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公开(公告)号:US20220397706A1
公开(公告)日:2022-12-15
申请号:US17725010
申请日:2022-04-20
Applicant: Applied Materials, Inc.
Inventor: Shu-Kwan LAU , Enle CHOO , Danny Don WANG , Shainish NELLIKKA , Toshiyuki NAKAGAWA , Zhiyuan YE , Abhishek DUBE
Abstract: Apparatus for heating a substrate within a substrate processing chamber are described herein. More specifically, possible lamp modules for use within a substrate processing chamber are described. The lamp modules include a reflector body. The reflector body is a reflective material. The reflector body includes grooves disposed in a surface and configured to direct radiant energy towards a substrate. Each ring includes multiple grooves with different cross sections to allow radiant energy to be directed at different radial positions on the substrate from the same ring. The grooves may be either curved or linear grooves.
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公开(公告)号:US20250027716A1
公开(公告)日:2025-01-23
申请号:US18355938
申请日:2023-07-20
Applicant: Applied Materials, Inc.
Inventor: Raja Murali DHAMODHARAN , Shu-Kwan LAU , Shainish NELLIKKA , Enle CHOO , Kalaivanan MOHANADASS , Aniketnitin PATIL
Abstract: A modular reflective heating system for use in a process chamber is provided. The modular reflective heating system includes: a plurality of connectors; a plurality of lamps, each lamp connected to at least one of the connectors; a reflector including: a base; and a reflective assembly including a first plurality of reflective portions and a second plurality of reflective portions. Each reflective portion in the first plurality of reflective portions and the second plurality of reflective portions is connected to the base, and each reflective portion in the first plurality of reflective portions and the second plurality of reflective portions is configured to be individually disconnected from the base. The modular reflective heating system further includes a spare reflective portion configured to replace a first reflective portion in the first plurality of reflective portions or the second plurality of reflective portions.
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公开(公告)号:US20230341186A1
公开(公告)日:2023-10-26
申请号:US17730038
申请日:2022-04-26
Applicant: Applied Materials, Inc.
Inventor: Abraham PALATY , Vinodh RAMACHANDRAN , Shu-Kwan LAU , Shainish NELLIKKA , Raja Murali DHAMODHARAN , Danny D. WANG
CPC classification number: F28D1/0226 , F28D1/0477 , F28D1/024 , F28F1/24 , F28D2001/0286
Abstract: A heating module for a substrate processing chamber includes heating lamps coupled to a reflector plate and a heat exchanger. The heat exchanger cools a gas within the heating module. A fan within the heating module circulates the gas through apertures in the reflector plate to cool the heating bulbs. The gas is cooled by the heat exchanger, and is recirculated. One or more shrouds directs the gas as the gas is being circulated.
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公开(公告)号:US20220322492A1
公开(公告)日:2022-10-06
申请号:US17223940
申请日:2021-04-06
Applicant: Applied Materials, Inc.
Inventor: Shu-Kwan LAU , Brian Hayes BURROWS , Zhiyuan YE , Richard O. COLLINS , Enle CHOO , Danny D. WANG , Shainish NELLIKKA , Toshiyuki NAKAGAWA , Abhishek DUBE , Ala MORADIAN , Kartik Bhupendra SHAH
IPC: H05B3/00
Abstract: A process chamber includes a chamber body having a ceiling disposed above a floor with a chassis and an injector ring disposed therebetween. Upper and lower clamp rings secure the upper and floors, respectively, in place. An upper heating module is coupled to the upper clamp ring above the ceiling. A lower heating module is coupled to the lower clamp ring below the floor.
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