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公开(公告)号：US06815670B2
公开(公告)日：2004-11-09
申请号：US10657223
申请日：2003-09-08
IPC分类号： G01N0000
CPC分类号： G01N1/02 , B01D53/30 , G01N1/2205 , G01N1/2214 , G01N27/622 , G01N2001/022 , G01N2001/024 , G01N2001/028 , G01N2001/2223
摘要： A detector requires a stream of dry air for transporting particles to the detector. The detector then operates to determine whether the dry air has transported any particles of interest. Continuous operation of the detector is permitted by providing first and second dryers that can be operated alternately for drying air that is to be directed to the detector. The dryer that is not being operated is recharged. Air is directed alternately between the first and second dryer to ensure that neither dryer is operated after reaching saturation.
摘要翻译： 检测器需要干燥空气流以将颗粒传送到检测器。 然后检测器操作以确定干燥空气是否运送了任何感兴趣的颗粒。 允许检测器的连续操作是通过提供第一和第二干燥器，其可以交替地操作来干燥要被引导到检测器的空气。 未运行的烘干机被充电。 空气交替地导向在第一和第二干燥器之间，以确保在达到饱和之后两个干燥器都不被操作。
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2.发明授权Integrated processing system having multiple reactors connected to a central chamber 失效具有多个反应器的集成处理系统连接到中央室公开(公告)号：US06776846B2
公开(公告)日：2004-08-17
申请号：US10131243
申请日：2002-04-25
IPC分类号： C23C1600
CPC分类号： H01L21/6719 , H01J37/185 , H01L21/67069 , H01L21/67126 , H01L21/67167 , H01L21/67742 , Y10S414/141
摘要： An integrated wafer processing system having a wafer queuing station and a plurality of plasma reactors connected to peripheral walls of a central vacuum chamber. Vacuum valves separate the central chamber from the queuing station and the plasma reactors. A wafer transfer arm capable of R-&THgr; motion can transfer wafers between the queuing station and any of the plasma reactors in either a single-step or a multi-step process.
摘要翻译： 具有晶片排队台和连接到中央真空室的周壁的多个等离子体反应器的集成晶片处理系统。 真空阀将中央室与排队台和等离子体反应器分开。 能够进行R-θ运动的晶片传送臂可以在单步或多步骤过程中在排队台和任何等离子体反应器之间传送晶片。
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公开(公告)号：US4392009A
公开(公告)日：1983-07-05
申请号：US312032
申请日：1981-10-16
申请人： Joseph D. Napoli
发明人： Joseph D. Napoli
IPC分类号： H01L31/042 , H01L31/048 , H02S30/10 , H02S40/34 , H01L31/04
CPC分类号： H01L31/048 , H02S30/10 , H02S40/34 , Y02E10/50
摘要： A solar power module comprising an array of solar cells arranged on a flat panel, said panel being supported by a substantially rigid, easily assembled frame comprising spaced apart side channels that each interlock with adjacent and channels.
摘要翻译： 一种太阳能发电模块，包括布置在平板上的太阳能电池阵列，所述面板由基本上刚性容易组装的框架支撑，所述框架包括间隔开的侧通道，每个通道与相邻和通道互锁。
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公开(公告)号：US07594447B2
公开(公告)日：2009-09-29
申请号：US11402190
申请日：2006-04-11
申请人： Joseph D. Napoli
发明人： Joseph D. Napoli
IPC分类号： G01N1/00
CPC分类号： G01N27/622 , G01N1/22 , G01N2001/024 , G01N2001/028
摘要： An apparatus is provided for detecting whether a person has handled explosives, narcotics or other substances of interest. The apparatus includes a metallic sample collection surface on which a person may place a finger. Upon removal of the finger, the metallic sample collection surface is moved to a desorber. The desorber heats the metallic surface sufficiently to vaporize residue transferred from the person. The vaporized residue then is transmitted to a detector for analysis. The detector also may include a fingerprint reading apparatus for reading the fingerprint of the person and comparing the fingerprint to known fingerprint data.
摘要翻译： 提供了一种用于检测人是否已经处理炸药，麻醉剂或其它感兴趣物质的装置。 该装置包括金属样品收集表面，人可以放置手指。 在去除手指时，将金属样品收集表面移动到解吸器。 解吸器充分加热金属表面以蒸发从人转移的残留物。 然后蒸发的残余物被传输到检测器进行分析。 检测器还可以包括用于读取人的指纹并将指纹与已知指纹数据进行比较的指纹读取装置。
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公开(公告)号：US6103055A
公开(公告)日：2000-08-15
申请号：US502860
申请日：1995-07-14
IPC分类号： B65G49/07 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67167 , H01L21/67069 , H01L21/67126 , H01L21/67742 , H01L21/67745
摘要： A substrate processing system is provided that includes substrate processing vessels, a substrate queuing station, a substrate transfer device, and a processor. The processor, in communication with the processing vessels, the queuing station, and the transfer device, provides selectable single and multi-step processing of the substrates by accessing a process command for a given substrate corresponding to desired processing of the substrate.
摘要翻译： 提供了一种基板处理系统，其包括基板处理容器，基板排队台，基板传送装置和处理器。 与处理容器，排队站和传送装置通信的处理器通过访问对应于衬底的期望处理的给定衬底的处理命令来提供对衬底的可选择的单步和多步处理。
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6.发明授权Integrated processing system having multiple reactors connected to a central chamber 失效具有多个反应器的集成处理系统连接到中央室公开(公告)号：US06413320B2
公开(公告)日：2002-07-02
申请号：US09782938
申请日：2001-02-13
IPC分类号： H01L2102
CPC分类号： H01L21/6719 , H01J37/185 , H01L21/67069 , H01L21/67126 , H01L21/67167 , H01L21/67742 , Y10S414/141
摘要： An integrated wafer processing system having a wafer queuing station and a plurality of plasma reactors connected to peripheral walls of a central vacuum chamber. Vacuum valves separate the central chamber from the queuing station and the plasma reactors. A wafer transfer arm capable of R-&THgr; motion can transfer wafers between the queuing station and any of the plasma reactors in either a single-step or a multi-step process.
摘要翻译： 具有晶片排队台和连接到中央真空室的周壁的多个等离子体反应器的集成晶片处理系统。 真空阀将中央室与排队台和等离子体反应器分开。 具有R-＆THgr的晶片传送臂 运动可以在单步或多步骤过程中在排队台和任何等离子体反应器之间传送晶片。
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7.发明授权Vacuum substrate processing system having multiple processing chambers and a central load/unload chamber 失效具有多个处理室和中央负载/卸载室的真空基板处理系统公开(公告)号：US06214119B1
公开(公告)日：2001-04-10
申请号：US09195749
申请日：1998-11-18
IPC分类号： C23C1600
CPC分类号： H01L21/6719 , H01J37/185 , H01L21/67069 , H01L21/67126 , H01L21/67167 , H01L21/67742 , Y10S414/141
摘要： The present invention includes plural plasma processing vessels and a wafer queuing station arrayed with a wafer transfer arm in a controlled environment. Wafers are movable within the controlled environment one at a time selectably between the several plasma vessels and the wafer queuing station without atmospheric or other exposure so that possible contamination of the moved wafers is prevented. The system is selectively operative in either single-step or multiple-step processing modes, and in either of the modes, the several plasma etching vessels are operable to provide a desirably high system throughput. In the preferred embodiment, the several plasma vessels and the queuing station are arrayed about a closed pentagonal locus with the wafer transfer arm disposed within the closed locus. The wafer transfer arm is movable in R and &THgr; between the several plasma etching vessels and the wafer queuing station, and selectably actuatable vacuum locks are provided between each of the plasma etching vessels and the R and &THgr; movable wafer transfer arm to both maintain an intended atmospheric condition and to allow wafer transport therethrough. The plasma vessels each include first and second water-cooled electrodes that are movable relatively to each other so as to provide a selectable gap dimension therebetween. One of the electrodes includes a selectively movable pedestal portion slidably mounted thereto that is cooperative with the R and &THgr; movable wafer transfer arm to load and unload wafers respectively into and out of the associated plasma vessel. The wafer transfer arm is operative to pick-up the wafers by back-side and peripheral wafer contact only, which therewith prevents possible front-side contact-induced contamination of the wafer surfaces. A sensor on the transfer arm is operative to provide a signal indication of proper wafer seating.
摘要翻译： 本发明包括多个等离子体处理容器和在受控环境中排列有晶片传送臂的晶片排队台。 晶片可以在受控环境内一次性地选择性地在几个等离子体容器和晶片排队台之间可选地没有大气或其他暴露，从而防止移动的晶片的可能的污染。 该系统选择性地以单步或多步处理模式操作，并且在任一模式中，几个等离子体蚀刻容器可操作以提供期望的高系统吞吐量。 在优选实施例中，几个等离子体容器和排队台围绕封闭的五边形轨迹排列，其中晶片传送臂设置在闭合轨迹内。 晶圆传送臂可在R和＆ 在等离子体蚀刻容器和晶片排队台之间，并且可选择地致动的真空锁提供在每个等离子体蚀刻容器与R和＆ 可移动晶片传送臂保持预期的大气条件并允许晶片从其中传输。 等离子体容器各自包括可相对于彼此移动的第一和第二水冷电极，以便在它们之间提供可选择的间隙尺寸。 其中一个电极包括可滑动地安装在其上的与R和＆amp; 可移动的晶片传送臂将晶片分别装入和卸载相关联的等离子体容器。 晶片传送臂可操作用于仅通过背面和外围晶片接触来拾取晶片，从而防止晶片表面的可能的前侧接触引起的污染。 传送臂上的传感器可操作以提供适当的晶片座位的信号指示。
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8.发明授权Combined input connector and lead selection switch for electrical signal processing apparatus 失效电信号处理装置的组合输入连接器和引线选择开关
公开(公告)号：US4196323A
公开(公告)日：1980-04-01
申请号：US833933
申请日：1977-09-16
申请人： Joseph D. Napoli
发明人： Joseph D. Napoli
CPC分类号： A61B5/04004 , H01R13/70
摘要： A consolidated input connector-selector switch and calibration switch for a medical instrument wherein the input connector and switch is mounted in the medical instrument housing partially in registry with an opening through the panel thereof. The selector switch is a multi-position rotary switch of a plurality of input and output terminals rotatable through a discrete number of positions. The switch is adapted to receive a connector having a plurality of signal leads and is operably connected with through drive means with the selector switch by rotation of the input connector rotates the selector switch. Additionally, the combination connector-selector switch is movable between forward and rearward positions being preferably biased forwardly and coupled with calibration switch means such that axial movement of the connector-selector switch combination actuates the calibration function within the medical instrument.
摘要翻译： 一种用于医疗仪器的综合输入连接器选择开关和校准开关，其中输入连接器和开关部分地安装在医疗器械壳体中，与通过其面板的开口对齐。 选择器开关是多个输入和输出端子的多位旋转开关，可以通过离散的位置旋转。 开关适于接收具有多个信号引线的连接器，并且通过驱动装置与选择器开关可操作地连接，输入连接器的旋转使选择器开关旋转。 另外，组合连接器选择器开关可以在向前和向后位置之间移动，优选向前偏置并与校准开关装置相耦合，使得连接器选择器开关组合的轴向移动致动医疗器械内的校准功能。
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公开(公告)号：US07047829B2
公开(公告)日：2006-05-23
申请号：US10929915
申请日：2004-08-30
申请人： Joseph D. Napoli
发明人： Joseph D. Napoli
IPC分类号： G01N1/00
CPC分类号： G01N27/622 , G01N1/22 , G01N2001/024 , G01N2001/028
摘要： An apparatus is provided for detecting whether a person has handled explosives, narcotics or other substances of interest. The apparatus includes a metallic sample collection surface on which a person may place a finger. Upon removal of the finger, the metallic sample collection surface is moved to a desorber. The desorber heats the metallic surface sufficiently to vaporize residue transferred from the person. The vaporized residue then is transmitted to a detector for analysis. The detector also may include a fingerprint reading apparatus for reading the fingerprint of the person and comparing the fingerprint to known fingerprint data.
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公开(公告)号：US5344542A
公开(公告)日：1994-09-06
申请号：US809031
申请日：1991-12-16
IPC分类号： B23Q7/08 , B65G49/07 , H01J37/18 , H01L21/00 , H01L21/302 , H01L21/3065 , H01L21/677 , H01L21/683 , C23C14/56 , H01L21/02
CPC分类号： H01L21/67167 , H01J37/185 , H01L21/67069 , H01L21/67126 , H01L21/6719 , H01L21/67742 , Y10S414/139
摘要： The present invention includes plural plasma etching vessels and a wafer queuing station arrayed with a wafer transfer arm in a controlled environment. Wafers are movable within the controlled environment one at a time selectably between the several plasma vessels and the wafer queuing station without atmospheric or other exposure so that possible contamination of the moved wafers is prevented. The system is selectively operative in either single-step or multiple-step processing modes, and in either of the modes, the several plasma etching vessels are operable to provide a desirably high system throughput. In the preferred embodiment, the several plasma vessels and the queuing station are arrayed about a closed pentagonal locus with the wafer transfer arm disposed within the closed locus. The wafer transfer arm is movable in R and TT between the several plasma etching vessels and the wafer queuing station, and selectably actuatable vacuum locks are provided between each of the plasma etching vessels and the R and TT movable wafer transfer arm to both maintain an intended atmospheric condition and to allow wafer transport therethrough. The plasma vessels each include first and second water-cooled electrodes that are movable relatively to each other so as to provide a selectable gap dimension therebetween. One of the electrodes includes a selectively movable pedestal portion slidably mounted thereto that is cooperative with the R and TT movable wafer transfer arm to load and unload wafers respectively into and out of the associated plasma vessel. The wafer transfer arm is operative to pick-up the wafers by back-side and peripheral wafer contact only, which therewith prevents possible front-side contact-induced contamination of the wafer surfaces. A sensor on the transfer arm is operative to provide a signal indication of proper wafer seating.
摘要翻译： 本发明包括多个等离子体蚀刻容器和在受控环境中排列有晶片传送臂的晶片排队台。 晶片可以在受控环境内一次性地选择性地在几个等离子体容器和晶片排队台之间可选地没有大气或其他暴露，从而防止移动的晶片的可能的污染。 该系统选择性地以单步或多步处理模式操作，并且在任一模式中，几个等离子体蚀刻容器可操作以提供期望的高系统吞吐量。 在优选实施例中，几个等离子体容器和排队台围绕封闭的五边形轨迹排列，其中晶片传送臂设置在闭合轨迹内。 晶片传送臂可以在几个等离子蚀刻容器和晶片排队台之间的R和TT中移动，并且可选择地致动的真空锁提供在每个等离子体蚀刻容器与R和TT可移动晶片传送臂之间，以保持预期的 大气条件并允许晶片从其中传输。 等离子体容器各自包括可相对于彼此移动的第一和第二水冷电极，以便在它们之间提供可选的间隙尺寸。 其中一个电极包括可滑动地安装在其上的可选择性地移动的基座部分，其与R和TT可移动晶片传送臂协作以将晶片分别加载和卸载相关联的等离子体容器。 晶片传送臂可操作用于仅通过背面和外围晶片接触来拾取晶片，从而防止晶片表面的可能的前侧接触引起的污染。 传送臂上的传感器可操作以提供适当的晶片座位的信号指示。
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