公开(公告)号：US20150221563A1

公开(公告)日：2015-08-06

申请号：US14610441

申请日：2015-01-30

Applicant: Applied Materials, Inc.

Inventor： Ilias ILIOPOULOS ,  Shuo NA ,  Kelby YANCY ,  Chunsheng CHEN

IPC: H01L21/66 ,  C23C16/458 ,  C23C16/52 ,  H01L21/67 ,  C23C16/48

CPC classification number: H01L22/12 ,  C23C14/52 ,  C23C14/56 ,  C23C16/52 ,  C23C16/54 ,  G01N21/9503 ,  H01L21/67201 ,  H01L21/67259 ,  H01L21/67288 ,  H01L22/26

Abstract: Methods and apparatus for determining substrate integrity and alignment are described. Devices as described herein can include a transfer chamber, one or more process chambers, a loadlock chamber a first optical device, a second optical device and a radiation source positioned outside and above an opening for the loadlock chamber. Methods as described herein can include delivering a substrate to an opening in a process chamber, activating the optical device and the radiation source and capturing a plurality of images, extracting a substrate edge pattern from the plurality of images, comparing the substrate edge pattern to an expected edge pattern to determine a level of edge variance and adjusting or stopping a process if the level of edge variance is outside of an edge variation range.

Abstract translation: 描述了用于确定衬底完整性和对准的方法和装置。 如本文所述的装置可以包括传送室，一个或多个处理室，负载锁定室，第一光学装置，第二光学装置和位于负载锁定室的开口外侧和上方的辐射源。 如本文所述的方法可以包括将衬底递送到处理室中的开口，激活光学器件和辐射源并捕获多个图像，从多个图像中提取衬底边缘图案，将衬底边缘图案与 预期边缘模式以确定边缘方差的水平，并且如果边缘方差的水平在边缘变化范围之外，则调整或停止处理。

公开(公告)号：US20150221484A1

公开(公告)日：2015-08-06

申请号：US14610572

申请日：2015-01-30

Applicant: Applied Materials, Inc.

Inventor： Ilias ILIOPOULOS ,  Shuo NA ,  Kelby YANCY ,  Chunsheng CHEN

IPC: H01J37/32 ,  C23C16/505 ,  C23C16/458 ,  G01R31/02 ,  C23C16/52

CPC classification number: H01J37/32935 ,  C23C16/505 ,  C23C16/52 ,  H01J37/32174 ,  H01J37/32944 ,  H01J37/3299

Abstract: The present invention generally relates to a method for detecting the breakage of one or more grounding straps without stopping processing or opening the processing chamber for inspection. In one embodiment, a method for detecting grounding strap breakage in a processing chamber includes monitoring real-time RF related data from plasma generated in the processing chamber. The method also includes comparing the real-time RF related data with a pre-determined threshold RF related data. The method includes generating an alert if the real-time RF related data meets or exceeds the pre-determined threshold RF related data. In one embodiment, the RF related data includes RF frequency, direct current voltage, voltage peak-to-peak, and/or RF reflected power.

Abstract translation: 本发明一般涉及一种用于检测一个或多个接地带的断裂而不停止处理或打开用于检查的处理室的方法。 在一个实施例中，一种用于检测处理室中的接地带断裂的方法包括：从处理室中产生的等离子体监测实时RF相关数据。 该方法还包括将实时RF相关数据与预定阈值RF相关数据进行比较。 如果实时RF相关数据满足或超过预定阈值RF相关数据，则该方法包括产生警报。 在一个实施例中，RF相关数据包括RF频率，直流电压，电压峰 - 峰和/或RF反射功率。

公开(公告)号：US20170107610A1

公开(公告)日：2017-04-20

申请号：US15276526

申请日：2016-09-26

Applicant: Applied Materials, Inc.

Inventor： Shuo Julia NA ,  Patrick L. SMITH ,  Ilias ILIOPOULOS ,  Songfu JIANG ,  Bo ZHANG

IPC: C23C14/54 ,  H01L21/67 ,  G05B17/02

CPC classification number: H01L21/67253 ,  C23C14/54 ,  C23C14/564 ,  H01L21/67288

Abstract: Embodiments presented herein provide techniques for controlling deposition processes in a process chamber based on monitoring contaminant gas levels in a chamber. Embodiments include generating a data model defining acceptable levels within the chamber for each of a plurality of gas types. Gas levels of the plurality of gas types within the chamber are monitored using one or more sensor devices within the chamber. Upon determining that at least one gas level within the chamber violates the acceptable level for the respective gas type within the data model, embodiments perform a corrective action for the chamber.

公开(公告)号：US20150219565A1

公开(公告)日：2015-08-06

申请号：US14610367

申请日：2015-01-30

Applicant: Applied Materials, Inc.

Inventor： Ilias ILIOPOULOS ,  Shuo NA ,  Kelby YANCY ,  Chunsheng CHEN

IPC: G01N21/84 ,  G01B11/06 ,  C23C16/52

CPC classification number: G01B11/0625 ,  C23C14/547 ,  C23C16/52 ,  G01B2210/56 ,  G01N2201/12 ,  H01L22/12

Abstract: A method and apparatus for measuring the thickness of a deposited layer are disclosed herein. Devices as described herein can include a transfer chamber, one or more processing chambers each having an entrance, a loadlock chamber comprising a loadlock entrance and a loadlock exit; and an optical monitoring system comprising a plurality of optical devices positioned proximate to at least one of the entrances. Methods as described herein can include delivering a substrate with at least one deposited layer through an opening in a chamber, activating an optical monitoring system at the opening of the chamber such that the optical monitoring system performs a plurality of optical measurements of the deposited layers, delivering the optical measurements to a signal processing system and correlating the optical measurements to one or more film attributes.

Abstract translation: 本文公开了一种用于测量沉积层的厚度的方法和装置。 如本文所述的装置可以包括传送室，一个或多个处理室，每个处理室均具有入口，负载锁定室包括负载锁入口和负载锁出口; 以及光学监测系统，其包括位于至少一个入口处定位的多个光学装置。 如本文所述的方法可以包括通过室中的开口递送具有至少一个沉积层的衬底，在室的开口处激活光学监测系统，使得光学监测系统执行沉积层的多个光学测量， 将光学测量传递到信号处理系统，并将光学测量与一个或多个胶片属性相关联。

公开(公告)号：US20150048862A1

公开(公告)日：2015-02-19

申请号：US14459152

申请日：2014-08-13

Applicant: Applied Materials, Inc.

Inventor： Shuo NA ,  Kelby YANCY ,  Chunsheng CHEN ,  Ilias ILIOPOULOS

IPC: H01J37/32 ,  H01L21/66 ,  G01R31/24

CPC classification number: H01J37/32944 ,  G01R31/12 ,  G01R31/245 ,  H01J2237/0225 ,  H01J2237/24592

Abstract: A method and apparatus for detecting substrate arcing and breakage within a processing chamber is provided. A controller monitors chamber data, e.g., parameters such as RF signals, voltages, and other electrical parameters, during operation of the processing chamber, and analyzes the chamber data for abnormal spikes and trends. Using such data mining and analysis, the controller can detect broken substrates without relying on glass presence sensors on robots, but rather based on the chamber data.

Abstract translation: 提供了一种用于检测处理室内的基板电弧和断裂的方法和装置。 在处理室的操作期间，控制器监视室数据，例如诸如RF信号，电压和其他电参数的参数，并且分析室数据以产生异常尖峰和趋势。 使用这种数据挖掘和分析，控制器可以检测破碎的基板，而不依赖于机器人上的玻璃存在传感器，而是基于腔室数据。

公开(公告)号：US20190066986A1

公开(公告)日：2019-02-28

申请号：US15692996

申请日：2017-08-31

Applicant: Applied Materials, Inc.

Inventor： Ilias ILIOPOULOS

IPC: H01J37/32 ,  H01L21/687 ,  H01J37/244

Abstract: In one embodiment of the invention, a method for predicting a susceptor's service life in a processing chamber is disclosed. The method begins by creating virtual sensors in a processing chamber having a susceptor. The virtual sensors monitor one or more parameters on the susceptor and the age of the susceptor is tracked throughout the susceptor's life in the processing chamber with the virtual sensors.

公开(公告)号：US20150147830A1

公开(公告)日：2015-05-28

申请号：US14091095

申请日：2013-11-26

Applicant: Applied Materials, Inc.

Inventor： Ilias ILIOPOULOS ,  Shuo NA ,  Kelby YANCY

IPC: H01L21/66

CPC classification number: H01J37/32174 ,  H01J37/32577 ,  H01J37/32853 ,  H01J37/3288 ,  H01J37/32935 ,  H01J37/3299

Abstract: A method comprising processing a substrate exposed to a plasma in a processing chamber, obtaining a metric indicative of a parameter of the plasma during the processing of the substrate, and determining a defect in the substrate by comparing the metric to a predefined criteria.

Abstract translation: 一种方法，包括处理在处理室中暴露于等离子体的衬底，在衬底的处理期间获得指示等离子体的参数的度量，以及通过将度量与预定标准进行比较来确定衬底中的缺陷。