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公开(公告)号：US20170092899A1
公开(公告)日：2017-03-30
申请号：US15126565
申请日：2014-03-21
Applicant: Stefan BANGERT , Jose Manuel DIEGUEZ-CAMPO , Uwe SCHÜSSLER , Andreas LOPP , Applied Materials, Inc.
Inventor： Stefan BANGERT , Jose Manuel DIEGUEZ-CAMPO , Uwe SCHÜSSLER , Andreas LOPP
CPC classification number: H01L51/56 , C23C14/042 , C23C14/243 , C23C14/26 , H01L51/001 , H01L51/0011 , H01L51/0012
Abstract: An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material, a distribution pipe with one or more outlets provided along the length of the distribution pipe, wherein the distribution pipe is in fluid communication with the evaporation crucible, and wherein the distribution pipe has a cross-section perpendicular to the length of the distribution pipe, which is non-circular, and which includes: an outlet side at which the one or more outlets are provided, wherein the width of the outlet side of the cross-section is 30% or less of the maximum dimension of the cross-section.
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2.发明公开公开(公告)号：US20240360546A1
公开(公告)日：2024-10-31
申请号：US18768799
申请日：2024-07-10
Applicant: Applied Materials, Inc.
Inventor： Andreas LOPP , Stefan BANGERT
CPC classification number: C23C14/542 , C23C14/24 , H01J37/32651
Abstract: A temperature-controlled shield for an evaporation source is described. The temperature-controlled shield is configured to provide a pre-heating zone or a post-cooling zone.
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公开(公告)号：US20190301002A1
公开(公告)日：2019-10-03
申请号：US16422794
申请日：2019-06-26
Applicant: Applied Materials, Inc.
Inventor： Stefan BANGERT , Tommaso VERCESI , Daniele GISLON , Oliver HEIMEL , Andreas LOPP , Dieter HAAS
IPC: C23C14/04 , C23C16/04 , C23C16/458
Abstract: A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.
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公开(公告)号：US20170342541A1
公开(公告)日：2017-11-30
申请号：US15534826
申请日：2014-12-10
Applicant: Applied Materials, Inc.
Inventor： Stefan BANGERT , Tommaso VERCESI , Daniele GISLON , Oliver HEIMEL , Andreas LOPP , Dieter HAAS
Abstract: A mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements and is configured to support a mask device, wherein the mask device is connectable to the mask frame; and at least one actuator connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force to the at least one frame element.
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公开(公告)号：US20240247362A1
公开(公告)日：2024-07-25
申请号：US18558817
申请日：2021-05-21
Applicant: Applied Materials, Inc.
Inventor： Julian AULBACH , Andreas MÜLLER , Harald WURSTER , Andreas LOPP , David Friedrich FREIHERR VON LINDENFELS , Takashi ANJIKI
CPC classification number: C23C14/243 , C23C14/12
Abstract: A nozzle for an evaporated material distributor is described. The nozzle includes a nozzle inlet for receiving evaporated material; a nozzle outlet; and a nozzle passage extending between the nozzle inlet and the nozzle outlet having a first passage portion, a second passage portion and a third passage portion, the second passage portion having an aperture angle which continuously increases in a direction from the nozzle inlet to the nozzle outlet and the third passage portion having an essentially constant aperture angle.
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Patent Agency Ranking
公开(公告)号：US20210381095A1
公开(公告)日：2021-12-09
申请号：US17332845
申请日：2021-05-27
Applicant: Applied Materials, Inc.
Inventor： Stefan BANGERT , Andreas LOPP
Abstract: A vapor deposition apparatus is described. The vapor deposition apparatus includes a substrate support for supporting a substrate to be coated; a vapor source with a plurality of nozzles for directing vapor toward the substrate support through a vapor propagation volume; and a heatable shield extending from the vapor source toward the substrate support. The heatable shield surrounds the vapor propagation volume at least partially and includes an edge exclusion portion for masking areas of the substrate not to be coated. The substrate support may be a rotatable drum with a curved drum surface, and the vapor deposition apparatus may be configured to move the substrate on the curved drum surface past the vapor source in a circumferential direction.
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公开(公告)号：US20190148642A1
公开(公告)日：2019-05-16
申请号：US16300484
申请日：2016-05-10
Applicant: Applied Materials, Inc.
Inventor： Jose Manuel DIEGUEZ-CAMPO , Stefan BANGERT , Andreas LOPP , Harald WURSTER , Dieter HAAS
CPC classification number: H01L51/0011 , C23C14/042 , C23C14/12 , C23C14/24 , C23C14/243 , C23C14/564 , H01L51/001 , H01L51/56
Abstract: A method of operating a deposition apparatus is provided. The method comprises: Deposition of an evaporated source material on a substrate by guiding the evaporated source material from one or more outlets of an evaporation toward the substrate, wherein part of the evaporated source material is blocked by and attaches to a shielding device arranged between the one or more and the substrate, followed by a cleaning of the shielding device by at least locally heating the shielding device for releasing at least part of the attached source material from the shielding device. According to a further aspect, a deposition apparatus is provided that can be operated according to the described methods.
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公开(公告)号：US20170081755A1
公开(公告)日：2017-03-23
申请号：US15126568
申请日：2014-03-21
Applicant: Jose Manuel DIEGUEZ-CAMPO , Stefan BANGERT , Andreas LOPP , Uwe SCHÜSSLER , Applied Materials, Inc.
Inventor： Jose Manuel DIEGUEZ-CAMPO , Stefan BANGERT , Andreas LOPP , Uwe SCHÜSSLER
CPC classification number: C23C14/243 , C23C14/042 , C23C14/56 , H01L51/001 , H01L51/0011 , H01L51/56
Abstract: An evaporation source array for depositing two or more organic materials on a substrate is described. The evaporation source array includes two or more evaporation crucibles, wherein the two or more evaporation crucibles are configured to evaporate the two or more organic materials, two or more distribution pipes with outlets provided along the length of the two or more distribution pipes, wherein a first distribution pipe of the two or more distribution pipes is in fluid communication with a first evaporation crucible of the two or more evaporation crucibles, two or more heat shields, which surround the first distribution pipe, a cooling shield arrangement provided at at least one side of the two or more distribution pipes, wherein the at least one side is the side at which the outlets are provided, and a cooling element provided at or in the cooling shield arrangement for active cooling of the cooling shield arrangement.
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公开(公告)号：US20220033958A1
公开(公告)日：2022-02-03
申请号：US16944511
申请日：2020-07-31
Applicant: Applied Materials, Inc.
Inventor： Thomas DEPPISCH , Stefan BANGERT , Annabelle HOFMANN , Andreas LOPP , Thomas GOIHL
Abstract: An evaporation source for depositing an evaporated material on a substrate is described. The evaporation source includes an evaporation crucible for evaporating a material; a vapor distributor with a plurality of nozzles for directing the evaporated material toward the substrate; a vapor conduit extending in a conduit length direction (A) from the evaporation crucible to the vapor distributor and providing a fluid connection between the evaporation crucible and the vapor distributor, wherein at least one nozzle of the plurality of nozzles has a nozzle axis extending in, or essentially parallel to, the conduit length direction (A); and a baffle arrangement in the vapor conduit. Further described are a vapor deposition apparatus including such an evaporation source and methods of coating a substrate in a vacuum chamber.
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公开(公告)号：US20210381102A1
公开(公告)日：2021-12-09
申请号：US17332822
申请日：2021-05-27
Applicant: Applied Materials, Inc.
Inventor： Andreas LOPP , Stefan BANGERT
Abstract: A temperature-controlled shield for an evaporation source is described. The temperature-controlled shield is configured to provide a pre-heating zone or a post-cooling zone.
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