公开(公告)号：US09052608B2

公开(公告)日：2015-06-09

申请号：US13130245

申请日：2009-10-23

申请人： Roelof Wijnaendts Van Resandt ,  Roland Kaplan

发明人： Roelof Wijnaendts Van Resandt ,  Roland Kaplan

IPC分类号： G03B27/44 ,  G03B27/68 ,  G03B27/72 ,  G03B27/32 ,  G03F7/20 ,  G03B27/54 ,  G03B27/52

CPC分类号： G03F7/70291 ,  G03F7/70283 ,  G03F7/70308 ,  G03F7/70358 ,  G03F7/70466

摘要： A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or electro-optical deflection unit such that multiple projections impinge on the substrate at different positions such that a fine partial grid is created in the image grid on the substrate.

摘要翻译： 一种用于对辐射敏感衬底成像的方法和装置，其中使用具有衬底辐射敏感的波长的相干辐射将可编程模板投影到辐射敏感衬底上。 具有图像格栅的可编程模板的整体图像由声光学或电光偏转单元同时移位，使得多个突起在不同位置处撞击基板，使得在图像网格上产生精细的部分网格 基质。

公开(公告)号：US08582079B2

公开(公告)日：2013-11-12

申请号：US11838363

申请日：2007-08-14

申请人： Kuo-Shih Liu ,  Rudolf Hendel

发明人： Kuo-Shih Liu ,  Rudolf Hendel

IPC分类号： G03B27/44 ,  G03B27/54 ,  G03B27/32 ,  G03B27/42

CPC分类号： G03F7/70408 ,  G02B27/14

摘要： Interference lithography (IL) system and methods are disclosed according to embodiments of the invention. Two beams of coherent light with a first phase difference expose a first interference pattern on a nonlinear photoresist. A second interference pattern may be exposed on the nonlinear photoresist using the same coherent light beams with a second phase difference. The difference between the first and second phase differences is between 70° and 270°. The ensuing pattern is a composite of the first and second interference patterns. The IL may employ a third and fourth light beam.

摘要翻译： 根据本发明的实施例公开了干涉光刻（IL）系统和方法。 具有第一相位差的两束相干光在非线性光刻胶上暴露出第一干涉图案。 可以使用具有第二相位差的相同相干光束在非线性光致抗蚀剂上暴露第二干涉图案。 第一和第二相位差之间的差值在70°和270°之间。 随后的模式是第一和第二干涉图案的组合。 IL可以采用第三和第四光束。

公开(公告)号：US08294874B2

公开(公告)日：2012-10-23

申请号：US12370959

申请日：2009-02-13

申请人： Michio Kono

发明人： Michio Kono

IPC分类号： G03B27/44

CPC分类号： G03B27/70 ,  G03F7/70275

摘要： A scanning exposure apparatus has plural projection optical systems having plural mirrors configured to form an optical-axis shift vector. Its component in a direction orthogonal to a scanning direction is set so that adjacent areas in plural areas on the original can adjoin each other when viewed from the direction orthogonal to the scanning direction and adjacent areas in plural areas on the substrate can adjoin each other when viewed from the direction. A size of its component in the scanning direction is set so that a product between the imaging magnification of each projection optical system and a distance between centers of two areas on the original in the scanning direction corresponding to two projection optical systems in the plurality of projection optical systems can be equal to a distance between centers of two areas on the substrate corresponding to the two projection optical systems in the scanning direction.

摘要翻译： 扫描曝光装置具有多个配置成形成光轴移动矢量的多个反射镜的投影光学系统。 设定与扫描方向正交的方向的分量，使得当从与扫描方向正交的方向观察时原稿上的多个区域中的相邻区域可以彼此邻接，并且当基板上的多个区域中的相邻区域可以相邻时彼此相邻， 从方向看。 其分量在扫描方向上的尺寸被设定为使得每个投影光学系统的成像倍率与在多个投影中的两个投影光学系统对应的扫描方向上的原稿上的两个区域的中心之间的距离 光学系统可以等于在与扫描方向上的两个投影光学系统对应的基板上的两个区域的中心之间的距离。

公开(公告)号：US20090111056A1

公开(公告)日：2009-04-30

申请号：US12199308

申请日：2008-08-27

申请人： Rudolf Hendel ,  Zhilong Rao ,  Kuo-Shih Liu ,  Chris A. Mack ,  John S. Petersen ,  Shane Palmer

发明人： Rudolf Hendel ,  Zhilong Rao ,  Kuo-Shih Liu ,  Chris A. Mack ,  John S. Petersen ,  Shane Palmer

IPC分类号： G03F7/20 ,  G03F7/26 ,  G03B27/44

CPC分类号： G03F7/2022 ,  G03F7/70408 ,  G03F7/7045 ,  G03F7/70466 ,  G03F7/70558

摘要： Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance the dosage and exposure rates between the multiple lithography exposures to provide the needed exposure on the wafer. Other embodiments provide for assist features and/or may apply resolution enhancement to various exposures. In a specific embodiment, a wafer is first exposed using optical photolithography and then exposed using interference lithography.

摘要翻译： 公开了在晶片上提供多次光刻曝光的方法和系统，例如使用干涉光刻和光学光刻。 各种实施方案可平衡多次光刻曝光之间的剂量和曝光速率，以在晶片上提供所需的曝光。 其他实施例提供辅助特征和/或可以对各种曝光应用分辨率增强。 在具体实施例中，首先使用光学光刻曝光晶片，然后使用干涉光刻曝光。

公开(公告)号：US20090033892A1

公开(公告)日：2009-02-05

申请号：US11832799

申请日：2007-08-02

申请人： Oleg Kritsun ,  Bruno La Fontaine

发明人： Oleg Kritsun ,  Bruno La Fontaine

IPC分类号： G03B27/42 ,  G03B27/44

CPC分类号： G03B27/42

摘要： A composite exposure image is formed on a photoresist layer by applying a light beam through a reticle to form a first exposure image thereon, and thereafter, while maintaining the position of the reticle with respect to the photoresist layer, again applying a light beam through the reticle to form a second exposure image thereon. By adjusting the light beam differently in focus and intensity for each exposure, the combination of first and second exposure images form a pattern on the photoresist of lesser pitch than can be produced from a single exposure. The formation of a single pattern in the single resist layer from the two exposures avoids misalignment problems and eliminates the need for double exposure of a plurality of resist layers.

摘要翻译： 通过在光刻胶层上施加光束以在其上形成第一曝光图像，然后在保持掩模版相对于光致抗蚀剂层的位置的同时，在光致抗蚀剂层上形成复合曝光图像，再次将光束通过 标线片以在其上形成第二曝光图像。 通过在每次曝光的焦点和强度下不同地调整光束，第一和第二曝光图像的组合在比单次曝光产生的较小间距的光致抗蚀剂上形成图案。 从两次曝光中在单个抗蚀剂层中形成单一图案避免了未对准问题，并且消除了对多个抗蚀剂层的双重曝光的需要。

公开(公告)号：US20080198350A1

公开(公告)日：2008-08-21

申请号：US11230676

申请日：2005-09-21

申请人： Mitsuro Sugita ,  Miyoko Kawashima

发明人： Mitsuro Sugita ,  Miyoko Kawashima

IPC分类号： G03B27/44 ,  G03B27/54

CPC分类号： G03F7/70091 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/7025 ,  G03F7/70466

摘要： An exposure apparatus includes an illumination optical system for illuminating a predetermined mask, a projection optical system for projecting light from the mask to a predetermined exposure region, a first exposure device for illuminating the mask with a first sigma and for projecting light from the mask to the exposure region at a first spatial frequency passage spectrum of the projection system, so that the exposure region is exposed with a first pattern, and a second exposure device for illuminating the mask with a second sigma, different from the first sigma, and for projecting light from the mask to the exposure region at a second spatial frequency passage spectrum of the projection system, different from the first spatial frequency passage spectrum, so that the exposure region is exposed with a second pattern. A first exposure by the first exposure device and a second exposure by the second exposure device are carried out prior to a development process.

摘要翻译： 曝光装置包括用于照亮预定掩模的照明光学系统，用于将来自掩模的光投射到预定曝光区域的投影光学系统，用于利用第一西格玛照亮掩模的第一曝光装置和用于将来自掩模的光投射到 所述曝光区域在所述投影系统的第一空间频率通过光谱下，使得所述曝光区域以第一图案曝光;以及第二曝光装置，用于用与所述第一西格玛不同的第二西格玛照亮所述掩模，并且用于突出 不同于第一空间频率通过光谱的投影系统的第二空间频率通过光谱从掩模到曝光区域的光，从而以第二图案曝光曝光区域。 第一曝光装置的第一曝光和第二曝光装置的第二曝光在显影处理之前进行。

公开(公告)号：US5949523A

公开(公告)日：1999-09-07

申请号：US931580

申请日：1997-09-16

申请人： E. John Adolphi ,  Gerald A. Jensen ,  Michael Breckenridge ,  Todd Kuester ,  John Lawson ,  Patrick J. Galloway

发明人： E. John Adolphi ,  Gerald A. Jensen ,  Michael Breckenridge ,  Todd Kuester ,  John Lawson ,  Patrick J. Galloway

IPC分类号： G03B27/40 ,  G03B27/44 ,  G03B27/46 ,  G03B27/48 ,  G03B27/58 ,  G03D15/00 ,  G03B29/00 ,  G03B27/52

CPC分类号： G03B27/48 ,  G03B27/40 ,  G03B27/44 ,  G03B27/462 ,  G03B27/587 ,  G03D15/00 ,  G03B2227/005

摘要： An improved high speed package printer for producing a plurality of high quality photographs of varying size, shape, and style based on one or a plurality of different film negatives. The improved package printer of the present invention accomplishes the goal of increased throughput and speed through the use of an automatic paper-loading feature, ultrasonic proximity sensors for dynamically measuring paper-slack loops, off-center printing for eliminating the need to advance the paper for punching after each exposure, a rotational prism for creating 10".times.13" photographs without physically rotating the film, a 13-UP lens deck including 12 wallet lenses and a single 5".times.7" retro-focus lens for creating 12 wallet-sized photographs and one 5".times.7" photograph from a single exposure, an automatic diffusion plate cleaner for eliminating the system down time associated with manual diffusion plate cleaning, an improved filtering arrangement for equalizing the amount of energy emitted from each lamp within a photographic lamphouse, and bi-directional film movement for producing a single composite containing a plurality of different images or poses. The high speed package printer of the present invention also boasts an improved film cleaning arrangement for increasing the quality of the prints, as well as penumbra masking for producing photographs having sharply delineated borders.

公开(公告)号：US5940169A

公开(公告)日：1999-08-17

申请号：US916921

申请日：1997-08-22

申请人： Hironori Masutani

发明人： Hironori Masutani

IPC分类号： G03B27/32 ,  G03B27/46 ,  G03B27/73 ,  G03D15/00 ,  G03B27/52 ,  G03B27/44 ,  G03F3/10

CPC分类号： G03B27/735 ,  G03B27/32 ,  G03B27/462 ,  G03D15/001 ,  G03B2227/005

摘要： An image frame selecting device for a photographic printer comprises an image processing device for reading an image frame of a negative film and for multiple image frames in a multi-frame illustrative pattern on a monitor; an illustrative pattern switching device for changing the multi-frame illustrative patterns; a plurality of selection keys disposed corresponding to the arrangement of each image frame in the multi-frame illustrative pattern; and a selection key control device for assigning the selecting function of the image frames displayed on the monitor to only the keys whose positions correspond respectively to those of image frames in the multi-frame illustrative pattern selected by the illustrative pattern switching device.

摘要翻译： 一种用于照相打印机的图像帧选择装置，包括一个图像处理装置，用于在监视器上以多帧说明图案的形式读取负片的图像帧和多个图像帧; 用于改变多帧说明图案的说明性图案切换装置; 对应于多帧说明图案中的每个图像帧的布置布置的多个选择键; 以及选择键控制装置，用于将显示在监视器上的图像帧的选择功能仅分配给位置对应于由说明性图案切换装置选择的多帧说明图案中的图像帧的选择功能。

公开(公告)号：US5652646A

公开(公告)日：1997-07-29

申请号：US537124

申请日：1995-09-29

申请人： Tsutomu Murayama ,  Masashi Yahara

发明人： Tsutomu Murayama ,  Masashi Yahara

IPC分类号： G03B1/60 ,  G03B27/32 ,  G03B27/465 ,  G03B27/58 ,  G03B21/00 ,  G03B27/44

CPC分类号： G03B27/587 ,  G03B27/465

摘要： In an imaging apparatus for forwardly and reversely photographing images on two rows of film, the leader of the film is transported in a set amount before starting photographing images on the first row, and after photographing on the second row terminates, the trailer of the film is transported in an amount set on the basis of the amount of the leader transport.

摘要翻译： 在用于在两行胶片上正面和反向拍摄图像的成像装置中，在开始在第一行上拍摄图像之前，胶片的前导件以设定的量传送，并且在第二行的拍摄结束之后，电影的预告片 按照领导运送量设定的数额运输。

公开(公告)号：US5614988A

公开(公告)日：1997-03-25

申请号：US349754

申请日：1994-12-05

申请人： Kinya Kato ,  Masami Seki

发明人： Kinya Kato ,  Masami Seki

IPC分类号： G03F7/20 ,  G03B27/44 ,  G03B27/32

CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： A projection exposure apparatus and method having a projection optical system with a plurality of projection optical units and being excellent in matching between images formed through the respective projection optical units. First and second substrates are moved relatively to a projection optical system to project a pattern formed on the first substrate through the projection optical system onto the second substrate to effect exposure thereon. The projection optical system is provided with a plurality of projection optical units each forming a real-size erect image of the pattern formed on the first substrate on the second substrate. Each of the projection optical units has a plurality of reflective surfaces and is telecentric at least on an image side. The projection exposure apparatus also has a correcting mechanism disposed to correct an error of orientation between a plurality of images formed on the second substrate by the plurality of projection optical units.

摘要翻译： 一种投影曝光装置和方法，具有具有多个投影光学单元的投影光学系统，并且通过各个投影光学单元形成的图像之间的匹配性优异。 第一和第二基板相对于投影光学系统移动，以通过投影光学系统将形成在第一基板上的图案投影到第二基板上，以在其上进行曝光。 投影光学系统设置有多个投影光学单元，每个投影光学单元形成形成在第二基板上的第一基板上的图案的实际直立图像。 每个投影光学单元具有多个反射表面，并且至少在像侧上是远心的。 投影曝光装置还具有校正机构，用于校正由多个投影光学单元在形成在第二基板上的多个图像之间的取向误差。