公开(公告)号：US07755752B1

公开(公告)日：2010-07-13

申请号：US12098979

申请日：2008-04-07

申请人： Alexei Salnik ,  Lena Nicolaides

发明人： Alexei Salnik ,  Lena Nicolaides

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/1717 ,  H01L22/12

摘要： The capabilities of the Modulated Optical Reflectance (MOR) technology in dopant metrology applications are combined with the sensitivity of the PhotoReflectance (PR) method in the present system to provide stress and other measurements in semiconductor samples. Such combination enhances the measurement performance of MOR based systems in ion implant applications (implantation dose and energy) and expands system capabilities into a new area of structural parameters measurements, for example, strain in silicon wafers.

摘要翻译： 掺杂剂测量应用中的调制光反射（MOR）技术的能力与本系统中的PhotoReflectance（PR）方法的灵敏度相结合，以在半导体样品中提供应力和其他测量。 这种组合增强了离子注入应用（植入剂量和能量）中基于MOR的系统的测量性能，并将系统能力扩展到结构参数测量的新领域，例如硅晶片中的应变。

公开(公告)号：US07660686B1

公开(公告)日：2010-02-09

申请号：US12098991

申请日：2008-04-07

申请人： Lena Nicolaides ,  Alexei Salnik ,  Bin-ming Benjamin Tsai

发明人： Lena Nicolaides ,  Alexei Salnik ,  Bin-ming Benjamin Tsai

IPC分类号： G01N37/00 ,  G01N21/00

CPC分类号： G01N21/1717 ,  G01N21/9501

摘要： Samples subject to ion implantation are measured using a modulated optical reflectance system and the results of the measurements are compared to specification ranges for acceptable samples and a plurality of parametric ranges. Each parametric range is associated with a different known type of implantation fault. Measurement results outside of the specification range may be characterized by fault type by comparing the measurement results to a plurality of parametric ranges. In this way, a fault type may be quickly identified and the corresponding source of the fault may be corrected.

摘要翻译： 使用调制光学反射系统测量进行离子注入的样品，并将测量结果与可接受样品的规格范围和多个参数范围进行比较。 每个参数范围与不同的已知类型的植入断层相关联。 在规格范围之外的测量结果可以通过将测量结果与多个参数范围进行比较来表征故障类型。 以这种方式，可以快速识别故障类型，并且可以纠正相应的故障源。