公开(公告)号：US20040089536A1

公开(公告)日：2004-05-13

申请号：US10702230

申请日：2003-11-06

Applicant: Applied Materials, Inc.

Inventor： Michael Feltsman ,  Allen Lau ,  Michael Rosenstein ,  Marc O. Schweitzer

IPC: C23C014/32

CPC classification number: C23C14/566

Abstract: The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.

Abstract translation: 本发明通常提供物理气相沉积室和用于检测物理气相沉积室内快门盘的位置的方法。 在一个实施例中，物理气相沉积室包括其中设置有快门盘机构的室主体。 壳体密封地联接到室主体的侧壁并且通过穿过侧壁形成的槽与其连通。 至少第一传感器被布置成与壳体相邻并且被定向以检测壳体内的快门盘机构的存在。 在一个实施例中，用于检测具有基板支撑件的物理气相沉积室内的快门盘的位置的方法通常包括将快门盘移离基板支撑件，并且响应于第一传感器的位置改变第一传感器的状态 边缘快门盘。

公开(公告)号：US20030029568A1

公开(公告)日：2003-02-13

申请号：US09927747

申请日：2001-08-09

Applicant: Applied Materials, Inc.

Inventor： Karl Brown ,  Vineet Mehta ,  See-Eng Phan ,  Semyon Sherstinsky ,  Allen Lau

IPC: C23F001/02 ,  C23C016/00 ,  C23C014/00

CPC classification number: H01L21/67069 ,  H01J37/321 ,  H01J37/32623

Abstract: Generally, a substrate support member for supporting a substrate is provided. In one embodiment, a substrate support member for supporting a substrate includes a body coupled to a lower shield. The body has an upper surface adapted to support the substrate and a lower surface. The lower shield has a center portion and a lip. The lip is disposed radially outward of the body and projects towards a plane defined by the first surface. The lip is disposed in a spaced-apart relation from the body. The lower shield is adapted to interface with an upper shield disposed in a processing chamber to define a labyrinth gap that substantially prevents plasma from migrating below the member. The lower shield, in another embodiment, provides the plasma with a short RF ground return path.

公开(公告)号：US20040083977A1

公开(公告)日：2004-05-06

申请号：US10668529

申请日：2003-09-23

Applicant: Applied Materials, Inc.

Inventor： Karl Brown ,  Vineet Mehta ,  See-Eng Phan ,  Semyon Sherstinsky ,  Allen Lau

IPC: C23C016/00

CPC classification number: H01L21/67069 ,  H01J37/321 ,  H01J37/32623

Abstract: Generally, a substrate support member for supporting a substrate is provided. In one embodiment, a substrate support member for supporting a substrate includes a body coupled to a lower shield. The body has an upper surface adapted to support the substrate and a lower surface. The lower shield has a center portion and a lip. The lip is disposed radially outward of the body and projects towards a plane defined by the first surface. The lip is disposed in a spaced-apart relation from the body. The lower shield is adapted to interface with an upper shield disposed in a processing chamber to define a labyrinth gap that substantially prevents plasma from migrating below the member. The lower shield, in another embodiment, provides the plasma with a short RF ground return path.

Abstract translation: 通常，提供了用于支撑衬底的衬底支撑构件。 在一个实施例中，用于支撑衬底的衬底支撑构件包括联接到下屏蔽的主体。 主体具有适于支撑基板和下表面的上表面。 下屏蔽件具有中心部分和唇部。 唇缘设置在身体的径向外侧并朝向由第一表面限定的平面突出。 唇缘与身体间隔开设置。 下屏蔽适于与设置在处理室中的上屏蔽接口以限定基本上防止等离子体迁移到构件下方的迷宫间隙。 在另一个实施例中，下屏蔽为等离子体提供短的RF接地返回路径。

公开(公告)号：US20030155234A1

公开(公告)日：2003-08-21

申请号：US10082480

申请日：2002-02-20

Applicant: Applied Materials, Inc.

Inventor： Michael Feltsman ,  Allen Lau ,  Michael Rosenstein ,  Marc O. Schweitzer

IPC: C23C014/00 ,  B05C011/00 ,  C23C016/00 ,  B05C011/11

CPC classification number: C23C14/566

Abstract: The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.