公开(公告)号：US20250022697A1

公开(公告)日：2025-01-16

申请号：US18220163

申请日：2023-07-10

Applicant: Applied Materials, Inc.

Inventor： Costel BILOIU ,  David MORRELL ,  Solomon Belangedi BASAME ,  Adam CALKINS ,  Kevin Richard VERRIER

IPC: H01J37/32

Abstract: A plasma processing apparatus. The plasma processing apparatus may include a plasma chamber, to define a plasma therein, and an extraction aperture, arranged along a first side of the plasma chamber, the extraction aperture to define an ion beam extracted therethrough. The plasma processing apparatus may further include a residence time tuning assembly, coupled to a portion of the plasma chamber, different from the first side, wherein the residence time tuning assembly comprises a pumping duct, connected to the plasma chamber on a first end, and defining a pumping path for extracting a gaseous species directly from the plasma chamber, separately from the extraction aperture.

公开(公告)号：US20240371675A1

公开(公告)日：2024-11-07

申请号：US18508077

申请日：2023-11-13

Applicant: Applied Materials, Inc.

Inventor： Vijay D. PARKHE ,  Kevin Richard VERRIER

IPC: H01L21/683

Abstract: An electrostatic clamp system may include a conductive base; a ceramic body, having an inner side that is attached to the conductive base, and an outer side to face a substrate, the ceramic body including an electrode assembly; and a charge control assembly, the charge control assembly defining an electrically conductive structure that is isolated from the electrode assembly and extends through the conductive base to an upper surface of the outer side of the ceramic body.