公开(公告)号：US20250022697A1

公开(公告)日：2025-01-16

申请号：US18220163

申请日：2023-07-10

Applicant: Applied Materials, Inc.

Inventor： Costel BILOIU ,  David MORRELL ,  Solomon Belangedi BASAME ,  Adam CALKINS ,  Kevin Richard VERRIER

IPC: H01J37/32

Abstract: A plasma processing apparatus. The plasma processing apparatus may include a plasma chamber, to define a plasma therein, and an extraction aperture, arranged along a first side of the plasma chamber, the extraction aperture to define an ion beam extracted therethrough. The plasma processing apparatus may further include a residence time tuning assembly, coupled to a portion of the plasma chamber, different from the first side, wherein the residence time tuning assembly comprises a pumping duct, connected to the plasma chamber on a first end, and defining a pumping path for extracting a gaseous species directly from the plasma chamber, separately from the extraction aperture.