公开(公告)号：US20180229342A1

公开(公告)日：2018-08-16

申请号：US15953064

申请日：2018-04-13

申请人： Alta Devices, Inc.

发明人： Stephen M. FISHER ,  Robindranath BANERJEE ,  Christopher L. BEAUDRY ,  Brian J. BROWN

IPC分类号： B24B7/22

CPC分类号： B24B7/228 ,  B24B7/224 ,  B24B27/0023 ,  B24B27/0069 ,  B24B27/0076 ,  B24B37/105 ,  B24B37/345 ,  B24B41/005 ,  H01L21/67173 ,  H01L21/67219 ,  H01L21/6776 ,  H01L31/00 ,  H01L31/18

摘要： A method and system for polishing a plurality of workpieces is disclosed. The method and system comprises providing a polishing tool with multiple polishing heads; and providing a substrate tray that can hold the plurality of work pieces in a fixed position on a tray underneath the polishing heads. The system and method includes moving the tray within the polisher. Finally, the method and system includes configuring the multiple polishing heads with the appropriate pad/slurry combinations to polish the workpieces and to create a finished polished surface on the plurality of work pieces.