公开(公告)号：US20220262600A1

公开(公告)日：2022-08-18

申请号：US17175216

申请日：2021-02-12

Applicant: Applied Materials, Inc.

Inventor： Ming XU ,  Ashley Mutsuo OKADA ,  Michael D. WILLWERTH ,  Duc Dang BUCKIUS ,  Jeffrey LUDWIG ,  Aditi MITHUN ,  Benjamin SCHWARZ

IPC: H01J37/32 ,  H01L21/3065

Abstract: A gas distribution apparatus is provided having a first reservoir with a first upstream end and a first downstream end and a second reservoir with a second upstream end and a second downstream end. A reservoir switch valve is in fluid communication with the first downstream end of the first reservoir and the second downstream end of the second reservoir. The reservoir switch valve operable to selectively couple the first reservoir to an outlet of the reservoir switch valve when in a first state, and couple the second reservoir to the outlet of the reservoir switch valve when in a second state. A plurality of proportional flow control valves are provided having inlets coupled in parallel to the outlet of the reservoir switch valve The plurality of proportional flow control valves have outlets configured to provide gas to a processing chamber.

公开(公告)号：US20220157574A1

公开(公告)日：2022-05-19

申请号：US17455197

申请日：2021-11-16

Applicant: Applied Materials, Inc.

Inventor： Benjamin SCHWARZ ,  Michael D. WILLWERTH ,  Aditi MITHUN ,  Prabhat KUMAR ,  Grace MATHEW ,  Andreas SCHMID

IPC: H01J37/32

Abstract: Embodiments of the present disclosure provide a method and an apparatus for processing a substrate. The apparatus has a ring assembly. The ring assembly has an edge ring and a shadow ring. The edge ring has a ring shaped body. The edge ring body has a top surface and a bottom surface. Pin holes extend through the edge ring body from the top surface to the bottom surface. The shadow ring has a ring shaped body. The shadow ring body has an upper surface and a lower surface. Sockets are formed on the lower surface, wherein the sockets in the shadow ring body align with the pin holes in the edge ring body.