INSPECTION OF REGIONS OF INTEREST USING AN ELECTRON BEAM SYSTEM
    7.
    发明申请
    INSPECTION OF REGIONS OF INTEREST USING AN ELECTRON BEAM SYSTEM 有权
    使用电子束系统检查利益区域

    公开(公告)号:US20160322195A1

    公开(公告)日:2016-11-03

    申请号:US15207024

    申请日:2016-07-11

    IPC分类号: H01J37/26 H01J37/28

    摘要: A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system comprises: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams; and wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest.

    摘要翻译: 一种用于使用一个或多个带电粒子束扫描衬底的多个感兴趣区域的系统,所述系统包括:具有带电粒子光学器件的照射模块; 用于在衬底和带电粒子光学器件之间引入相对运动的阶段; 成像模块,用于响应于所述一个或多个带电粒子束对感兴趣区域的扫描,收集从衬底发射的电子; 并且其中带电粒子光学器件被布置成在感兴趣区域的扫描期间执行带电粒子束的反向运动,从而抵抗在感兴趣区域的扫描期间在衬底和带电粒子光学器件之间引入的相对运动。

    Inspection of regions of interest using an electron beam system
    8.
    发明授权
    Inspection of regions of interest using an electron beam system 有权
    使用电子束系统检查感兴趣区域

    公开(公告)号:US09466462B2

    公开(公告)日:2016-10-11

    申请号:US14153923

    申请日:2014-01-13

    IPC分类号: H01J37/26

    摘要: A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system may include: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams; and wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest.

    摘要翻译: 一种用于使用一个或多个带电粒子束扫描衬底的多个感兴趣区域的系统,所述系统可以包括:具有带电粒子光学器件的照射模块; 用于在衬底和带电粒子光学器件之间引入相对运动的阶段; 成像模块,用于响应于所述一个或多个带电粒子束对感兴趣区域的扫描,收集从衬底发射的电子; 并且其中带电粒子光学器件被布置成在感兴趣区域的扫描期间执行带电粒子束的反向运动,从而抵抗在感兴趣区域的扫描期间在衬底和带电粒子光学器件之间引入的相对运动。