公开(公告)号：US20060131903A1

公开(公告)日：2006-06-22

申请号：US11014401

申请日：2004-12-16

申请人： Anthony Bonora ,  Roger Hine ,  D. Nobles ,  Norma Riley

发明人： Anthony Bonora ,  Roger Hine ,  D. Nobles ,  Norma Riley

IPC分类号： B65G49/07

CPC分类号： H01L21/68707 ,  Y10S294/902 ,  Y10S414/141

摘要： The present invention comprises a distal rest pad for supporting a portion of a wafer seated on an end effector. In one embodiment, the rest pad includes a bottom support pad and an edge stop. Each element is mounted separately to the distal end of a support plate. The bottom support pad includes an inclined surface that transitions to a substantially horizontal surface at its distal end. The edge stop has a substantially vertical wafer contact surface that the peripheral edge of a wafer eventually contacts as the wafer is urged towards the distal rest pad. In another embodiment, the bottom support pad comprises an inclined surface. In yet another embodiment, the distal rest pad comprises a single structure. This distal rest pad includes a backstop portion and a bottom support separated by a particle collection groove. The bottom support may include an inclined lead-in surface that transitions into a flat contact surface or only comprise an inclined lead-in surface.

摘要翻译： 本发明包括用于支撑位于末端执行器上的晶片的一部分的远端休息垫。 在一个实施例中，休息垫包括底部支撑垫和边缘止动件。 每个元件分别安装到支撑板的远端。 底部支撑垫包括在其远端处转变到基本水平的表面的倾斜表面。 边缘止动器具有基本垂直的晶片接触表面，当晶片被推向远侧支撑垫时，晶片的周边边缘最终接触。 在另一个实施例中，底部支撑垫包括倾斜表面。 在另一个实施例中，远侧支撑垫包括单个结构。 该远端休息垫包括由颗粒收集槽分隔的止挡部分和底部支撑件。 底部支撑件可以包括倾斜的导入表面，其转变成平坦的接触表面或仅包括倾斜的导入表面。