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公开(公告)号:US20070026325A1
公开(公告)日:2007-02-01
申请号:US11192400
申请日:2005-07-29
CPC分类号: G03F7/70291 , G03F7/70508 , G03F7/70783 , G03F7/70791
摘要: A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the substrate and to transform the distortion data into a frequency domain representation. The distortion data may alternatively be transformed into an orthogonal polynomial or an orthonormal polynomial representation.
摘要翻译: 一种失真测量装置,包括被布置为测量衬底的失真的检测器,以及被配置为接收指示所测量的衬底的失真的失真数据并将失真数据变换为频域表示的处理器。 可以将失真数据变换为正交多项式或正交多项式表示。
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公开(公告)号:US20070258076A1
公开(公告)日:2007-11-08
申请号:US11429451
申请日:2006-05-08
IPC分类号: G03B27/54
CPC分类号: G03F7/707 , G03F7/70216
摘要: A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.
摘要翻译: 公开了一种用于在光刻期间防止基板的外部区域的照射的掩模装置。 掩模装置包括掩模,该掩模包括多个分立的部分,其布置成形成位于基板的外部区域和照明系统之间的连续的环形掩模。
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