公开(公告)号：US20250073819A1

公开(公告)日：2025-03-06

申请号：US18242184

申请日：2023-09-05

Applicant: Applied Materials, Inc.

Inventor： Chunrong YIN ,  Ching-Pao WANG ,  Joseph LIU ,  Yixing LIN ,  Boon Sen CHAN ,  Siamak SALIMIAN

IPC: B23K26/352 ,  B23K26/082 ,  B23K26/40

Abstract: Methods and apparatus for cleaning a used component from a substrate processing chamber are provided. In some embodiments, the method includes obtaining a used component having a ceramic base and process residue that is generated as a byproduct in the substrate processing chamber and that is in direct contact with the ceramic base; and at least partially removing the process residue by scanning a laser beam across the process residue.