专利检索 ap:("Applied Materials, Inc.") AND inv:"DAVID PETERSON" 第 1 页

1.

发明公开
MEMS RESONATOR SENSOR SUBSTRATE FOR PLASMA, TEMPERATURE, STRESS, OR DEPOSITION SENSING 审中-公开

公开(公告)号：US20240102876A1

公开(公告)日：2024-03-28

申请号：US18531478

申请日：2023-12-06

申请人： Applied Materials, Inc.

发明人： CHUANG-CHIA LIN , DAVID PETERSON , PHILIP ALLAN KRAUS , AMIR BAYATI

IPC分类号： G01L19/00 , H03H9/02 , H03H9/145

CPC分类号： G01L19/0092 , H03H9/02015 , H03H9/02574 , H03H9/14502 , G01N29/022 , G01N2291/014

摘要： Embodiments disclosed herein include diagnostic substrates and methods of using the diagnostic substrates to extract plasma parameters. In an embodiment, a diagnostic substrate comprises a substrate and an array of resonators across the substrate. In an embodiment, the array of resonators comprises at least a first resonator with a first structure and a second resonator with a second structure. In an embodiment, the first structure is different than the second structure.