公开(公告)号：US20220397706A1

公开(公告)日：2022-12-15

申请号：US17725010

申请日：2022-04-20

Applicant: Applied Materials, Inc.

Inventor： Shu-Kwan LAU ,  Enle CHOO ,  Danny Don WANG ,  Shainish NELLIKKA ,  Toshiyuki NAKAGAWA ,  Zhiyuan YE ,  Abhishek DUBE

IPC: G02B5/09 ,  H05B3/00

Abstract: Apparatus for heating a substrate within a substrate processing chamber are described herein. More specifically, possible lamp modules for use within a substrate processing chamber are described. The lamp modules include a reflector body. The reflector body is a reflective material. The reflector body includes grooves disposed in a surface and configured to direct radiant energy towards a substrate. Each ring includes multiple grooves with different cross sections to allow radiant energy to be directed at different radial positions on the substrate from the same ring. The grooves may be either curved or linear grooves.