像素。 基于评估像素，计算连续强度的曲线。 选择连续强度曲线的强度值与阈值相匹配的位置坐标作为第一位置坐标，并且在评估像素的第一位置坐标和位置坐标之间确定距离，从评估像素 先前选择的，具有与阈值最接近的强度值。 将确定的距离与预定阈值进行比较，并且如果距离大于阈值，则进行移位，并且处理迭代地执行选择相邻轮廓像素，计算连续强度的曲线等的步骤。 如果距离不大于阈值，则从步骤g）中确定的所有距离的子像素精度确定拍摄图像中边缘的位置。