公开(公告)号：US11749500B1

公开(公告)日：2023-09-05

申请号：US17582655

申请日：2022-01-24

Applicant: Applied Materials, Inc.

Inventor： Nevin Clay ,  David Roger Timberlake ,  Christopher W. Campbell

IPC: H01J37/304 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/304 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/20228 ,  H01J2237/24564 ,  H01J2237/24585

Abstract: A system and method for controlling an amount of outgassing caused by implanting ions into a photoresist disposed on a workpiece. The amount of outgassing is based on the species being implanted, the type of photoresist, the energy of the implant, and the amount of dose that has already been implanted, among other effects. By controlling the effective beam current, the amount of outgassing may be maintained below a predetermined threshold. By developing and utilizing the relationship between effective beam current, dose completed and rate of outgassing, the effective beam current may be controlled more precisely to implant the workpiece in the most efficient manner while remaining below the predetermined outgassing threshold.

公开(公告)号：US20230238214A1

公开(公告)日：2023-07-27

申请号：US17582655

申请日：2022-01-24

Applicant: Applied Materials, Inc.

Inventor： Nevin Clay ,  David Roger Timberlake ,  Christopher R. Campbell

IPC: H01J37/304 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/304 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/20228 ,  H01J2237/24564 ,  H01J2237/24585

Abstract: A system and method for controlling an amount of outgassing caused by implanting ions into a photoresist disposed on a workpiece. The amount of outgassing is based on the species being implanted, the type of photoresist, the energy of the implant, and the amount of dose that has already been implanted, among other effects. By controlling the effective beam current, the amount of outgassing may be maintained below a predetermined threshold. By developing and utilizing the relationship between effective beam current, dose completed and rate of outgassing, the effective beam current may be controlled more precisely to implant the workpiece in the most efficient manner while remaining below the predetermined outgassing threshold.