公开(公告)号：US20170107610A1

公开(公告)日：2017-04-20

申请号：US15276526

申请日：2016-09-26

Applicant: Applied Materials, Inc.

Inventor： Shuo Julia NA ,  Patrick L. SMITH ,  Ilias ILIOPOULOS ,  Songfu JIANG ,  Bo ZHANG

IPC: C23C14/54 ,  H01L21/67 ,  G05B17/02

CPC classification number: H01L21/67253 ,  C23C14/54 ,  C23C14/564 ,  H01L21/67288

Abstract: Embodiments presented herein provide techniques for controlling deposition processes in a process chamber based on monitoring contaminant gas levels in a chamber. Embodiments include generating a data model defining acceptable levels within the chamber for each of a plurality of gas types. Gas levels of the plurality of gas types within the chamber are monitored using one or more sensor devices within the chamber. Upon determining that at least one gas level within the chamber violates the acceptable level for the respective gas type within the data model, embodiments perform a corrective action for the chamber.