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公开(公告)号:US06577045B1
公开(公告)日:2003-06-10
申请号:US09700694
申请日:2001-01-05
申请人: Alexandr Alexandrovich Blyablin , Anton Valerievich Kandidov , Mikhail Arkadievich Timofeev , Boris Vadimovich Seleznev , Andrei Alexandrovich Pilevsky , Alexandr Tursunovich Rakhimov , Nikolai Vladislavovich Suetin , Vladimir Anatolievich Samorodov
发明人: Alexandr Alexandrovich Blyablin , Anton Valerievich Kandidov , Mikhail Arkadievich Timofeev , Boris Vadimovich Seleznev , Andrei Alexandrovich Pilevsky , Alexandr Tursunovich Rakhimov , Nikolai Vladislavovich Suetin , Vladimir Anatolievich Samorodov
IPC分类号: H01J1900
CPC分类号: H01J1/304 , H01J9/025 , H01J2201/30457 , Y10S977/788 , Y10S977/813 , Y10S977/89
摘要: The present invention may be used in the production of highly efficient films for electron field emitters. The cold-emission cathode of the present invention comprises a substrate having a carbon film with an irregular structure applied thereon. This structure comprises carbon micro- and nano-ridges and/or micro- and nano-threads which are perpendicular to the surface of the substrate, which have a typical size of between 0.005 and 1 micron as well as a distribution density of between 0.1 and 100 &mgr;m−2, and which are coated with a diamond nano-film whose thickness represents a fraction of a micron. The method for producing the cathode involves sequentially depositing two carbon films. A carbon film with nano-barbs is first deposited on a substrate arranged on an anode by igniting a direct-current discharge at a density of between 0.15 and 0.5 A. This deposition is carried out in a mixture containing hydrogen and a carbon-containing additive, under a global pressure of between 50 and 300 torrs, using vapors of ethylic alcohol at a 5 to 15% concentration or vapors of methane at a 6 to 30% concentration, and at a temperature on the substrate of between 600 and 1100° C. A diamond nano-film is then deposited on the graphite film thus grown.
摘要翻译: 本发明可用于生产用于电子场发射体的高效膜。 本发明的冷发射阴极包括具有施加在其上的具有不规则结构的碳膜的基板。 该结构包括垂直于衬底表面的碳微纳米脊和/或微米和纳米线,其具有典型尺寸在0.005和1微米之间以及分布密度在0.1和 100mum-2,并且其上涂覆有厚度为微米级分的金刚石纳米膜。 阴极的制造方法依次沉积两个碳膜。 首先通过以0.15-0.5A的密度点燃直流放电,首先将具有纳米倒钩的碳膜沉积在布置在阳极上的衬底上。该沉积在含有氢和含碳添加剂的混合物中进行 在50至300托之间的全球压力下,使用浓度为5至15%的乙醇的蒸气或6至30%浓度的甲烷蒸气,并且在600至1100℃的温度下 然后将金刚石纳米膜沉积在由此生长的石墨膜上。
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公开(公告)号:US06593683B1
公开(公告)日:2003-07-15
申请号:US09720414
申请日:2001-03-07
申请人: Nikolai Nikolaevich Dzbanovsky , Andrei Alexandrovich Pilevsky , Nikolai Vladislavovich Suetin , Alexandr Tursunovich Rakhimov , Mikhail Arkadievich Timofeev
发明人: Nikolai Nikolaevich Dzbanovsky , Andrei Alexandrovich Pilevsky , Nikolai Vladislavovich Suetin , Alexandr Tursunovich Rakhimov , Mikhail Arkadievich Timofeev
IPC分类号: H01J102
摘要: The present invention relates to the production of highly efficient films for field-effect electron emitters, wherein said films may be used in the production of flat displays, in electronic microscopes, in microwave electronics, in light sources as well as in various other applications. This invention more precisely relates to a cold cathode that comprises a substrate having a carbon film applied thereto. The carbon film has an irregular structure consisting of carbon micro-ridges and/or micro-threads which are perpendicular to the surface of the substrate, have a size ranging typically from 0.01 to 1 microns and a distribution density of between 0.1 and 10 &mgr;m2. This invention also relates to method for producing a cold electrode, wherein said method comprises generating a DC current discharge in a mixture comprising hydrogen and a carbon-containing additive, and further depositing the carbon phase on the substrate located at the anode. This method is characterized in that the discharge is generated at a current density of between 0.15 and 0.5 A/cm2. The deposition process is carried out in a mixture containing hydrogen and vapors of ethylic alcohol or methane, under an overall pressure of between 50 and 300 Torrs and at a substrate temperature of between 600 and 900° C. The concentration of ethylic alcohol vapors ranges from 5 to 10% while that of methane vapors ranges from 15 to 30%. This invention also relates to another method for producing a cold cathode, wherein said method comprises generating a microwave discharge at an absorbed power of between 100 and 1000 W. This discharge is generated in a mixture containing gaseous carbon oxide as well as methane in an 0.8-1.2 concentration and under a pressure of between 10 and 200 Torrs, the carbon phase being further deposited on the substrate. This method is characterized in that the deposition process is carried out at a temperature on the substrate surface that ranges from 500 to 700° C.
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