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公开(公告)号:US11950436B2
公开(公告)日:2024-04-02
申请号:US18341473
申请日:2023-06-26
发明人: Lance Michael Wheeler , Kevin Joseph Prince , Colin Andrew Wolden , Mirzojamshed M. Mirzokarimov , Christopher Paul Muzzillo
摘要: The present disclosure relates to a device that includes an irregular network of interconnected ridges in physical contact with a planar substrate and a perovskite layer, where the planar substrate include a support layer and a first charge selective contact layer, the first charge selective contact layer is positioned between the support layer and the interconnected ridges, each ridge includes a second charge selective contact layer and an insulating layer, the insulating layer is positioned between the first charge selective contact layer and the second charge selective contact layer, and the perovskite layer substantially covers the plurality of interconnected ridges and the underlying planar substrate.
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公开(公告)号:US12132129B2
公开(公告)日:2024-10-29
申请号:US17759840
申请日:2021-02-15
IPC分类号: H01L31/0463 , G03F7/004 , H01L31/18
CPC分类号: H01L31/0463 , G03F7/0043 , H01L31/1828 , H01L31/1884
摘要: Disclosed herein are methods for using cracked film lithography (CFL) for patterning transparent conductive metal grids. CFL can be vacuum- and Ag-free, and it forms more durable grids than nanowire approaches.
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