公开(公告)号：US20200011652A1

公开(公告)日：2020-01-09

申请号：US16026982

申请日：2018-07-03

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. JOHNSTON ,  Cheuk Ming LEE ,  Jae Myung YOO ,  Glen Alan GOMES ,  David Michael CORRIVEAU ,  Thang Duc NGUYEN

IPC: G01B9/02 ,  G03F7/20

Abstract: Processing systems and methods used in the manufacturing of flat panel displays (FPDs) are provided herein. In one embodiment, a processing system features a motion stage movably disposed on a base surface, one or more X-position interferometers, and a plurality of Y-position interferometers. The X-position interferometers include an X-position mirror fixedly coupled to the motion stage and an X-axis stationary module fixedly coupled a non-moving surface of processing system. Each of the plurality of Y-position interferometers include one of a first or second Y-position mirror fixedly coupled to the motion stage in orthogonal relationship to the one or more X-position mirrors and one of a first or a second Y-axis stationary module fixedly coupled to a non-moving surface of the processing system. Here, each of the Y-axis stationary modules is positioned to direct coherent radiation towards a respective Y-position mirror when the Y-position interferometer thereof is in an active arrangement.

公开(公告)号：US20200272063A1

公开(公告)日：2020-08-27

申请号：US16284516

申请日：2019-02-25

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. JOHNSTON ,  David Michael CORRIVEAU ,  Cheuk Ming LEE ,  Jae Myung YOO ,  WeiMin TAO ,  Antoine P. MANENS

IPC: G03F7/20

Abstract: Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.

公开(公告)号：US20210011390A1

公开(公告)日：2021-01-14

申请号：US17035105

申请日：2020-09-28

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. JOHNSTON ,  David Michael CORRIVEAU ,  Cheuk Ming LEE ,  Jae Myung YOO ,  WeiMin TAO ,  Antoine P. MANENS

IPC: G03F7/20

Abstract: Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.