-
公开(公告)号：US20050220931A1
公开(公告)日：2005-10-06
申请号：US10522563
申请日：2003-07-10
申请人： Anatol Schwersenz , Werner Saule , Andreas Noring , Peter Dress , Christian Burgel , Martin Tschinkl , Marlene Strobl
发明人： Anatol Schwersenz , Werner Saule , Andreas Noring , Peter Dress , Christian Burgel , Martin Tschinkl , Marlene Strobl
IPC分类号： G03F7/30 , B05B1/14 , B05C5/00 , H01L21/027
CPC分类号： B05C5/005
摘要： The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly (22) for applying a liquid to a substrate, said assembly having a nozzle body (26) comprising a plurality of nozzles (36) that are substantially arranged in a line and a guide plate (28) that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles (36) above the lower edge are directed towards the guide plate (28) in such a way that a film of liquid forms on the guide plate (28) and flows over the lower edge (64).
摘要翻译： 本发明的目的是以尽可能少的力将液体快速，均匀地应用于基底。 为了实现这一点，本发明提供了一种用于将液体施加到基底的喷嘴组件（22），所述组件具有喷嘴主体（26），喷嘴主体（26）包括基本上布置在管线中的多个喷嘴（36）和引导板 28），其基本上在垂直方向上以直的下边缘延伸。 根据本发明，下边缘上方的喷嘴（36）以导向板（28）上形成的液体薄膜流过下边缘（64）的方式指向引导板（28）。
-
公开(公告)号：US07419549B2
公开(公告)日：2008-09-02
申请号：US10522563
申请日：2003-07-10
申请人： Anatol Schwersenz , Werner Saule , Andreas Nöring , Peter Dress , Christian Bürgel , Martin Tschinkl , Marlene Strobl
发明人： Anatol Schwersenz , Werner Saule , Andreas Nöring , Peter Dress , Christian Bürgel , Martin Tschinkl , Marlene Strobl
IPC分类号： B05C3/02
CPC分类号： B05C5/005
摘要： The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly (22) for applying a liquid to a substrate, said assembly having a nozzle body (26) comprising a plurality of nozzles (36) that are substantially arranged in a line and a guide plate (28) that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles (36) above the lower edge are directed towards the guide plate (28) in such a way that a film of liquid forms on the guide plate (28) and flows over the lower edge (64).
摘要翻译： 本发明的目的是以尽可能少的力将液体快速，均匀地应用于基底。 为了实现这一点，本发明提供了一种用于将液体施加到基底的喷嘴组件（22），所述组件具有喷嘴主体（26），喷嘴主体（26）包括基本上布置在管线中的多个喷嘴（36）和引导板 28），其基本上在垂直方向上以直的下边缘延伸。 根据本发明，下边缘上方的喷嘴（36）以导向板（28）上形成的液体薄膜流过下边缘（64）的方式指向引导板（28）。
-
公开(公告)号：US06852473B2
公开(公告)日：2005-02-08
申请号：US10424312
申请日：2003-04-28
IPC分类号： H01L21/027 , G03C5/00 , B01F15/04
CPC分类号： H01L21/0276
摘要： A method for forming an anti-reflective coating on a semiconductor substrate, including providing a first vessel containing an anti-reflective coating component and a second vessel containing a solvent. The anti-reflective coating component from the first vessel and the solvent from the second vessel are supplied to a mixing chamber. The anti-reflective coating component and the solvent are mixed in the mixing chamber to form a product. The product is transferred to the semiconductor substrate. The product is applied to the semiconductor substrate to form the anti-reflective coating. A system for forming an anti-reflective coating on a semiconductor substrate, including a first vessel for containing an anti-reflective coating component and a second vessel for containing a solvent. The system also includes a mixing chamber for mixing the anti-reflective coating component with the solvent to form a product, and a fluid transport system connecting the mixing chamber and the substrate for supplying the product from the mixing chamber to the semiconductor substrate to form the anti-reflective coating.
摘要翻译： 一种在半导体衬底上形成抗反射涂层的方法，包括提供含有抗反射涂层组分的第一容器和含有溶剂的第二容器。 来自第一容器的抗反射涂层组分和来自第二容器的溶剂被供应到混合室。 将防反射涂层组分和溶剂混合在混合室中以形成产物。 将产物转移到半导体衬底。 将产品施加到半导体衬底以形成抗反射涂层。 一种用于在半导体衬底上形成抗反射涂层的系统，包括用于容纳抗反射涂层组分的第一容器和用于容纳溶剂的第二容器。 该系统还包括用于将抗反射涂层组分与溶剂混合以形成产物的混合室，以及连接混合室和基底的流体输送系统，用于将产物从混合室供给至半导体基底，以形成 防反射涂层。
-
公开(公告)号：US20050105073A1
公开(公告)日：2005-05-19
申请号：US10948570
申请日：2004-09-24
申请人： Jens Stacker , Heiko Hommen , Jens Bruch , Marlene Strobl , Karl Schumacher
发明人： Jens Stacker , Heiko Hommen , Jens Bruch , Marlene Strobl , Karl Schumacher
CPC分类号： G03F7/70466 , G03F7/70733
摘要： The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Alternatively, both structure patterns for the double exposure are formed on one mask. The substrate holder has one receiving station. The substrate holder, is displaced from the section including first structure pattern to the second, between the two exposure operations, without the masks having to be loaded or unloaded, and realigned.
摘要翻译： 提供在一个掩模上的相互关联的结构图案或用于双重或多次曝光的多个掩模可以被掩模基板保持器接收。 掩模基板保持器具有两个用于每个掩模的接收站。 或者，双曝光的两种结构图案都形成在一个掩模上。 基板支架有一个接收台。 在两个曝光操作之间，衬底保持器从包括第一结构图案的部分移动到第二结构图案，而不必将掩模装载或卸载，并重新对准。
-
公开(公告)号：US07310129B2
公开(公告)日：2007-12-18
申请号：US10948570
申请日：2004-09-24
申请人： Jens Stäcker , Heiko Hommen , Jens Uwe Bruch , Marlene Strobl , Karl Schumacher
发明人： Jens Stäcker , Heiko Hommen , Jens Uwe Bruch , Marlene Strobl , Karl Schumacher
CPC分类号： G03F7/70466 , G03F7/70733
摘要： The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Alternatively, both structure patterns for the double exposure are formed on one mask. The substrate holder has one receiving station. The substrate holder, is displaced from the section including first structure pattern to the second, between the two exposure operations, without the masks having to be loaded or unloaded, and realigned.
摘要翻译： 提供在一个掩模上的相互关联的结构图案或用于双重或多次曝光的多个掩模可以被掩模基板保持器接收。 掩模基板保持器具有两个用于每个掩模的接收站。 或者，双曝光的两种结构图案都形成在一个掩模上。 基板支架有一个接收台。 在两个曝光操作之间，衬底保持器从包括第一结构图案的部分移动到第二结构图案，而不必将掩模装载或卸载，并重新对准。
-
-
-
-
搜索结果
5 条记录 (耗时 0.022 秒)
