公开(公告)号：US20240087839A1

公开(公告)日：2024-03-14

申请号：US17943753

申请日：2022-09-13

Applicant: Applied Materials, Inc.

Inventor： Dawei Sun ,  Eric D. Hermanson ,  Benjamin E. Heneveld

IPC: H01J37/20 ,  G02F1/163 ,  H01J37/02 ,  H05B1/02

CPC classification number: H01J37/20 ,  G02F1/163 ,  H01J37/023 ,  H05B1/0233 ,  H01J37/3171 ,  H01J2237/2007

Abstract: A workpiece mounting system comprising a chuck and a base is disclosed. The emissivity of the base is increased to allow more heat transfer from the chuck to the base. In some embodiments, the emissivity of the base may be controllable so that for ion beams with lower power levels, the emissivity remains low, enabling the chuck to reach the desired temperature quickly. For ion beams with higher power levels, the emissivity may increase to allow more heat transfer to the base, allowing the chuck to maintain the desired temperature. High emissivity coatings may be applied to the top surface of the base. In other embodiments, a set of movable shields may be disposed between the chuck and the base. The position of the shields may be a function of the power level of the incoming ion beam.