公开(公告)号：US12046503B2

公开(公告)日：2024-07-23

申请号：US17510991

申请日：2021-10-26

Applicant: Applied Materials, Inc.

Inventor： Dawei Sun ,  Daniel Hall

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687 ,  H01T23/00

CPC classification number: H01L21/6833 ,  H01L21/67115 ,  H01L21/67248 ,  H01L21/68721 ,  H01L21/68742

Abstract: A chuck for heating and clamping a workpiece, such as a semiconductor workpiece, is disclosed. The chuck is configured to allow the workpiece to be heated to temperatures in excess of 600° C. Further, while the workpiece is heating, the components that make up the chuck may be maintained at a much lower temperature, such as room temperature. The chuck includes a housing, formed as a hollow cylinder with sidewalls and an open end. Electrodes are disposed at the top surface of the sidewalls to clamp the workpiece. A heat source is disposed in the cavity and emits radiated heat toward the workpiece. A clamp ring may be used to secure the workpiece. In some embodiments, a thermal sensor is used to monitor the temperature of the workpiece.

公开(公告)号：US20230132307A1

公开(公告)日：2023-04-27

申请号：US17510991

申请日：2021-10-26

Applicant: Applied Materials, Inc.

Inventor： Dawei Sun ,  Daniel Hall

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687

Abstract: A chuck for heating and clamping a workpiece, such as a semiconductor workpiece, is disclosed. The chuck is configured to allow the workpiece to be heated to temperatures in excess of 600° C. Further, while the workpiece is heating, the components that make up the chuck may be maintained at a much lower temperature, such as room temperature. The chuck includes a housing, formed as a hollow cylinder with sidewalls and an open end. Electrodes are disposed at the top surface of the sidewalls to clamp the workpiece. A heat source is disposed in the cavity and emits radiated heat toward the workpiece. A clamp ring may be used to secure the workpiece. In some embodiments, a thermal sensor is used to monitor the temperature of the workpiece.

公开(公告)号：US20240222070A1

公开(公告)日：2024-07-04

申请号：US18387987

申请日：2023-11-08

Applicant: Applied Materials, Inc.

Inventor： Stephen Krause ,  Gary J. Rosen ,  Matthew Gaucher ,  Jay T. Scheuer ,  Frank Sinclair ,  Jonathan Lowder ,  Pratim Palit ,  Daniel Hall

IPC: H01J37/304 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/24578

Abstract: An ion implanter to facilitate channeling of an ion beam into a crystalline structure of a workpiece is disclosed. The ion implanter comprises an ion source to generate an ion beam, a platen to support the workpiece having the crystalline structure, an Xray source to generate an Xray beam, wherein at least a portion of the Xray beam impacts the workpiece to produce diffracted Xrays, an Xray detector positioned to receive the diffracted Xrays, and a controller, in communication with the Xray source, the platen, and the Xray detector. The controller contains instructions, which enable the ion implanter to perform a rocking curve test after the workpiece is disposed on the platen and calculate an orientation of the platen for an ion implant process based on a result of the rocking curve test to facilitate channeling of the ion beam into the crystalline structure of the workpiece.